المؤلفون: Y. B. Hahn, Y. H. Im, Kee Suk Nahm, J. S. Park, Y. S. Lee

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 19:1277-1281

مصطلحات موضوعية: Photoluminescence, Materials science, fungi, technology, industry, and agriculture, Analytical chemistry, Surfaces and Interfaces, Surface finish, Plasma, Condensed Matter Physics, Crystallographic defect, Surfaces, Coatings and Films, Surface roughness, Dry etching, Reactive-ion etching, Inductively coupled plasma

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3a41e4988038487abe4cf67148018eca
https://doi.org/10.1116/1.1336830

المؤلفون: Hyun Cho, Stephen J. Pearton, Eric Lambers, K. P. Lee, Y. B. Hahn

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:1273-1277

مصطلحات موضوعية: Auger electron spectroscopy, Materials science, fungi, technology, industry, and agriculture, Analytical chemistry, macromolecular substances, Surfaces and Interfaces, Condensed Matter Physics, medicine.disease_cause, Surfaces, Coatings and Films, stomatognathic system, Etching (microfabrication), Desorption, medicine, Dry etching, Irradiation, Reactive-ion etching, Inductively coupled plasma, Ultraviolet

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f22f2ed25b4e507e49a15debd211be73
https://doi.org/10.1116/1.582339

المؤلفون: R. J. Choi, Y. B. Hahn, Kee Suk Nahm, D. O. Kim

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:361-366

مصطلحات موضوعية: Carbon film, Materials science, Hybrid physical-chemical vapor deposition, Plasma-enhanced chemical vapor deposition, Analytical chemistry, Surfaces and Interfaces, Dielectric, Chemical vapor deposition, Combustion chemical vapor deposition, Thin film, Condensed Matter Physics, Plasma processing, Surfaces, Coatings and Films

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::28a13154a4f5b52fe1db10cfa01e5989
https://doi.org/10.1116/1.582193

المؤلفون: Randy J. Shul, K. B. Jung, Hyun Cho, Stephen J. Pearton, David C. Hays, Eric Lambers, William Scott Hobson, Y. B. Hahn, C. R. Abernathy

المصدر: Plasma Chemistry and Plasma Processing. 20:405-415

مصطلحات موضوعية: Auger electron spectroscopy, Materials science, Plasma etching, General Chemical Engineering, Analytical chemistry, General Chemistry, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films, Chamber pressure, Etching (microfabrication), Inductively coupled plasma, Stoichiometry, Interhalogen

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::144f7f56fa9141856e1bee9d95a6cf66
https://doi.org/10.1023/a:1007000613045

المؤلفون: Hyun Cho, David C. Hays, C. R. Abernathy, Stephen J. Pearton, Randy J. Shul, William Scott Hobson, Y. B. Hahn, Eric Lambers, K. B. Jung

المصدر: Plasma Chemistry and Plasma Processing. 20:417-427

مصطلحات موضوعية: Materials science, Etching (microfabrication), General Chemical Engineering, Analytical chemistry, Compound semiconductor, General Chemistry, Plasma, Inductively coupled plasma, Condensed Matter Physics, Surfaces, Coatings and Films, Chamber pressure

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c67cdbeceb576edad5a77392dfccf8cd
https://doi.org/10.1023/a:1007052629883

المؤلفون: Y. B. Hahn, D. Johnson, D. C. Hays, Randy J. Shul, J. Donahue, Eric Lambers, K. B. Jung, S. J. Pearton

المصدر: Journal of The Electrochemical Society. 146:3812-3816

مصطلحات موضوعية: Plasma etching, Silicon, Renewable Energy, Sustainability and the Environment, Analytical chemistry, chemistry.chemical_element, Plasma, Condensed Matter Physics, Microstructure, Dissociation (chemistry), Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry, Materials Chemistry, Electrochemistry, Dry etching, Bond energy, Inductively coupled plasma

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4f47661becd795e019c6c75d01403266
https://doi.org/10.1149/1.1392556

المؤلفون: C. R. Abernathy, Y. B. Hahn, Sharon M. Donovan, Stephen J. Pearton, J. D. MacKenzie, J. Han, Randy J. Shul, David C. Hays, Hyun Cho

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:2202-2208

مصطلحات موضوعية: Materials science, Bond strength, Analytical chemistry, Wide-bandgap semiconductor, chemistry.chemical_element, Surfaces and Interfaces, Nitride, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry, Dry etching, Thin film, Inductively coupled plasma, Boron, Interhalogen

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a9ba2bf8bbe7284a6ef8b0a2b31304d2
https://doi.org/10.1116/1.582037

