المؤلفون: Inho Seong, Sijun Kim, Woobeen Lee, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong, Minsu Choi, Byeongyeop Choi, Huichan Seo, Sangheon Song, Shinjae You

المصدر: Applied Physics Express, Vol 17, Iss 9, p 096001 (2024)

مصطلحات موضوعية: plasma model, unified global model, global model, plasma circuit model, sheath model, Physics, QC1-999

وصف الملف: electronic resource

Relation: https://doaj.org/toc/1882-0786

URL الوصول: https://doaj.org/article/d199998039d7433d9b8e17a2a81e3b24

المؤلفون: Inho Seong, Jinho Lee, Sijun Kim, Youngseok Lee, Chulhee Cho, Jangjae Lee, Wonnyoung Jeong, Yebin You, Shinjae You

المصدر: Nanomaterials, Vol 12, Iss 22, p 3963 (2022)

مصطلحات موضوعية: plasma, sheath, etching distortion, database, Chemistry, QD1-999

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2079-4991/12/22/3963; https://doaj.org/toc/2079-4991

URL الوصول: https://doaj.org/article/ef4bcef6eb2f48a29b2077ac13b73dc8

المؤلفون: Chulhee Cho, Sijun Kim, Youngseok Lee, Wonnyoung Jeong, Inho Seong, Jangjae Lee, Minsu Choi, Yebin You, Sangho Lee, Jinho Lee, Shinjae You

المصدر: Sensors, Vol 22, Iss 17, p 6589 (2022)

مصطلحات موضوعية: plasma, quadrupole mass spectrometer, radical density, quantification, Chemical technology, TP1-1185

وصف الملف: electronic resource

Relation: https://www.mdpi.com/1424-8220/22/17/6589; https://doaj.org/toc/1424-8220

URL الوصول: https://doaj.org/article/bf293390280d4a1c96975023953ec47e

المؤلفون: Inho Seong, Sijun Kim, Youngseok Lee, Chulhee Cho, Jangjae Lee, Wonnyoung Jeong, Yebin You, Shinjae You

المصدر: Sensors, Vol 22, Iss 16, p 6254 (2022)

مصطلحات موضوعية: plasma, ion energy distribution (IED), real time, monitoring, noninvasive, Chemical technology, TP1-1185

وصف الملف: electronic resource

Relation: https://www.mdpi.com/1424-8220/22/16/6254; https://doaj.org/toc/1424-8220

URL الوصول: https://doaj.org/article/ece7e822579f42178567a4131d0f4bb2

المؤلفون: Inho Seong, Sijun Kim, Minsu Choi, Woobeen Lee, Wonnyoung Jeong, Chulhee Cho, Yebin You, Youngseok Lee, Youbin Seol, Shinjae You

المصدر: Materials; Volume 16; Issue 17; Pages: 5746

مصطلحات موضوعية: ion flux, ion energy distribution function, He addition, charge transfer collision, heterogeneous charge transfer collision

وصف الملف: application/pdf

Relation: https://dx.doi.org/10.3390/ma16175746

الاتاحة: https://doi.org/10.3390/ma16175746

المؤلفون: Minsu Choi, Youngseok Lee, Yebin You, Chulhee Cho, Wonnyoung Jeong, Inho Seong, Byeongyeop Choi, Sijun Kim, Youbin Seol, Shinjae You, Geun Young Yeom

المصدر: Materials; Volume 16; Issue 16; Pages: 5624

مصطلحات موضوعية: plasma processing, greenhouse effect, greenhouse gas, global warming potential, alternative precursors, C 4 F 8, C 6 F 6, CHF 3, C 4 H 2 F 6, plasma etching, plasma diagnostics

وصف الملف: application/pdf

Relation: Manufacturing Processes and Systems; https://dx.doi.org/10.3390/ma16165624

الاتاحة: https://doi.org/10.3390/ma16165624

المؤلفون: Wonnyoung Jeong, Sijun Kim, Youngseok Lee, Chulhee Cho, Inho Seong, Yebin You, Minsu Choi, Jangjae Lee, Youbin Seol, Shinjae You

المصدر: Materials; Volume 16; Issue 10; Pages: 3820

مصطلحات موضوعية: plasma processing, plasma etching, high-aspect ratio SiO 2 etching, etching rate, individual plasma internal parameter control, ion flux, ion energy

وصف الملف: application/pdf

Relation: https://dx.doi.org/10.3390/ma16103820

الاتاحة: https://doi.org/10.3390/ma16103820

المؤلفون: Inho Seong, Si-jun Kim, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong, Yebin You, Minsu Choi, Byeongyeop Choi, Shinjae You

المصدر: Materials; Volume 16; Issue 8; Pages: 3219

مصطلحات موضوعية: plasma diagnostics, electron temperature, electron temperature quenching, skin effect

وصف الملف: application/pdf

Relation: Manufacturing Processes and Systems; https://dx.doi.org/10.3390/ma16083219

الاتاحة: https://doi.org/10.3390/ma16083219

المؤلفون: Chulhee Cho, Sijun Kim, Youngseok Lee, Inho Seong, Wonnyoung Jeong, Yebin You, Minsu Choi, Shinjae You

المصدر: Materials; Volume 16; Issue 7; Pages: 2762

مصطلحات موضوعية: plasma diagnostics, plasma potential, emissive probe, floating potential method, plasma potential determination

وصف الملف: application/pdf

Relation: Manufacturing Processes and Systems; https://dx.doi.org/10.3390/ma16072762

الاتاحة: https://doi.org/10.3390/ma16072762