المؤلفون: Li, Si, Lu, Xinlin, Grannemann, Stephen, Sweat, Daniel, Brakensiek, Kelsey E., Lu, Pengtao, Lowes, Joyce A., Krishnamurthy, Vandana, Van Driessche, Veerle, Guerrero, Douglas

المساهمون: Guerrero, Douglas, Amblard, Gilles R.

المصدر: Advances in Patterning Materials and Processes XLI

الاتاحة: http://dx.doi.org/10.1117/12.3010887

المؤلفون: Li, Si, Sweat, Daniel, Lu, Xinlin, Brakensiek, Kelsey E., Lu, Pengtao, Lowes, Joyce A., Van Driessche, Veerle, Guerrero, Douglas J.

المساهمون: Guerrero, Douglas, Amblard, Gilles R.

المصدر: Advances in Patterning Materials and Processes XLI

الاتاحة: http://dx.doi.org/10.1117/12.3010498

المؤلفون: Li, Si, Lowes, Joyce, Zhang, Ruimeng, Luo, Ming, Brakensiek, Kelsey, van Driessche, Veerle, Guerrero, Douglas J.

المساهمون: Guerrero, Douglas, Amblard, Gilles R.

المصدر: Advances in Patterning Materials and Processes XL

الاتاحة: http://dx.doi.org/10.1117/12.2658529

المؤلفون: Guerrero, Douglas, Amblard, Gilles R., Li, Si, Sweat, Daniel, Lu, Xinlin, Brakensiek, Kelsey, Lu, Pengtao, Lowes, Joyce, Van Driessche, Veerle, Guerrero, Douglas J.

المصدر: Proceedings of SPIE; April 2024, Vol. 12957 Issue: 1 p129571T-129571T-8, 1166148p

المؤلفون: Liang, Yichen, Brakensiek, Kelsey E., Lowes, Joyce, Chacko, Andrea M., Zhang, Ruimeng, Van Driessche, Veerle, Lang, Xiaolong, Kasthuri, Jaishankar, Luo, Ming, Guerrero, Douglas J.

المساهمون: Guerrero, Douglas, Sanders, Daniel P.

المصدر: Advances in Patterning Materials and Processes XXXIX

الاتاحة: http://dx.doi.org/10.1117/12.2610985

المؤلفون: Vanelderen, Pieter, Vandenbroeck, Nadia, Liang, Yichen, Van Driessche, Veerle, Guerrero, Douglas, Chacko, Andrea, De Simone, Danilo, Vandenberghe, Geert

المساهمون: Gronheid, Roel, Sanders, Daniel P.

المصدر: Advances in Patterning Materials and Processes XXXVII

الاتاحة: http://dx.doi.org/10.1117/12.2551684

المؤلفون: Liang, Yichen, Chacko, Andrea M., Oelklaus, Samantha, Lowrey, Ethan, Van Driessche, Veerle, Ivan, Sedlacek R., Luo, Ming, Grannemann, Stephen M., Guerrero, Douglas J.

المساهمون: Gronheid, Roel, Sanders, Daniel P.

المصدر: Advances in Patterning Materials and Processes XXXVII

الاتاحة: http://dx.doi.org/10.1117/12.2551671

المؤلفون: Sanders, Daniel P., Guerrero, Douglas, Liang, Yichen, Brakensiek, Kelsey E., Lowes, Joyce, Chacko, Andrea M., Zhang, Ruimeng, Van Driessche, Veerle, Lang, Xiaolong, Kasthuri, Jaishankar, Luo, Ming, Guerrero, Douglas J.

المصدر: Proceedings of SPIE; July 2022, Vol. 12055 Issue: 1 p120550A-120550A-9, 1084960p

المؤلفون: Guerrero, Douglas, Amblard, Gilles R., Li, Si, Lu, Xinlin, Grannemann, Stephen, Sweat, Daniel, Brakensiek, Kelsey, Lu, Pengtao, Lowes, Joyce, Krishnamurthy, Vandana, Van Driessche, Veerle, Guerrero, Douglas J.

