المؤلفون: Zhang Xiangyu, Jiang Dongwei, He Wen, Wang Jinzhong

المصدر: Hangkong bingqi, Vol 31, Iss 5, Pp 41-49 (2024)

مصطلحات موضوعية: inas/gasb superlattice, wet etching, dry etching, etching mechanism, process optimization, Motor vehicles. Aeronautics. Astronautics, TL1-4050

وصف الملف: electronic resource

Relation: https://www.aeroweaponry.avic.com/fileup/1673-5048/PDF/2023-0207.pdf; https://doaj.org/toc/1673-5048

URL الوصول: https://doaj.org/article/ef4dc12446cb4ae7912f134f808185eb

المؤلفون: Vishal Sahu, Priyanka Dewangan, Robbi Vivek Vardhan, Vanlal Rinfela, P. Krishna Menon, Prem Pal

المصدر: Micro and Nano Systems Letters, Vol 12, Iss 1, Pp 1-12 (2024)

مصطلحات موضوعية: Chromium thin film, Positive photoresist, Masking layer: Wet etching, Borofloat glass, Technology

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2213-9621

URL الوصول: https://doaj.org/article/c908193c08bd4b8283204464d3375d08

المؤلفون: Daishi Shiojiri, Ryoya Kai, Satoru Kaneko, Akifumi Matsuda, Mamoru Yoshimoto

المصدر: Applied Physics Express, Vol 18, Iss 1, p 015501 (2025)

مصطلحات موضوعية: surface patterning, wide-gap semiconductor, beta gallium oxide, wet etching, low toxic processes, Physics, QC1-999

وصف الملف: electronic resource

Relation: https://doaj.org/toc/1882-0786

URL الوصول: https://doaj.org/article/4afd70fe463d434ea92e2fc9e605f65c

المؤلفون: Lei Wang, Wei Gong, Xiao-Wen Cao, Yan-Hao Yu, Saulius Juodkazis, Qi-Dai Chen

المصدر: Light: Advanced Manufacturing, Vol 4, Iss 4, Pp 339-347 (2024)

مصطلحات موضوعية: holographic laser fabrication, wet etching, compound eye, micro-optics, fast imaging, imaging restoration, Manufactures, TS1-2301, Applied optics. Photonics, TA1501-1820

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2689-9620

URL الوصول: https://doaj.org/article/2797d14fbe6d4d818c3a8ede70a4ee64

المؤلفون: Syed M. Rahman, Md R. Kabir, Tamzeed B. Amin, James M. Mangum, Ashaduzzaman, Paul M. Thibado

المصدر: Energies, Vol 17, Iss 23, p 5895 (2024)

مصطلحات موضوعية: graphene, photolithography, wet etching, metalization, graphene transfer, Schottky junction, Technology

وصف الملف: electronic resource

Relation: https://www.mdpi.com/1996-1073/17/23/5895; https://doaj.org/toc/1996-1073

URL الوصول: https://doaj.org/article/c0155f9f452b4ec491cb180500359f15

المؤلفون: Kinga Majkowycz, Krzysztof Murawski, Małgorzata Kopytko, Krzesimir Nowakowski-Szkudlarek, Marta Witkowska-Baran, Piotr Martyniuk

المصدر: Nanomaterials, Vol 14, Iss 19, p 1612 (2024)

مصطلحات موضوعية: DLTS, MOCVD, MBE, MCT, T2SL, wet etching, Chemistry, QD1-999

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2079-4991/14/19/1612; https://doaj.org/toc/2079-4991

URL الوصول: https://doaj.org/article/57318bb9090b40a283e2e657222c7ae1

المؤلفون: Hojung Choi, Joohoon Kim, Wonjoong Kim, Junhwa Seong, Chanwoong Park, Minseok Choi, Nakhyun Kim, Jisung Ha, Cheng-Wei Qiu, Junsuk Rho, Heon Lee

المصدر: PhotoniX, Vol 4, Iss 1, Pp 1-11 (2023)

مصطلحات موضوعية: Nanoimprint lithography, Wet etching, Polyvinyl alcohol, High fidelity nanofabrication, High aspect ratio nanostructure, Metalens, Applied optics. Photonics, TA1501-1820

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2662-1991

URL الوصول: https://doaj.org/article/fb570ccd20814c289a2db01b281590b3

المؤلفون: Ding Song, Wenge Wu

المصدر: Micromachines, Vol 15, Iss 7, p 929 (2024)

مصطلحات موضوعية: wet etching technology, 304 stainless steel substrates, multi-parameter coupling, XPS and nanoindentation, Mechanical engineering and machinery, TJ1-1570

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2072-666X/15/7/929; https://doaj.org/toc/2072-666X

URL الوصول: https://doaj.org/article/fb62273086d04246a202eb2a666cbfe1

المؤلفون: Yide Dong, Guangbin Dou, Zibiao Wei, Shanshan Ji, Huihui Dai, Kaiqin Tang, Litao Sun

المصدر: Micromachines, Vol 15, Iss 6, p 784 (2024)

