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1Report
المؤلفون: Prabhakara, V., Nuytten, T., Bender, H., Vandervorst, W., Bals, S., Verbeeck, J.
مصطلحات موضوعية: Physics - Optics, Physics - Applied Physics, Physics - Data Analysis, Statistics and Probability
URL الوصول: http://arxiv.org/abs/2106.08478
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2Academic Journal
المؤلفون: Prabhakara, Viveksharma, Nuytten, T., Bender, H., Vandervorst, W., Bals, Sara, Verbeeck, Johan
المصدر: 1094-4087 ; Optics express
مصطلحات موضوعية: Physics
Relation: info:eu-repo/grantAgreement/EC/h2020/823717; info:eu-repo/semantics/altIdentifier/isi/000708940500144
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3Academic Journal
المؤلفون: Pandey, K., Paredis, K., Robson, A.J., Vandervorst, W.
وصف الملف: text
Relation: https://eprints.lancs.ac.uk/id/eprint/147213/1/JAP20_AR_02304.pdf; Pandey, K. and Paredis, K. and Robson, A.J. and Vandervorst, W. (2020) Understanding the effect of confinement in scanning spreading resistance microscopy measurements. Journal of Applied Physics, 128 (3). ISSN 0021-8979
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4Academic Journal
المؤلفون: Laricchiuta, G., Vandervorst, W., Vickridge, I., Mayer, M., Meersschaut, J.
المصدر: Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films
وصف الملف: application/pdf
Relation: http://hdl.handle.net/21.11116/0000-0002-EF9D-1; http://hdl.handle.net/21.11116/0000-0002-EF9F-F; http://hdl.handle.net/21.11116/0000-0003-16BB-2
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5Conference
المؤلفون: Celano, U, Gastaldi, C, Subhechha, S, Govoreanu, B, Donadio, G, Franquet, A, Ahmad, T, Detavernier, Christophe, Richard, O, Bender, H, Goux, L, Kar, GS, van der Heide, P, Vandervorst, W
المصدر: 2017 IEEE international electron devices meeting (IEDM) ; ISSN: 2380-9248 ; ISBN: 9781538635599
مصطلحات موضوعية: Technology and Engineering
وصف الملف: application/pdf
Relation: https://biblio.ugent.be/publication/8609307; http://hdl.handle.net/1854/LU-8609307; https://biblio.ugent.be/publication/8609307/file/8609761
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6Academic Journal
المؤلفون: Bogdanowicz, J., Kumar, A., Fleischmann, C., Gilbert, M., Houard, Jonathan, Vella, Angela, Vandervorst, W.
المساهمون: IMEC (IMEC), Catholic University of Leuven = Katholieke Universiteit Leuven (KU Leuven), Groupe de physique des matériaux (GPM), Université de Rouen Normandie (UNIROUEN), Normandie Université (NU)-Normandie Université (NU)-Institut national des sciences appliquées Rouen Normandie (INSA Rouen Normandie), Institut National des Sciences Appliquées (INSA)-Normandie Université (NU)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS)-Institut de Recherche sur les Matériaux Avancés (IRMA), Université de Caen Normandie (UNICAEN), Normandie Université (NU)-Normandie Université (NU)-École Nationale Supérieure d'Ingénieurs de Caen (ENSICAEN), Normandie Université (NU)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université de Rouen Normandie (UNIROUEN), Normandie Université (NU)-Institut national des sciences appliquées Rouen Normandie (INSA Rouen Normandie), Institut National des Sciences Appliquées (INSA)-Normandie Université (NU)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS)-Université de Caen Normandie (UNICAEN), Normandie Université (NU)-École Nationale Supérieure d'Ingénieurs de Caen (ENSICAEN), Normandie Université (NU)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)
المصدر: ISSN: 0304-3991 ; Ultramicroscopy ; https://hal.science/hal-02061734 ; Ultramicroscopy, 2018, 188, pp.19-23. ⟨10.1016/j.ultramic.2018.03.001⟩.
مصطلحات موضوعية: [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], [PHYS.PHYS.PHYS-INS-DET]Physics [physics]/Physics [physics]/Instrumentation and Detectors [physics.ins-det]
Relation: hal-02061734; https://hal.science/hal-02061734; https://hal.science/hal-02061734/document; https://hal.science/hal-02061734/file/~%241-s2.0-S0304399117304217-postprint%20Bogdanowicz.pdf
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7Academic Journal
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8Academic Journal
المؤلفون: Nuytten, T., Bogdanowicz, J., Witters, L., Eneman, G., Hantschel, T., Schulze, A., Favia, P., Bender, H., De Wolf, I., Vandervorst, W.
المساهمون: Electronic Component Systems for European Leadership Joint Undertaking
المصدر: APL Materials ; volume 6, issue 5 ; ISSN 2166-532X
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9Academic Journal
المؤلفون: Zhang, H., Chiappe, D., Meersschaut, J., Conard, T., Franquet, A., Nuytten, T., Mannarino, M., Radu, I., Vandervorst, W., Delabie, A.
المصدر: JOURNAL OF CHEMICAL PHYSICS 146(5)
Relation: https://aperta.ulakbim.gov.tr/record/45745; oai:zenodo.org:45745
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10Academic Journal
المؤلفون: NALIN MEHTA, A., ZHANG, H., DABRAL, A., RICHARD, O., FAVIA, P., BENDER, H., DELABIE, A., CAYMAX, M., HOUSSA, M., POURTOIS, G., VANDERVORST, W.