المؤلفون: Stephen J. Pearton, Fan Ren, D. Johnson, J. W. Lee, David C. Hays, Randy J. Shul, K. D. Mackenzie, C. R. Abernathy, Y. B. Hahn

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:2183-2187

مصطلحات موضوعية: Electron mobility, Materials science, Bipolar junction transistor, Analytical chemistry, Field-effect transistor, Heterojunction, Surfaces and Interfaces, Chemical vapor deposition, Thin film, Condensed Matter Physics, Sheet resistance, Electron cyclotron resonance, Surfaces, Coatings and Films

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0df62aec67989a650da987a87188c882
https://doi.org/10.1116/1.582109

المؤلفون: H. Cho, K. B. Jung, Eric Lambers, Y. D. Park, S. J. Pearton, T. Feng, David C. Hays, Jeffrey R. Childress, Y. B. Hahn

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:2223-2227

مصطلحات موضوعية: Materials science, technology, industry, and agriculture, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films, Ion, chemistry, Etching (microfabrication), Desorption, Chlorine, Inductively coupled plasma, Thin film, Inert gas

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::384cfe7c6c7f6283f9b2624662baaeeb
https://doi.org/10.1116/1.581751

المؤلفون: Y. B. Hahn, D. O. Kim

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:1982-1986

مصطلحات موضوعية: Crystallinity, Materials science, Carbon film, Sputtering, Analytical chemistry, Deposition (phase transition), Surfaces and Interfaces, Chemical vapor deposition, Thin film, Combustion chemical vapor deposition, Condensed Matter Physics, Current density, Surfaces, Coatings and Films

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8addc0234a2c9c2f961cbfa68aab55c3
https://doi.org/10.1116/1.581714

المؤلفون: K. B. Jung, C. R. Abernathy, S. M. Donovan, Y. B. Hahn, Stephen J. Pearton, Randy J. Shul, D. C. Hays, J. Han, Hyun Cho

المصدر: Materials Science and Engineering: B. 60:95-100

مصطلحات موضوعية: Plasma etching, Materials science, Mechanical Engineering, fungi, technology, industry, and agriculture, Analytical chemistry, macromolecular substances, Plasma, Condensed Matter Physics, Ion bombardment, stomatognathic system, Mechanics of Materials, Sputtering, Etching (microfabrication), General Materials Science, Inductively coupled plasma, Surface states, Interhalogen

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::31b646fff5af60ea8063068c2d309212
https://doi.org/10.1016/s0921-5107(99)00036-7

المؤلفون: X.R. Qian, K. B. Jung, Hyun Cho, T. Feng, Y.D Park, F. J. Cadieu, Stephen J. Pearton, Li Chen, David C. Hays, R. Rani, Y. B. Hahn, J.R. Childress

المصدر: Materials Science and Engineering: B. 60:107-111

مصطلحات موضوعية: Materials science, Plasma etching, Mechanical Engineering, technology, industry, and agriculture, Analytical chemistry, Plasma, Condensed Matter Physics, Ion, Mechanics of Materials, Etching (microfabrication), Desorption, General Materials Science, Inductively coupled plasma, Thin film, Interhalogen

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4702458a100ae76dcb6dfcf412549300
https://doi.org/10.1016/s0921-5107(99)00035-5

المؤلفون: Y. B. Hahn, David C. Hays, Stephen J. Pearton, C. R. Abernathy, Hyun Cho, Randy J. Shul, K. B. Jung

المصدر: Applied Surface Science. 147:207-214

مصطلحات موضوعية: Inorganic chemistry, Analytical chemistry, General Physics and Astronomy, macromolecular substances, stomatognathic system, Etch pit density, Etching (microfabrication), Surface roughness, Inert gas, Plasma etching, business.industry, Chemistry, RF power amplifier, fungi, technology, industry, and agriculture, Plasma, Surfaces and Interfaces, General Chemistry, Condensed Matter Physics, Surfaces, Coatings and Films, Semiconductor, Torr, lipids (amino acids, peptides, and proteins), Dry etching, Inductively coupled plasma, business, Stoichiometry

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3d658965edc1412e01633c6f68ad0902
https://doi.org/10.1016/s0169-4332(99)00114-2

المؤلفون: Fan Ren, Y. B. Hahn, C. R. Abernathy, Hyun Cho, Stephen J. Pearton, William Scott Hobson, K. B. Jung, David C. Hays