المصدر: Proceedings of SPIE; April 2024, Vol. 12957 Issue: 1 p1295715-1295715-13

المؤلفون: Van Driessche, Veerle, Lucas, Kevin, Van Roey, Frieda, Grozev, Grozdan, Tzviatkov, Plamen

المساهمون: Fedynyshyn, Theodore H.

المصدر: SPIE Proceedings ; Advances in Resist Technology and Processing XIX ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.474204

المؤلفون: Van Driessche, Veerle, Lucas, Kevin, Van Roey, Frieda, Grozev, Grozdan, Tzviatkov, Plamen

المساهمون: Mack, Chris A., Stevenson, Tom

المصدر: SPIE Proceedings ; Lithography for Semiconductor Manufacturing II ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.425231

المؤلفون: Neisser, Mark O., Biafore, John J., Foster, Patrick, Spaziano, Gregory D., Sarubbi, Thomas R., Van Driessche, Veerle, Grozev, Grozdan, Tzviatkov, Plamen

المساهمون: Progler, Christopher J.

المصدر: SPIE Proceedings ; Optical Microlithography XIII ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.389090

المؤلفون: Malik, Sanjay, Blakeney, Andrew J., Ferreira, Lawrence, Maxwell, Brian, Whewell, Allyn, Sarubbi, Thomas R., Bowden, Murrae J., Van Driessche, Veerle, Fujimori, Toru, Tan, Shiro, Aoai, Toshiaki, Uenishi, Kazuya, Kawabe, Yasumasa, Kokubo, Tadayoshi

المساهمون: Conley, Will

المصدر: SPIE Proceedings ; Advances in Resist Technology and Processing XVI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.350222
http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.350222

المؤلفون: Malik, Sanjay, Maxwell, Brian, Gandolfi, Anna, Ornaghi, Alberto, Whewell, Allyn, Uhnak, Kenneth, Volpi, Stefano, Van Driessche, Veerle, Sarubbi, Thomas R., Hansen, Steven G., Bowden, Murrae J.

المساهمون: Conley, Will

المصدر: SPIE Proceedings ; Advances in Resist Technology and Processing XVI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.350235

المؤلفون: Toukhy, Medhat A., Chnthalyma, S., Khan, D., McCormick, G., Jayaraman, T. V., Van Driessche, Veerle

المساهمون: Conley, Will

المصدر: SPIE Proceedings ; Advances in Resist Technology and Processing XVI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.350260

المؤلفون: Verhaegen, Katarina, Baert, Christiaan, Puers, Bob, Sansen, Willy, Simaels, Jeannine, Van Driessche, Veerle, Hermans, Lou, Mertens, Robert P.

المساهمون: Ferrari, Mauro

المصدر: SPIE Proceedings ; Micro- and Nanofabricated Structures and Devices for Biomedical Environmental Applications II ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.350058

المؤلفون: Zandbergen, Peter, Gehoel-van Ansem, Wendy F., Vandenberghe, Geert, Van Driessche, Veerle, Vloeberghs, Hans

المساهمون: Tarascon-Auriol, Regine G.

المصدر: Advances in Resist Technology and Processing XIV ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.275832
http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.275832

المؤلفون: Op de Beeck, Maaike, Bruggeman, Bert, Botermans, Harry, Van Driessche, Veerle, Yen, Anthony, Tritchkov, Alexander V., Jonckheere, Rik M., Ronse, Kurt G., Van den Hove, Luc

المساهمون: Fuller, Gene E.

المصدر: SPIE Proceedings ; Optical Microlithography IX ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.240927

المؤلفون: Op de Beeck, Maaike, Van Driessche, Veerle, Van den Hove, Luc, Dijkstra, Han J.

المساهمون: Nalamasu, Omkaram

المصدر: Advances in Resist Technology and Processing XI ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.175356
http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.175356

المؤلفون: Funhoff, Dirk J. H., Binder, H., Dijkstra, Han J., Goethals, Anne-Marie, Krause, A., Moritz, Holger, Reuhman-Huisken, Marijan E., Schwalm, Reinhold, Van Driessche, Veerle, Vinet, Francoise

المساهمون: Hinsberg, William D.

المصدر: Advances in Resist Technology and Processing X ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.154784