المؤلفون: M. Cogorno, S. C. Kung, Tushar Mandrekar, Balasubramanian S. Pranatharthi Haran, Mary Breton, Hemanth Jagannathan, Jingyun Zhang, James Chingwei Li, Benjamin Colombeau, Huimei Zhou, Shogo Mochizuki, Koji Watanabe, Nicolas Loubet, Sanjay Natarajan, M. Stolfi, P. Chen

المصدر: 2020 IEEE Symposium on VLSI Technology.

مصطلحات موضوعية: Negative-bias temperature instability, Materials science, Silicon, business.industry, chemistry.chemical_element, 02 engineering and technology, 010402 general chemistry, 021001 nanoscience & nanotechnology, Epitaxy, Cladding (fiber optics), 01 natural sciences, 0104 chemical sciences, Silicon-germanium, PMOS logic, Threshold voltage, chemistry.chemical_compound, chemistry, Optoelectronics, 0210 nano-technology, business, Nanosheet

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ee4322f5540fb764cc42752599399f82
https://doi.org/10.1109/vlsitechnology18217.2020.9265097

المؤلفون: Manish Hemkar, Errol Sanchez, Tushar Mandrekar, Mohammad Chowdhury, Zuoming Zhu, Chris Olsen, Manoj Vellaikal, Schubert Chu

المصدر: ECS Meeting Abstracts. :1053-1053

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::19bd8a6384318723be3d71f457bf749a
https://doi.org/10.1149/ma2018-02/31/1053

المؤلفون: Melody Agustin, Tushar Mandrekar, Christopher Lazik, Victor Ku, G. Conti, Robert Liang, Kishore Lavu, Chorng-Ping Chang, Steven Hung, Miao Jin, Bo Zheng, Rongjun Wang, Naomi Yoshida, Dave Liu, Xianmin Tang, Khaled Ahmed, Srinivas Gandikota, Hao Chen, Osbert Chan

المصدر: ECS Transactions. 13:143-150

مصطلحات موضوعية: Materials science, business.industry, Gate dielectric, Oxide, Equivalent oxide thickness, chemistry.chemical_compound, chemistry, Gate oxide, Optoelectronics, Work function, business, Metal gate, Layer (electronics), High-κ dielectric

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3ff70ccff93257739fa2af4907cc3dae
https://doi.org/10.1149/1.2911493

المؤلفون: Kavita Shah, Reza Arghavani, Mihaela Balseanu, R. Schreutelkamp, Jorge A. Kittl, Steven Demuynck, S. Gandikota, P. Boelen, A.J. Gelatos, A. Khandelwal, S. Felch, Li-Qun Xia, Ching-Ya Wang, Jianxin Lei, A.M. Noori, Scott E. Thompson, Peter Verheyen, Tushar Mandrekar, A. Cockburn, Anne Lauwers, Wen-Chin Lee

المصدر: IEEE Transactions on Electron Devices. 55:1259-1264

مصطلحات موضوعية: Materials science, business.industry, Schottky barrier, Contact resistance, Electrical engineering, Electronic, Optical and Magnetic Materials, PMOS logic, chemistry.chemical_compound, Strain engineering, CMOS, chemistry, Parasitic element, Silicide, Optoelectronics, Electrical and Electronic Engineering, business, NMOS logic

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cfa27d2ca966f62eb658f3d7e3329f51
https://doi.org/10.1109/ted.2008.919558

المؤلفون: Bencherki Mebarki, O. Chamirian, M. A. Pawlak, Tushar Mandrekar, Karen Maex, Muriel de Potter, Anne Lauwers, Xavier Pages, Jorge A. Kittl, Toon Raymakers, Richard Lindsay, Mark Van Dal

المصدر: Materials Science and Engineering: B. :29-41

مصطلحات موضوعية: Materials science, Dopant, Silicon, Mechanical Engineering, Metallurgy, Oxide, chemistry.chemical_element, Activation energy, Condensed Matter Physics, chemistry.chemical_compound, chemistry, Chemical engineering, Mechanics of Materials, Silicide, General Materials Science, Thermal stability, Work function, Sheet resistance