المصدر: Applied Surface Science. 147:125-133

مصطلحات موضوعية: business.industry, Chemistry, Inorganic chemistry, General Physics and Astronomy, BCL3, Heterojunction, Surfaces and Interfaces, General Chemistry, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films, Etching (microfabrication), Desorption, Optoelectronics, Dry etching, Inductively coupled plasma, business, Gaas algaas

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c79b61e0ffbd01f282d69c094f3e31f8
https://doi.org/10.1016/s0169-4332(99)00103-8

المؤلفون: Randy J. Shul, K. B. Jung, Stephen J. Pearton, Fan Ren, Hyun Cho, C. R. Abernathy, J Hun, Y. B. Hahn, David C. Hays

المصدر: Applied Surface Science. 147:134-139

مصطلحات موضوعية: Fabrication, Bond strength, Chemistry, Semiconductor materials, Analytical chemistry, General Physics and Astronomy, Mineralogy, Surfaces and Interfaces, General Chemistry, Plasma, Nitride, Condensed Matter Physics, Surfaces, Coatings and Films, Dry etching, Inductively coupled plasma, Interhalogen

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::05ee49473a0d80212f3a48bb67865415
https://doi.org/10.1016/s0169-4332(99)00104-x

المؤلفون: Sharon M. Donovan, David C. Hays, C. R. Abernathy, Y. B. Hahn, Randy J. Shul, J. Han, Stephen J. Pearton, K. B. Jung, Hyun Cho

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:768-773

مصطلحات موضوعية: fungi, technology, industry, and agriculture, Wide-bandgap semiconductor, Analytical chemistry, chemistry.chemical_element, macromolecular substances, Surfaces and Interfaces, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films, stomatognathic system, chemistry, Sputtering, Etching (microfabrication), Chlorine, Inductively coupled plasma, Selectivity

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c1122f3b19fc8518c82e89e9d31d142b
https://doi.org/10.1116/1.581647

المؤلفون: Jeffrey R. Childress, Eric Lambers, Y. D. Park, K. B. Jung, H. Cho, T. Feng, Y. B. Hahn, S. J. Pearton, D. C. Hays

المصدر: Journal of The Electrochemical Society. 146:1465-1468

مصطلحات موضوعية: Renewable Energy, Sustainability and the Environment, Mordançage, Chemistry, Analytical chemistry, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Ion, Etching (microfabrication), Desorption, Materials Chemistry, Electrochemistry, Dry etching, Inductively coupled plasma, Deposition (law)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::828c9fc32a25dfa3b3b130b30d678b74
https://doi.org/10.1149/1.1391787

المؤلفون: Carl-Mikael Zetterling, K. B. Jung, J. Hong, David C. Hays, L. Zhang, Hyun Cho, Stephen J. Pearton, Luke F. Lester, Randy J. Shul, M. Ostling, Y. B. Hahn

المصدر: Journal of Electronic Materials. 28:196-201

مصطلحات موضوعية: Plasma etching, Chemistry, Analytical chemistry, Plasma, Photoresist, Condensed Matter Physics, Electron cyclotron resonance, Electronic, Optical and Magnetic Materials, Surface micromachining, Etching (microfabrication), Materials Chemistry, Dry etching, Electrical and Electronic Engineering, Inductively coupled plasma

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::97aaaf2c0adb47260f65ad5e3f38db87
https://doi.org/10.1007/s11664-999-0013-2

المؤلفون: S. M. Donovan, Y. B. Hahn, Hyun Cho, K. B. Jung, Randy J. Shul, C. R. Abernathy, David C. Hays, Stephen J. Pearton

المصدر: MRS Internet Journal of Nitride Semiconductor Research. 4:763-768

مصطلحات موضوعية: Materials science, business.industry, Analytical chemistry, chemistry.chemical_element, Plasma, Nitride, Semiconductor, chemistry, Sputtering, Etching (microfabrication), Chlorine, General Materials Science, Inductively coupled plasma, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e1fc323f57f261a17387657eb6793fa0
https://doi.org/10.1557/s1092578300003380

المؤلفون: S. J. Pearton, Y. B. Hahn, K. D. Mackenzie, D. Johnson, J. W. Lee, Fan Ren

المصدر: Solid-State Electronics. 42:2017-2021

مصطلحات موضوعية: Stress (mechanics), Chemistry, Materials Chemistry, Analytical chemistry, Dry etching, Hydrogen content, Electrical and Electronic Engineering, Inductively coupled plasma, Condensed Matter Physics, Deposition (chemistry), Electronic, Optical and Magnetic Materials, Chamber pressure

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9f0b282e45db177d494b20e3336f22e9
https://doi.org/10.1016/s0038-1101(98)00170-1