مصطلحات موضوعية: quartz, MEMS, wet etching undercut, dimension compensation, microfabrication, Mechanical engineering and machinery, TJ1-1570

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2072-666X/15/6/784; https://doaj.org/toc/2072-666X

URL الوصول: https://doaj.org/article/e4e2738ae33a4ca385f180bc1edb4432

المؤلفون: Atwa, Yahya, Shakeel, Hamza

المصدر: Atwa , Y & Shakeel , H 2024 , ' Enhancing the performance of sintered fused silica cylindrical shell resonators through wet etching ' , IEEE Sensors Letters , vol. 8 , no. 12 . https://doi.org/10.1109/LSENS.2024.3510101

مصطلحات موضوعية: sintered fused silica cylindrical shell resonators, shell resonators, wet etching, replication molding

وصف الملف: application/pdf

الاتاحة: https://pure.qub.ac.uk/en/publications/e816eb74-da38-4eed-91ea-cd3ef602209c
https://doi.org/10.1109/LSENS.2024.3510101
https://pureadmin.qub.ac.uk/ws/files/620062878/Pure_Copy_YA_HS.pdf

المؤلفون: Kaijie Cheng, Ji Wang, Guolong Wang, Kun Yang, Wenwu Zhang

المصدر: Materials, Vol 17, Iss 17, p 4231 (2024)

مصطلحات موضوعية: micro lens array, femtosecond-laser-induced modification, wet etching, imaging, fused silica, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85

Relation: https://www.mdpi.com/1996-1944/17/17/4231; https://doaj.org/toc/1996-1944; https://doaj.org/article/99bb67f2c79146a2ab17e28f4c6cbf97

الاتاحة: https://doi.org/10.3390/ma17174231
https://doaj.org/article/99bb67f2c79146a2ab17e28f4c6cbf97

المؤلفون: Aldrigo, Martino, Zampa, Gian Marco, Dragoman, Mircea, Dinu, Livia Alexandra, Nastase, Florin, Romanitan, Cosmin, Parvulescu, Catalin, Brincoveanu, Oana, Iordanescu, Sergiu, Vulpe, Silviu, Laudadio, Emiliano, Mohebbi, Elaheh, Pavoni, Eleonora

المساهمون: Aldrigo, Martino, Zampa, Gian Marco, Dragoman, Mircea, Dinu, Livia Alexandra, Nastase, Florin, Romanitan, Cosmin, Parvulescu, Catalin, Brincoveanu, Oana, Iordanescu, Sergiu, Vulpe, Silviu, Laudadio, Emiliano, Mohebbi, Elaheh, Pavoni, Eleonora

مصطلحات موضوعية: hafnium zirconium oxide ferroelectrics, planar capacitors, area-selective wet etching, ab initio and multiphysics simulations, pyroelectric harvesting

وصف الملف: ELETTRONICO

Relation: info:eu-repo/semantics/altIdentifier/wos/WOS:001347366200001; volume:6; issue:4; numberofpages:14; journal:JPHYS ENERGY; https://hdl.handle.net/11566/337262

الاتاحة: https://hdl.handle.net/11566/337262
https://doi.org/10.1088/2515-7655/ad8aec
https://iopscience.iop.org/article/10.1088/2515-7655/ad8aec

المؤلفون: Fan Zhang, Huacheng Xu, Qing Yang, Yu Lu, Guangqing Du, Feng Chen

المصدر: Photonics, Vol 11, Iss 3, p 264 (2024)

مصطلحات موضوعية: femtosecond laser, compound eyes, microlens arrays, wet etching, dry etching, Applied optics. Photonics, TA1501-1820

Relation: https://www.mdpi.com/2304-6732/11/3/264; https://doaj.org/toc/2304-6732; https://doaj.org/article/766ec4ffbe1044d09857c86d5056fec6

الاتاحة: https://doi.org/10.3390/photonics11030264
https://doaj.org/article/766ec4ffbe1044d09857c86d5056fec6

المؤلفون: Yunhao Wang, Sheng Wu, Wenjing Wang, Tao Wu, Xinxin Li

المصدر: Micromachines, Vol 15, Iss 4, p 482 (2024)

مصطلحات موضوعية: PMUT array, the scar-free “MIS” process, (111) wafer, anisotropic wet etching, three-fold symmetry, Mechanical engineering and machinery, TJ1-1570

Relation: https://www.mdpi.com/2072-666X/15/4/482; https://doaj.org/toc/2072-666X; https://doaj.org/article/9a6c689a33b6499cbf456e73190ed700

الاتاحة: https://doi.org/10.3390/mi15040482
https://doaj.org/article/9a6c689a33b6499cbf456e73190ed700

المؤلفون: Emmanuel Kayede, Emre Akso, Brian Romanczyk, Nirupam Hatui, Islam Sayed, Kamruzzaman Khan, Henry Collins, Stacia Keller, Umesh K. Mishra

المصدر: Crystals, Vol 14, Iss 6, p 485 (2024)