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::90bf015f3a6479939b17ba3ce6b90baf
https://doi.org/10.1016/j.mseb.2004.07.028

المؤلفون: D. Kelleher, Tushar Mandrekar, Bencherki Mebarki, Karen Maex, Zs. Tőkei, S. Guggilla

المصدر: Microelectronic Engineering. 70:358-362

مصطلحات موضوعية: Dielectric strength, Diffusion barrier, Copper interconnect, Analytical chemistry, Time-dependent gate oxide breakdown, Dielectric, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Tantalum nitride, chemistry, Physical vapor deposition, Electrical and Electronic Engineering, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6f75faab04efcca550e70d9201daf29e
https://doi.org/10.1016/s0167-9317(03)00396-4

المؤلفون: O. Richard, E. Beach, Karen Maex, Steven J. Rozeveld, S. Guggilla, Bencherki Mebarki, J. Waeterloos, Francesca Iacopi, Zs. Tőkei, Tushar Mandrekar

المصدر: Microelectronic Engineering. 70:352-357

مصطلحات موضوعية: Materials science, Tantalum, Copper interconnect, chemistry.chemical_element, Dielectric, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Barrier layer, chemistry.chemical_compound, chemistry, Tantalum nitride, Physical vapor deposition, Wafer, Electrical and Electronic Engineering, Composite material, Sheet resistance

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::135c83d1d223bc3ae0d2c673894bce76
https://doi.org/10.1016/s0167-9317(03)00368-x

المؤلفون: Bencherki Mebarki, Aunchan Wang, Jingmei Liang, Tushar Mandrekar, Hao D. Chen, Ping Xu, Pokhui Blanko, Yongmei Chen, Christopher S. Ngai, Mehul Naik, Xiaolin Chen, Kedar Sapre, Christopher Dennis Bencher

المصدر: SPIE Proceedings.

مصطلحات موضوعية: education.field_of_study, Materials science, business.industry, Population, Nanotechnology, Etching (microfabrication), Trench, Multiple patterning, Optoelectronics, Undercut, Process window, Dry etching, education, business, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7e23b5f780fe92a7ffdee3f4f79c73f7
https://doi.org/10.1117/12.881574

المؤلفون: Sanjay Mehta, J. Hua, Manuel A. Hernandez, V. Ton, Tushar Mandrekar, Ajay Bhatnagar, Shankar Venkataraman

المصدر: 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

مصطلحات موضوعية: Materials science, Dopant, Silicon, business.industry, Annealing (metallurgy), Doping, chemistry.chemical_element, Conformal map, Nanotechnology, Chemical vapor deposition, Surface concentration, chemistry, Optoelectronics, business, Boron

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e5f6a785cc1c15726bc9e3df2fc76335
https://doi.org/10.1109/asmc.2010.5551463

المؤلفون: Sywert Brongersma, P. Boelen, J. Van Olmen, J. Gelatos, S. List, Henny Volders, Zsolt Tokei, Ivan Ciofi, L. Carbonell, Eddy Kunnen, A. Khandelwal, Tushar Mandrekar, Nancy Heylen

المصدر: 2007 IEEE International Interconnect Technology Conferencee.

مصطلحات موضوعية: Atomic layer deposition, Cross section (physics), Materials science, business.industry, Scattering, Electrical resistivity and conductivity, MOSFET, Copper interconnect, Electronic engineering, Optoelectronics, Conductivity, business, Scaling

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::677d3d46e7d5719941643f4a4ccb196d
https://doi.org/10.1109/iitc.2007.382338

المؤلفون: Tushar Mandrekar, G. Van den bosch, G. Beyer, T. Chiarella, J. Ramos, Zs. Tokei, M. Van Hove, Nancy Heylen, R. Schreutelkamp, Steven Demuynck, Axel Nackaerts, Jan Vaes

المصدر: 2006 International Interconnect Technology Conference.