المساهمون: Vlaams Agentschap Innoveren en Ondernemen
المصدر: Journal of Microscopy ; volume 268, issue 3, page 276-287 ; ISSN 0022-2720 1365-2818
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11Academic Journal
المؤلفون: Groven, B., Claes, D., Nalin Mehta, A., Bender, H., Vandervorst, W., Heyns, M., Caymax, M., Radu, I., Delabie, A.
المصدر: Journal of Chemical Physics; 3/14/2019, Vol. 150 Issue 10, pN.PAG-N.PAG, 14p, 5 Diagrams, 6 Graphs
مصطلحات موضوعية: CHEMICAL vapor deposition, LOW temperatures
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12Academic Journal
المؤلفون: Franquet, A., Spampinato, V., Kayser, S., Vandervorst, W., van der Heide, P.
المصدر: Vacuum ; volume 202, page 111182 ; ISSN 0042-207X
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13Academic Journal
المؤلفون: Celano, U., Fantini, A., Degraeve, R., Jurczak, M., Goux, L., Vandervorst, W.
المصدر: AIP Advances ; volume 6, issue 8 ; ISSN 2158-3226
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14Academic Journal
المؤلفون: Martens, K., Jeong, J. W., Aetukuri, N., Rettner, C., Shukla, N., Freeman, E., Nasr Esfahani, Davoud, Peeters, François, Topuria, T., Rice, P. M., Volodin, A., Douhard, B., Vandervorst, W., Samant, M. G., Datta, S., Parkin, S. S. P.
المصدر: 0031-9007 ; Physical review letters
مصطلحات موضوعية: Physics
وصف الملف: pdf
Relation: info:eu-repo/semantics/altIdentifier/isi/000364024800013
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15Academic Journal
المؤلفون: Qiu, Y., Bender, H., Richard, O., Kim, M.-S., Van Besien, E., Vos, I., de Potter de ten Broeck, M., Mocuta, D., Vandervorst, W.
المصدر: Scientific Reports ; volume 5, issue 1 ; ISSN 2045-2322
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16Academic Journal
المؤلفون: Kumar, A., Bogdanowicz, J., Demeulemeester, J., Bran, J., Melkonyan, D., Fleischmann, C., Vandervorst, W.
المصدر: Journal of Applied Physics; 2018, Vol. 124 Issue 24, pN.PAG-N.PAG, 7p, 7 Graphs
مصطلحات موضوعية: FEMTOSECOND pulses, PULSED lasers, ATOM-probe tomography, ELECTRIC properties of silicon, METHODOLOGY, ELECTRIC fields
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17Book
المؤلفون: Meuris, M., Jaeger, B., Steenbergen, J., Bonzom, R., Caymax, M., Houssa, M., Kaczer, B., Leys, F., Martens, K., Opsomer, K., Pourghaderi, A. M., Satta, A., Simoen, E., Terzieva, V., Moorhem, E., Winderickx, G., Loo, R., Clarysse, T., Conard, T., Delabie, A., Hellin, D., Janssens, T., Onsia, B., Sioncke, S., Mertens, P. W., Snow, J., Elshocht, S., Vandervorst, W., Zimmerman, P., Brunco, D., Raskin, G., Letertre, F., Akatsu, T., Billon, T., Heyns, M.
المصدر: Advanced Microelectronics ; Advanced Gate Stacks for High-Mobility Semiconductors ; page 333-340 ; ISBN 9783540714903 9783540714910
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18Conference
المؤلفون: Heyns, M., Alian, A., BRAMMERTZ, Guy, Caymax, M., Eneman, G., Franco, J., Gencarelli, F., Groeseneken, G., Hellings, G., Hikavyy, A., Houssa, M., Kaczer, B., LIN, Dan, Loo, R., Merckling, C., MEURIS, Marc, Mitard, J., Nyns, L., Sioncke, S., Vandervorst, W., Vincent, B., Waldron, N., Witters, L.
المساهمون: Loo, Roger/0000-0003-3513-6058, Franco, Jacopo/0000-0002-7382-8605, Merckling, Clement/0000-0003-3084-2543, houssa, michel/0000-0003-1844-3515, Groeseneken, Guido/0000-0003-3763-2098, heyns, marc/0000-0002-1199-4341
مصطلحات موضوعية: CMOS, Germanium, III/V, defects, ATOMIC LAYER DEPOSITION, SURFACE SEGREGATION, PASSIVATION, GROWTH, PERFORMANCE, NBTI
Relation: 2012; 2012 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS), IEEE; http://hdl.handle.net/1942/31559; WOS:000309183100082
الاتاحة: http://hdl.handle.net/1942/31559
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19Conference
المؤلفون: Vandervorst, W.
المصدر: AIP Conference Proceedings ; volume 683, page 758-763 ; ISSN 0094-243X
الاتاحة: http://dx.doi.org/10.1063/1.1622556
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20Conference
المؤلفون: Vandervorst, W.
المصدر: AIP Conference Proceedings ; volume 683, page 129-138 ; ISSN 0094-243X
الاتاحة: http://dx.doi.org/10.1063/1.1622459