المؤلفون: Veloso, A., Hikavyy, A., Loo, R., Paraschiv, V., Chan, B. T., Radisic, D., Li, W., Versluijs, J. J., Teugels, L., Sebaai, F., Favia, P., Eneman, G., Bender, H., Vancoille, E., Scheerder, J. E., Fleischmann, C., Horiguchi, N., Matagne, P., Huynh-Bao, T., Chasin, A., Simoen, E., Vecchio, E., Devriendt, K., Brus, S., Rosseel, E.

المصدر: 2019 IEEE International Electron Devices Meeting (IEDM) ; volume 267 ty328, page 11.1.1-11.1.4

الاتاحة: http://dx.doi.org/10.1109/iedm19573.2019.8993602
http://xplorestaging.ieee.org/ielx7/8971803/8993428/08993602.pdf?arnumber=8993602

المؤلفون: Vega-Gonzalez, V., Bekaert, J., Kesters, E., Le, Q. T., Lorant, C., Varela P., O., Teugels, L., Heylen, N., El-Mekki, Z., van der Veen, M., Webers, T., Wilson, C. J., Vats, H., Rynders, L., Cupak, M., Uk-Lee, J., Drissi, Y., Halipre, L., Charley, A.-L., Verdonck, P., Witters, T., Gompel, S. V., Briggs, B., Kimura, Y., Jourdan, N., Ciofi, I., Gupta, A., Contino, A., Boccardi, G., Lariviere, S., Dupas, L., De-Wachter, B., Vancoille, E., Decoster, S., Lazzarino, F., Ercken, M, Debacker, P., Kim, R., Trivkovic, D., Croes, K., Leray, P., Dillemans, L., Chen, Y.-F., Tokei, Z., Versluijs, J., Lesniewska, A., Paolillo, S., Baert, R., Puliyalil, H.

المصدر: 2019 IEEE International Electron Devices Meeting (IEDM)

الاتاحة: http://dx.doi.org/10.1109/iedm19573.2019.8993538
http://xplorestaging.ieee.org/ielx7/8971803/8993428/08993538.pdf?arnumber=8993538

المؤلفون: Yin, L, Vancoille, E Y J, Ramesh, K, Huang, H, Pickering, J P, Spowage, A C

المصدر: Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture ; volume 218, issue 4, page 419-429 ; ISSN 0954-4054 2041-2975

الاتاحة: https://doi.org/10.1243/095440504323055533
https://journals.sagepub.com/doi/pdf/10.1243/095440504323055533

المؤلفون: Vancoille, E., Celis, J.P., Roos, J.R.

المصدر: Tribology Series ; Thin Films in Tribology, Proceedings of the 19th Leeds-Lyon Symposium on Tribology held at the Institute of Tribology, University of Leeds ; page 311-320 ; ISSN 0167-8922 ; ISBN 9780444897893

الاتاحة: https://doi.org/10.1016/s0167-8922(08)70387-0

المؤلفون: Favia, P, Richard, O, Eneman, G, Mertens, H, Arimura, H, Capogreco, E, Hikavyy, A, Witters, L, Kundu, P, Loo, R, Vancoille, E, Bender, H

المصدر: Semiconductor Science and Technology ; volume 34, issue 12, page 124003 ; ISSN 0268-1242 1361-6641

الاتاحة: http://dx.doi.org/10.1088/1361-6641/ab4b8b
http://iopscience.iop.org/article/10.1088/1361-6641/ab4b8b
http://iopscience.iop.org/article/10.1088/1361-6641/ab4b8b/pdf
https://iopscience.iop.org/article/10.1088/1361-6641/ab4b8b/pdf
https://iopscience.iop.org/article/10.1088/1361-6641/ab4b8b

المؤلفون: Arimura, H., Witters, L., Cott, D., Dekkers, H., Loo, R., Mitard, J., Ragnarsson, L.-A., Wostyn, K., Boccardi, G., Chiu, E., Subirats, A., Favia, P., Vancoille, E., De Heyn, V., Mocuta, D., Collaert, N.

