المؤلفون: Muroi Mitsuko, Yamada Ayami, Saito Ayumi, Habuka Hitoshi

مصطلحات موضوعية: A1. Doping, A1. Etching, A1. Surface processes, A3. Chemical vapor deposition processes, B1. Elemental solid, B2. Semiconductor silicon

Relation: https://ynu.repo.nii.ac.jp/?action=repository_uri&item_id=10245; http://hdl.handle.net/10131/00012907; Journal of Crystal Growth, 529, 125301(2020-01); AA00696341; https://ynu.repo.nii.ac.jp/?action=repository_action_common_download&item_id=10245&item_no=1&attribute_id=20&file_no=1

الاتاحة: http://hdl.handle.net/10131/00012907
https://ynu.repo.nii.ac.jp/?action=repository_uri&item_id=10245
https://ynu.repo.nii.ac.jp/?action=repository_action_common_download&item_id=10245&item_no=1&attribute_id=20&file_no=1

المؤلفون: Takahashi Toshinori, Otani Mana, Muroi Mitsuko, Irikura Kenta, Matsuo Miya, Yamada Ayami, Habuka Hitoshi, Ishida Yuuki, Ikeda Shin-Ichi, Hara Shiro

مصطلحات موضوعية: Minimal fab, Chemical vapor deposition reactor, Quartz crystal microbalance, Silicon epitaxial growth, Trichlorosilane, Dichlorosilane

Relation: https://ynu.repo.nii.ac.jp/?action=repository_uri&item_id=10244; http://hdl.handle.net/10131/00012906; Materials Science in Semiconductor Processing, 106, 104759(2020-02); AA11350145; https://ynu.repo.nii.ac.jp/?action=repository_action_common_download&item_id=10244&item_no=1&attribute_id=20&file_no=1

الاتاحة: http://hdl.handle.net/10131/00012906
https://ynu.repo.nii.ac.jp/?action=repository_uri&item_id=10244
https://ynu.repo.nii.ac.jp/?action=repository_action_common_download&item_id=10244&item_no=1&attribute_id=20&file_no=1

المؤلفون: Takahashi, Toshinori, Otani, Mana, Muroi, Mitsuko, Irikura, Kenta, Matsuo, Miya, Yamada, Ayami, Habuka, Hitoshi, Ishida, Yuuki, Ikeda, Shin-Ichi, Hara, Shiro

المصدر: Materials Science in Semiconductor Processing ; volume 106, page 104759 ; ISSN 1369-8001

الاتاحة: http://dx.doi.org/10.1016/j.mssp.2019.104759
https://api.elsevier.com/content/article/PII:S136980011931354X?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S136980011931354X?httpAccept=text/plain

المؤلفون: Muroi, Mitsuko, Yamada, Ayami, Saito, Ayumi, Habuka, Hitoshi

المساهمون: MEXT KAKENHI

المصدر: Journal of Crystal Growth ; volume 529, page 125301 ; ISSN 0022-0248

الاتاحة: http://dx.doi.org/10.1016/j.jcrysgro.2019.125301
https://api.elsevier.com/content/article/PII:S0022024819305160?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0022024819305160?httpAccept=text/plain

المؤلفون: YAMADA, Ayami, OHTSUKI, Kaito, SHIGA, Natsumi, GREEN, Jonathan A., MATSUNO, Yuta, IMAKAWA, Kazuhiko

المصدر: Journal of Reproduction & Development; 2022, Vol. 68 Issue 1, p110-117, 8p

مصطلحات موضوعية: EPITHELIAL-mesenchymal transition, TROPHOBLAST, METASTASIS, RUMINANTS, EMBRYO implantation

المؤلفون: Irikura, Kenta, Muroi, Mitsuko, Yamada, Ayami, Matsuo, Miya, Habuka, Hitoshi, Ishida, Yuuki, Ikeda, Shin-Ichi, Hara, Shiro

مصطلحات الفهرس: Minimal Fab, Chemical vapour deposition reactor, Silicon, Trichlorosilane gas concentration, Wafer rotation, Journal Article, AM

URL: http://hdl.handle.net/10131/00012488
https://ynu.repo.nii.ac.jp/?action=repository_action_common_download&item_id=9821&item_no=1&attribute_id=20&file_no=1
https://doi.org/10.1016/j.mssp.2018.07.006
https://doi.org/10.1016/j.mssp.2018.07.006

المؤلفون: Yamada, Ayami, Muroi, Mitsuko, Watanabe, Toru, Saito, Ayumi, Sakurai, Ayumi, Habuka, Hitoshi

مصطلحات الفهرس: Silicon epitaxial growth, parallel Langmuir processes, dichlorosilane, silicon hydrides, Journal Article, AM