مصطلحات موضوعية: wet etching, N-polar GaN, AlGaN, HEMT, n+ GaN regrowth, Crystallography, QD901-999

Relation: https://www.mdpi.com/2073-4352/14/6/485; https://doaj.org/toc/2073-4352; https://doaj.org/article/b59664daceea49888ae3d60c552f771c

الاتاحة: https://doi.org/10.3390/cryst14060485
https://doaj.org/article/b59664daceea49888ae3d60c552f771c

المؤلفون: Wei Tao, Florian Laible, Abdelhamid Hmima, Thomas Maurer, Monika Fleischer

المصدر: Nano Convergence, Vol 10, Iss 1, Pp 1-10 (2023)

مصطلحات موضوعية: Nanorings, In-situ shape-altering, Electron beam lithography, Wet-etching transfer, Flexible plasmonics, Technology, Chemical technology, TP1-1185, Biotechnology, TP248.13-248.65, Science, Physics, QC1-999

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2196-5404

URL الوصول: https://doaj.org/article/ab872074d1d2490f9968a3d69892acb4

المؤلفون: Sein Kim, Seung-Il Kim, Soheil Ghods, Jin-Su Kim, Young Cheol Lee, Hyung Jun Kwun, Ji-Yun Moon, Jae-Hyun Lee

المصدر: Small Science, Vol 3, Iss 9, Pp n/a-n/a (2023)

مصطلحات موضوعية: atomic spalling, germanium, monolayers, transition metal dichalcogenides, wet etching, Materials of engineering and construction. Mechanics of materials, TA401-492

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2688-4046

URL الوصول: https://doaj.org/article/080cd8ee22e142ca9645df6bb657a45f

المؤلفون: Livia Alexandra Dinu, Cosmin Romanitan, Martino Aldrigo, Catalin Parvulescu, Florin Nastase, Silviu Vulpe, Raluca Gavrila, Pericle Varasteanu, Andreea Bianca Serban, Rihem Noumi, Olga M. Ishchenko

المصدر: Materials & Design, Vol 233, Iss , Pp 112194- (2023)

مصطلحات موضوعية: Area-selective wet etching, Ferroelectricity, Zirconium-doped hafnium oxide, X-ray reflectivity, Phase shifter, Materials of engineering and construction. Mechanics of materials, TA401-492

وصف الملف: electronic resource

Relation: http://www.sciencedirect.com/science/article/pii/S0264127523006093; https://doaj.org/toc/0264-1275

URL الوصول: https://doaj.org/article/4c4b4e22e62d4ed294fd9025c33b4608

المؤلفون: Mistry, Akash, Nieweglowski, Krzysztof, Bock, Karlheinz

مصطلحات موضوعية: Wet etching, Surface waves, Dry etching, Lithography, Surface emitting lasers, Waveguide, laser writing, Nassätzen, Oberflächenwellen, Trockenätzen, Lithographie, Oberflächenemittierende Laser, Wellenleiter, Laserschreiben, info:eu-repo/classification/ddc/621, ddc:621

Relation: 979-8-3503-3484-5

الاتاحة: https://tud.qucosa.de/id/qucosa%3A93418
https://tud.qucosa.de/api/qucosa%3A93418/attachment/ATT-0/

المؤلفون: Chapotot, Alexandre, Ilahi, Bouraoui, Arias-Zapata, Javier, Hanuš, Tadeáš, Ayari, Ahmed, Hamon, Gwenaëlle, Cho, Jinyoun, Dessein, Kristof, Darnon, Maxime, Boucherif, Abderraouf

المساهمون: Laboratoire Nanotechnologies et Nanosystèmes Sherbrooke (LN2), Université de Sherbrooke (UdeS)-École Centrale de Lyon (ECL), Université de Lyon-Université de Lyon-École Supérieure de Chimie Physique Électronique de Lyon (CPE)-Institut National des Sciences Appliquées de Lyon (INSA Lyon), Université de Lyon-Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA), Institut Interdisciplinaire d'Innovation Technologique Sherbrooke (3IT), Université de Sherbrooke (UdeS), Umicore (UMICORE), UMICORE

المصدر: ISSN: 1369-8001 ; Materials Science in Semiconductor Processing ; https://hal.science/hal-04214455 ; Materials Science in Semiconductor Processing, 2023, 168, pp.107851. ⟨10.1016/j.mssp.2023.107851⟩.

مصطلحات موضوعية: Germanium Wet etching Porous Germanium Polishing Substrate Reuse Porous Lift-off, Germanium, Wet etching, Porous Germanium, Polishing, Substrate Reuse, Porous Lift-off, [SPI]Engineering Sciences [physics]

Relation: hal-04214455; https://hal.science/hal-04214455; https://hal.science/hal-04214455/document; https://hal.science/hal-04214455/file/Chapotot_final_version.pdf

الاتاحة: https://hal.science/hal-04214455
https://hal.science/hal-04214455/document
https://hal.science/hal-04214455/file/Chapotot_final_version.pdf
https://doi.org/10.1016/j.mssp.2023.107851