المصدر: 2017 Symposium on VLSI Technology

الاتاحة: http://dx.doi.org/10.23919/vlsit.2017.7998169
http://xplorestaging.ieee.org/ielx7/7989855/7998120/07998169.pdf?arnumber=7998169

المؤلفون: Merckling, C., Waldron, N., S. Jiang, W. Guo, Collaert, N., Caymax, M., Vancoille, E., Barla, K., Thean, A., Heyns, M., Vandervorst, W.

المصدر: Journal of Applied Physics; 2014, Vol. 115 Issue 2, p1-6, 6p, 2 Color Photographs, 1 Black and White Photograph, 2 Diagrams, 1 Graph

مصطلحات موضوعية: INDIUM phosphide, VAPOR phase epitaxial growth, NUCLEATION, ENGINEERING, PHYSICS research

المؤلفون: Witters, L., Arimura, H., Sebaai, F., Hikavyy, A., Milenin, A. P., Loo, R., De Keersgieter, A., Eneman, G., Schram, T., Wostyn, K., Devriendt, K., Schulze, A., Lieten, R., Bilodeau, S., Cooper, E., Storck, P., Chiu, E., Vrancken, C., Favia, P., Vancoille, E., Mitard, J., Langer, R., Opdebeeck, A., Holsteyns, F., Waldron, N., Barla, K., De Heyn, V., Mocuta, D., Collaert, N.

المساهمون: imec

المصدر: IEEE Transactions on Electron Devices ; volume 64, issue 11, page 4587-4593 ; ISSN 0018-9383 1557-9646

الاتاحة: http://dx.doi.org/10.1109/ted.2017.2756671
http://xplorestaging.ieee.org/ielx7/16/8076920/08061030.pdf?arnumber=8061030

المؤلفون: Mertens, H., Ritzenthaler, R., Arimura, H., Franco, J., Sebaai, F., Hikavyy, A., Pawlak, B. J., Machkaoutsan, V., Devriendt, K., Tsvetanova, D., Milenin, A. P., Witters, L., Dangol, A., Vancoille, E., Bender, H., Badaroglu, M., Holsteyns, F., Barla, K., Mocuta, D., Horiguchi, N., Thean, A.V-Y

المصدر: 2015 Symposium on VLSI Technology (VLSI Technology) ; page T142-T143

الاتاحة: http://dx.doi.org/10.1109/vlsit.2015.7223654
http://xplorestaging.ieee.org/ielx7/7198535/7223619/07223654.pdf?arnumber=7223654

المؤلفون: Guo, W., Date, L., Pena, V., Bao, X., Merckling, C., Waldron, N., Collaert, N., Caymax, M., Sanchez, E., Vancoille, E., Barla, K., Thean, A., Eyben, P., Vandervorst, W.

المصدر: Applied Physics Letters ; volume 105, issue 6 ; ISSN 0003-6951 1077-3118

الاتاحة: http://dx.doi.org/10.1063/1.4892468
https://pubs.aip.org/aip/apl/article-pdf/doi/10.1063/1.4892468/13542671/062101_1_online.pdf

المؤلفون: Dekkers, H.F.W., Prajapati, V., Van Elshocht, S., Vancoille, E.

المصدر: MRS Proceedings ; volume 1330 ; ISSN 0272-9172 1946-4274

الاتاحة: http://dx.doi.org/10.1557/opl.2011.1252
https://www.cambridge.org/core/services/aop-cambridge-core/content/view/S1946427411012528

المؤلفون: Celis, Jean-Pierre, Vancoille, E, Mohrbacher, Hardy, Stals, Lambert

المساهمون: Sudarshan, T.S., Jeandin, M., Khor, K.A.

