المؤلفون: Yu, Mihyang, Yim, Donggyu, Seo, Hosung, Lee, Jieun

المصدر: 2D Mater. 9 (2022) 035020

مصطلحات موضوعية: Physics - Optics, Condensed Matter - Mesoscale and Nanoscale Physics, Quantum Physics

URL الوصول: http://arxiv.org/abs/2202.09037

المؤلفون: Bhang, Jooyong, Ma, He, Yim, Donggyu, Galli, Giulia, Seo, Hosung

مصطلحات موضوعية: Condensed Matter - Materials Science, Condensed Matter - Mesoscale and Nanoscale Physics

URL الوصول: http://arxiv.org/abs/2109.03406

المؤلفون: Yim, Donggyu, Yu, Mihyang, Noh, Gichang, Lee, Jieun, Seo, Hosung

المصدر: ACS Applied Materials and Interfaces (2020)

مصطلحات موضوعية: Condensed Matter - Mesoscale and Nanoscale Physics, Condensed Matter - Materials Science

URL الوصول: http://arxiv.org/abs/2008.01283

المؤلفون: Yim, Donggyu, Lee, Sungmuk

المساهمون: 임동규, 이성목

Time: 93-108

Relation: SNU Journal of Education Research, Vol.3, pp. 93-108; http://hdl.handle.net/10371/72449

الاتاحة: http://hdl.handle.net/10371/72449

المؤلفون: You, Taejun, Lee, Taehyeong, Yoo, Gyun, Park, Youngjoon, Kim, Cheolkyun, Yim, Donggyu

المساهمون: Erdmann, Andreas, Kye, Jongwook

المصدر: SPIE Proceedings ; Optical Microlithography XXIX ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2219863

المؤلفون: Lim, JongHoon, Kim, ByungJu, Son, JaeSik, Park, EuiSang, Kim, SangPyo, Yim, DongGyu

المساهمون: Yoshioka, Nobuyuki

المصدر: Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2193111

المؤلفون: Jo, Sangjin, Choi, Chungseon, Oh, Sunghyun, Ha, Taejoong, Lee, Youngmo, Kim, Sangpyo, Yim, Donggyu

المساهمون: Hayashi, Naoya, Kasprowicz, Bryan S.

المصدر: SPIE Proceedings ; Photomask Technology 2015 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2196938

المؤلفون: Ji, Sunkeun, Yoo, Gyun, Jo, Gyoyeon, Kang, Hyunwoo, Park, Minwoo, Kim, Jungchan, Park, Chanha, Yang, Hyunjo, Yim, Donggyu, Maruyama, Kotaro, Park, Byungjun, Yamamoto, Masahiro

المساهمون: Cain, Jason P., Sanchez, Martha I.

المصدر: SPIE Proceedings ; Metrology, Inspection, and Process Control for Microlithography XXIX ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2085464

المؤلفون: Woo, Sungha, Jang, Heeyeon, Lee, Youngmo, Kim, Sangpyo, Yim, Donggyu

المساهمون: Hayashi, Naoya, Kasprowicz, Bryan S.

المصدر: SPIE Proceedings ; Photomask Technology 2015 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2195850

المؤلفون: Kim, Seongjin, Do, Munhoe, An, Yongbae, Choi, Jaeseung, Yang, Hyunjo, Yim, Donggyu

المساهمون: Lai, Kafai, Erdmann, Andreas

المصدر: SPIE Proceedings ; Optical Microlithography XXVIII ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2085453

المؤلفون: Choi, Jihwan, Kim, Yongho, Lee, Dongwook, Jung, Hoyong, Kim, Snagpyo, Yim, Donggyu

المساهمون: Hayashi, Naoya, Kasprowicz, Bryan S.

المصدر: SPIE Proceedings ; Photomask Technology 2015 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2196069

المؤلفون: Lee, Hyemi, Kim, Munsik, Jung, Hoyong, Kim, Sangpyo, Yim, Donggyu

المساهمون: Hayashi, Naoya, Kasprowicz, Bryan S.

المصدر: SPIE Proceedings ; Photomask Technology 2015 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2196941

المؤلفون: Namkung, Hoon, Kim, MunSik, Park, EuiSang, Jung, HoYong, Kim, SangPyo, Yim, DongGyu

المساهمون: Yoshioka, Nobuyuki

المصدر: Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2193081

المؤلفون: Jeon, Jinhyuck, Kim, Shinyoung, Park, Chanha, Yang, Hyunjo, Yim, Donggyu, Kuechler, Bernd, Zimmermann, Rainer, Muelders, Thomas, Klostermann, Ulrich, Schmoeller, Thomas, Do, Mun-hoe, Choi, Jung-Hoe

المساهمون: Sturtevant, John L., Capodieci, Luigi

المصدر: SPIE Proceedings ; Design-Process-Technology Co-optimization for Manufacturability VIII ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2046541

المؤلفون: Yoo, Gyun, Kim, Jungchan, Park, Chanha, Lee, Taehyeong, Ji, Sunkeun, Jo, Gyoyeon, Yang, Hyunjo, Yim, Donggyu, Yamamoto, Masahiro, Maruyama, Kotaro, Park, Byungjun

المساهمون: Cain, Jason P., Sanchez, Martha I.

المصدر: Metrology, Inspection, and Process Control for Microlithography XXVIII ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2046294

المؤلفون: Kong, Dongho, You, Taejun, Kim, Cheolkyun, Yang, Hyunjo, Yim, Donggyu

المساهمون: Lai, Kafai, Erdmann, Andreas

المصدر: SPIE Proceedings ; Optical Microlithography XXVII ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2046577

المؤلفون: Jun, JeaYoung, Ha, TaeJoong, Kim, SangPyo, Yim, DongGyu

المساهمون: Ackmann, Paul W., Hayashi, Naoya

المصدر: SPIE Proceedings ; Photomask Technology 2014 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2066297

المؤلفون: Jang, Jongwon, Kim, Cheolkyun, Ko, Sungwoo, Byun, Seokyoung, Yang, Hyunjo, Yim, Donggyu

المساهمون: Lai, Kafai, Erdmann, Andreas

المصدر: SPIE Proceedings ; Optical Microlithography XXVII ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2046198

المؤلفون: Lee, HyeMi, Kim, ByungJu, Kim, MunSik, Jung, HoYong, Kim, Sang Pyo, Yim, DongGyu

المساهمون: Ackmann, Paul W., Hayashi, Naoya

المصدر: SPIE Proceedings ; Photomask Technology 2014 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2066278

المؤلفون: Lee, Jeonkyu, Lee, Taehyeong, Oh, Sangjin, Kang, Chunsoo, Kim, Jungchan, Choi, Jaeseung, Park, Chanha, Yang, Hyunjo, Yim, Donggyu, Do, Munhoe, Su, Irene, Song, Hua, Choi, Jung-Hoe, Fan, Yongfa, Wang, Anthony C., Lee, Sung-Woo, Boone, Robert, Lucas, Kevin

المساهمون: Conley, Will

المصدر: SPIE Proceedings ; Optical Microlithography XXVI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2012463