المؤلفون: Boon Teik Chan, S. Tahara, J.F. De Marneffe, R. Gronheid, K. Xu, E. Nishimura, W. Boullart

الاتاحة: https://dx.doi.org/10.13140/2.1.4841.1847
http://rgdoi.net/10.13140/2.1.4841.1847

المؤلفون: J. G. Lisoni, J. Johnson, J. L. Everaert, V. Paraschiv, W. Boullart, D. Maes, L. Haspeslagh, D. J. Wouters, C. Caputa, P. Casella, R. Zambrano, G. Vecchio, H. Monchoix, L. Van Autryve

المصدر: Integrated Ferroelectrics. 53:257-267

مصطلحات موضوعية: Control and Systems Engineering, Materials Chemistry, Ceramics and Composites, Electrical and Electronic Engineering, Condensed Matter Physics, Electronic, Optical and Magnetic Materials

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::972f188954b83f9e2aa4133968319342
https://doi.org/10.1080/10584580390258174

المؤلفون: A Das, T Kokubo, Y Furukawa, H Struyf, I Vos, B Sijmus, F Iacopi, J Van. Aelst, Q.T Le, L Carbonell, S Brongersma, M Maenhoudt, Z Tokei, I Vervoort, E Sleeckx, M Stucchi, M Schaekers, W Boullart, E Rosseel, M Van Hove, S Vanhaelemeersch, A Shiota, K Maex

المصدر: Microelectronic Engineering. 64:25-33

مصطلحات موضوعية: Permittivity, Materials science, business.industry, Copper interconnect, Low-k dielectric, Dielectric, Integrated circuit, Condensed Matter Physics, Capacitance, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Material selection, law, Chemical-mechanical planarization, Optoelectronics, Electrical and Electronic Engineering, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::418d616414353ade522e569289c856b9
https://doi.org/10.1016/s0167-9317(02)00768-2

المؤلفون: E. Kesters A, Q. T. Le, M. R. Baklanov, W. Boullart, P. W. Mertens

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.scientific.net/SSP.103-104.349.pdf.

مصطلحات موضوعية: low-k films, low-k compatibility, strip plasma, contact angle, spectroscopic ellipsometry

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.699.1315; http://www.scientific.net/SSP.103-104.349.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.699.1315
http://www.scientific.net/SSP.103-104.349.pdf

المؤلفون: G. Mannaert, L. Witters, W. Boullart, K. Han, S. Luo, R. Sonnemans, I. Berry, C. Waldfried

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.scientific.net/SSP.145-146.253.pdf.

مصطلحات موضوعية: Fin, Photo resist strip, dopant loss

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.699.1141; http://www.scientific.net/SSP.145-146.253.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.699.1141
http://www.scientific.net/SSP.145-146.253.pdf

المؤلفون: M. Claes, V. Paraschiv, S. Beckx, M. Dem, W. Deweerd, S. Garaud, H. Kraus, R. Vos, J. Snow, W. Boullart, S. De Gendt

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.scientific.net/SSP.103-104.93.pdf.

مصطلحات موضوعية: high-k, metal gate, selective wet etching, dry etch residue removal

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.698.8395; http://www.scientific.net/SSP.103-104.93.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.698.8395
http://www.scientific.net/SSP.103-104.93.pdf

المؤلفون: G. Mannaert A, M. R. Baklanov, D. Goossens, J. Vertommen, W. Boullart

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.scientific.net/SSP.134.113.pdf.

مصطلحات موضوعية: resist strip, extension implant, crust layer, metal gate

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.698.2906; http://www.scientific.net/SSP.134.113.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.698.2906
http://www.scientific.net/SSP.134.113.pdf

المؤلفون: E. V. Danilkin, D. Shamiryan, M. R. Baklanov, A. P. Milenin, W. Boullart, G. Y. Krasnikov

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.clarycon.com/Resources/Chamber+Wall+Effects+in+STI.pdf.

مصطلحات موضوعية: STI etch, oxygen recombination on quartz, etch stop

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.653.7321; http://www.clarycon.com/Resources/Chamber+Wall+Effects+in+STI.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.653.7321
http://www.clarycon.com/Resources/Chamber+Wall+Effects+in+STI.pdf

المؤلفون: M. Claes, V. Paraschiv, S. Beckx, M. Dem, W. Deweerd, S. Garaud, H. Kraus, R. Vos, J. Snow, W. Boullart, S. De Gendt

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.scientific.net/SSP.103-104.93.pdf.

مصطلحات موضوعية: high-k, metal gate, selective wet etching, dry etch residue removal

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.430.8451; http://www.scientific.net/SSP.103-104.93.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.430.8451
http://www.scientific.net/SSP.103-104.93.pdf

المؤلفون: E. Kesters A, Q. T. Le, M. R. Baklanov, W. Boullart, P. W. Mertens

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.scientific.net/SSP.103-104.349.pdf.

مصطلحات موضوعية: low-k films, low-k compatibility, strip plasma, contact angle, spectroscopic ellipsometry

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.430.6677; http://www.scientific.net/SSP.103-104.349.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.430.6677
http://www.scientific.net/SSP.103-104.349.pdf

المؤلفون: V. Paraschiv A, M. Claes B, M. R. Baklanov C, W. Boullart D, S. De Gendt E, S. Vanhaelemeersch F

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.scientific.net/SSP.103-104.97.pdf.

مصطلحات موضوعية: High-K, HfO2, wet-removal, HF

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.430.4455; http://www.scientific.net/SSP.103-104.97.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.430.4455
http://www.scientific.net/SSP.103-104.97.pdf

المؤلفون: G. Mannaert A, M. R. Baklanov, D. Goossens, J. Vertommen, W. Boullart

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.scientific.net/SSP.134.113.pdf.

مصطلحات موضوعية: resist strip, extension implant, crust layer, metal gate

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.429.7735; http://www.scientific.net/SSP.134.113.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.429.7735
http://www.scientific.net/SSP.134.113.pdf

المؤلفون: J. Peeters¹, W. Boullart¹, V. Pultau¹, S. Vandenberk¹, L. Vereecken¹

المصدر: Journal of Physical Chemistry A. Mar2007, Vol. 111 Issue 9, p1618-1631. 14p.

مصطلحات موضوعية: *ALKENES, *HYDROCARBONS, *ATOMS, *CHEMICAL reactions

المؤلفون: S Tinck, W Boullart, A Bogaerts

المصدر: Journal of Physics D: Applied Physics. Mar2008, Vol. 41 Issue 6, p65207-65207. 1p.

مصطلحات موضوعية: *ELECTRODES, *SUBSTRATES (Materials science), *ANISOTROPY, *IONS