المؤلفون: Anna Szekeres, Sashka Alexandrova, Mihai Anastasescu, Hermine Stroescu, Mariuca Gartner, Peter Petrik

المصدر: Micro, Vol 4, Iss 3, Pp 426-441 (2024)

مصطلحات موضوعية: low-energy H+ ion implantation of c-Si, dry oxidation of H+-implanted silicon, UV–vis–IR spectroscopic ellipsometry, electroreflectance spectroscopy, AFM imaging, Physics, QC1-999, Microscopy, QH201-278.5, Microbiology, QR1-502, Chemistry, QD1-999

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2673-8023/4/3/27; https://doaj.org/toc/2673-8023

URL الوصول: https://doaj.org/article/dbb68e48a7e44addb3220f9bf75b3493