URL: http://hdl.handle.net/10131/00012489
https://ynu.repo.nii.ac.jp/?action=repository_action_common_download&item_id=9822&item_no=1&attribute_id=20&file_no=2
https://doi.org/10.1088/1361-6641/aad294
https://doi.org/10.1088/1361-6641/aad294

المؤلفون: Irikura Kenta, Muroi Mitsuko, Yamada Ayami, Matsuo Miya, Habuka Hitoshi, Ishida Yuuki, Ikeda Shin-Ichi, Hara Shiro

مصطلحات موضوعية: Minimal Fab, Chemical vapour deposition reactor, Silicon, Trichlorosilane gas concentration, Wafer rotation

Relation: https://doi.org/10.1016/j.mssp.2018.07.006; https://ynu.repo.nii.ac.jp/?action=repository_uri&item_id=9821; http://hdl.handle.net/10131/00012488; Materials Science in Semiconductor Processing, 87, 13-18(2018-11-15); AA11350145; https://ynu.repo.nii.ac.jp/?action=repository_action_common_download&item_id=9821&item_no=1&attribute_id=20&file_no=1

الاتاحة: http://hdl.handle.net/10131/00012488
https://ynu.repo.nii.ac.jp/?action=repository_uri&item_id=9821
https://ynu.repo.nii.ac.jp/?action=repository_action_common_download&item_id=9821&item_no=1&attribute_id=20&file_no=1

المؤلفون: Yamada Ayami, Muroi Mitsuko, Watanabe Toru, Saito Ayumi, Sakurai Ayumi, Habuka Hitoshi

مصطلحات موضوعية: Silicon epitaxial growth, parallel Langmuir processes, dichlorosilane, silicon hydrides

Relation: https://doi.org/10.1088/1361-6641/aad294; https://ynu.repo.nii.ac.jp/?action=repository_uri&item_id=9822; http://hdl.handle.net/10131/00012489; Semiconductor science and technology, 33(9), (2018-07-26); AA10695094; https://ynu.repo.nii.ac.jp/?action=repository_action_common_download&item_id=9822&item_no=1&attribute_id=20&file_no=2

الاتاحة: http://hdl.handle.net/10131/00012489
https://ynu.repo.nii.ac.jp/?action=repository_uri&item_id=9822
https://ynu.repo.nii.ac.jp/?action=repository_action_common_download&item_id=9822&item_no=1&attribute_id=20&file_no=2

المؤلفون: Yamada, Ayami, Muroi, Mitsuko, Watanabe, Toru, Saito, Ayumi, Sakurai, Ayumi, Habuka, Hitoshi

المساهمون: Kakenhi, Japan

المصدر: Semiconductor Science and Technology ; volume 33, issue 9, page 094002 ; ISSN 0268-1242 1361-6641

الاتاحة: http://dx.doi.org/10.1088/1361-6641/aad294
http://stacks.iop.org/0268-1242/33/i=9/a=094002?key=crossref.f2e3eaa3aa570d02ce51abaee2a568b5
http://iopscience.iop.org/article/10.1088/1361-6641/aad294/pdf
http://stacks.iop.org/0268-1242/33/i=9/a=094002/pdf
http://iopscience.iop.org/article/10.1088/1361-6641/aad294

المؤلفون: Irikura, Kenta, Muroi, Mitsuko, Yamada, Ayami, Matsuo, Miya, Habuka, Hitoshi, Ishida, Yuuki, Ikeda, Shin-Ichi, Hara, Shiro

المصدر: Materials Science in Semiconductor Processing ; volume 87, page 13-18 ; ISSN 1369-8001

الاتاحة: http://dx.doi.org/10.1016/j.mssp.2018.07.006
https://api.elsevier.com/content/article/PII:S1369800118308539?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S1369800118308539?httpAccept=text/plain

المؤلفون: Watanabe, Toru, Yamada, Ayami, Saito, Ayumi, Sakurai, Ayumi, Habuka, Hitoshi

المساهمون: JSPS KAKENHI

المصدر: Materials Science in Semiconductor Processing ; volume 72, page 134-138 ; ISSN 1369-8001

الاتاحة: http://dx.doi.org/10.1016/j.mssp.2017.09.034
https://api.elsevier.com/content/article/PII:S1369800117315573?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S1369800117315573?httpAccept=text/plain

المؤلفون: Yamada, Ayami, Li, Ning, Matsuo, Miya, Muroi, Mitsuko, Habuka, Hitoshi, Ishida, Yuuki, Ikeda, Shin-Ichi, Hara, Shiro

المصدر: Materials Science in Semiconductor Processing ; volume 71, page 348-351 ; ISSN 1369-8001

الاتاحة: http://dx.doi.org/10.1016/j.mssp.2017.08.024
https://api.elsevier.com/content/article/PII:S1369800117311927?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S1369800117311927?httpAccept=text/plain