Relation: Surface Modification Technologies vol:XI pages:860-871; Int. Conf. on Surface Modification Technologies edition:11 location:Paris, France date:8-10 September 1997; https://lirias.kuleuven.be/handle/123456789/193317; 1-86125-055-X; MTM-299

الاتاحة: https://lirias.kuleuven.be/handle/123456789/193317

المؤلفون: Vancoille, E., Celis, Jean-Pierre, Roos, Jef

Relation: International Conference on Wear of Materials edition:9 location:San Francisco, USA date:13-16 April 1993; https://lirias.kuleuven.be/handle/123456789/373721

الاتاحة: https://lirias.kuleuven.be/handle/123456789/373721

المؤلفون: Vancoille, E., Celis, Jean-Pierre, Roos, Jozef

المساهمون: Dowson, D., Taylor, C.M., Childs, T.H.C., Godet, M., Dalmaz, G.

مصطلحات موضوعية: Engineering, Materials Science

Relation: Thin Films in Tribology pages:311-320; Tribology Series vol:25; Leeds-Lyon Symposium on Tribology: Thin Films in Tribology edition:19 location:Univ. Leeds, Inst. Tribol, Leeds, England date:08-11 September 1992; 0-444-89789-5; https://lirias.kuleuven.be/handle/123456789/371747

الاتاحة: https://lirias.kuleuven.be/handle/123456789/371747

المؤلفون: Blanpain, Bart, Franck, M., Mohrbacher, Hardy, Vancoille, E., Celis, Jean-Pierre, Roos, Jef

المساهمون: Dowson, D., Taylor, C.M., Childs, T.H.C., Godet, M., Dalmaz, G.

Relation: Tribology Series; Thin Films in Tribology vol:25 pages:623-630; Leeds-Lyon Symposium on Tribology: Thin Films in Tribology edition:19 location:University Leeds, Institute Tribology, Leeds, England date:08-11 September 1992; https://lirias.kuleuven.be/handle/123456789/373121; 0-444-89789-5

الاتاحة: https://lirias.kuleuven.be/handle/123456789/373121
https://doi.org/10.1016/S0167-8922(08)70415-2

المؤلفون: Yin, L., Vancoille, E. Y. J., Lee, L. C., Liu, Y. C., Huang, H., Ramesh, K.

مصطلحات موضوعية: Materials Science, Ceramics, Composites, polycrystalline SiC, ductile grinding, low-damage, diamond tool, Silicon-carbide, Mechanisms, 09 Engineering, 0912 Materials Engineering

Relation: orcid:0000-0003-3353-2970

الاتاحة: https://espace.library.uq.edu.au/view/UQ:122799

المؤلفون: Celis, Jean-Pierre, Roos, Jozef, Vancoille, E, Boelens, S, Ebberink, J

Relation: Proc. Interfinish '92 issue:2 pages:817-824; Interfinish '92 location:Sao Paulo, Brasil date:1992; https://lirias.kuleuven.be/handle/123456789/191228; MTM-1029

الاتاحة: https://lirias.kuleuven.be/handle/123456789/191228

المؤلفون: Vancoille, E., Celis, J.P., Stals, L., Roos, J.R.

المصدر: Wear Particles: Frorn the Cradle to the Grave, Proceedings of the 18th Leeds-Lyon Symposium on Tribology ; Tribology Series ; page 193-202 ; ISSN 0167-8922 ; ISBN 9780444893369

الاتاحة: http://dx.doi.org/10.1016/s0167-8922(08)70524-8

المؤلفون: Celis, Jean-Pierre, Roos, J.R, Vancoille, E, Franck, M

Relation: Proc. Wear of Materials vol:vol. II pages:655-658; location:Orlando date:1991; MTM-1277; https://lirias.kuleuven.be/handle/123456789/190347

الاتاحة: https://lirias.kuleuven.be/handle/123456789/190347

المؤلفون: Vancoille, E, Celis, Jean-Pierre, Stals, Lambert, Roos, J.R

Relation: Proc. 18th Leeds-Lyon Symposium on Wear Particles: From the Cradle to the Grave; location:INSA Lyon date:3-6 September 1991; MTM-439; https://lirias.kuleuven.be/handle/123456789/193066

الاتاحة: https://lirias.kuleuven.be/handle/123456789/193066