مصطلحات موضوعية: Materials science, Equivalent series resistance, business.industry, Transistor, Contact resistance, Electrical engineering, Ring oscillator, Dissipation, Electrical contacts, law.invention, Gate oxide, law, Optoelectronics, Node (circuits), business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e620ecfbf2a469b53f565f7039ee2acb
https://doi.org/10.1109/iitc.2006.1648681

المؤلفون: Karen Maex, Guido Groeseneken, Zsolt Tokei, Bencherki Mebarki, Yunlong Li, Tushar Mandrekar

المصدر: Scopus-Elsevier

مصطلحات موضوعية: Materials science, Diffusion barrier, chemistry, chemistry.chemical_element, Constant current, Time-dependent gate oxide breakdown, Dielectric, Composite material, Porosity, Copper, Leakage (electronics), Voltage

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c94fc5d4d79f5d5eaef66b8d30aa6b7f
https://doi.org/10.1557/proc-863-b4.4

المؤلفون: K. Bard, S. Van, Francois Wacquant, H. Achard, P. Spinelli, M. Muller, Roland Pantel, D. Rabilloud, R. Palla, Pierre Morin, V. Tirard, O. Leborgne, Christophe Regnier, E. Olson, D. Ceccarelli, V. DeJonghe, Tushar Mandrekar, V. Carron, B. Froment, V. Gravey, H. Brut, F. Trentesaux, A. Halimaoui, S. Lis, J. Diedrick, Frederic Boeuf, A. Beverina

المصدر: Electrical Performance of Electrical Packaging (IEEE Cat. No. 03TH8710).

مصطلحات موضوعية: Materials science, business.industry, Schottky effect, Schottky diode, chemistry.chemical_element, Salicide, Nickel, chemistry.chemical_compound, chemistry, Silicide, MOSFET, Electronic engineering, Optoelectronics, business, Sheet resistance, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3b3a4635456f0e378db88788bfd36555
https://doi.org/10.1109/essderc.2003.1256852

المؤلفون: Ling Chen, T. Vo, Peijun Ding, S. Rengarajan, Roderick C. Mosely, Suketu A. Parikh, Jay Chen, Tushar Mandrekar

المصدر: Proceedings of the IEEE 2002 International Interconnect Technology Conference (Cat. No.02EX519).

مصطلحات موضوعية: Barrier layer, Crystallography, Materials science, Scanning electron microscope, Stress migration, Copper plating, Copper interconnect, Wetting, Layer (electronics), Sheet resistance

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6ed84fdfaffe110247356d30e52053a2
https://doi.org/10.1109/iitc.2002.1014928

المؤلفون: Tushar Mandrekar, Frank Tsui, D. Glick, Darryl Barlett, Lincoln J. Lauhon, Roy Clarke, Ctirad Uher

المصدر: Physical Review B. 49:1521-1523

مصطلحات موضوعية: Condensed Matter::Materials Science, Paramagnetism, Materials science, Condensed matter physics, Field (physics), Scattering, Superlattice, Condensed Matter::Strongly Correlated Electrons, Giant magnetoresistance, Electron, Condensed Matter::Mesoscopic Systems and Quantum Hall Effect, Thermal conduction, Saturation (magnetic)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6a326da646bd647d57ad3a7f70c6041a
https://doi.org/10.1103/physrevb.49.1521

المؤلفون: Fusen E. Chen, Murali Narasimhan, Z. Fang, Jackson Michael S, H. Luo, Mei Chang, Tushar Mandrekar, Rod Mosely, Jason Li, Vikram Pavate, Nitin Khurana, Anish Tolia

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, chemistry.chemical_element, Chemical vapor deposition, Sputter deposition, Titanium nitride, chemistry.chemical_compound, Semiconductor, chemistry, Forensic engineering, Optoelectronics, Metalorganic vapour phase epitaxy, Metallizing, Tin, business, Titanium

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::005470c0655816952c677f7b77217b6c
https://doi.org/10.1117/12.360579

المؤلفون: Darryl Barlett, Frank Tsui, Ohrad Uher, Roy Clarke, Lincoln J. Lauhon, Tushar Mandrekar

المصدر: MRS Proceedings. 313

مصطلحات موضوعية: Condensed Matter::Materials Science, Paramagnetism, Materials science, Field (physics), Condensed matter physics, Scattering, Superlattice, Condensed Matter::Strongly Correlated Electrons, Giant magnetoresistance, Electron, Condensed Matter::Mesoscopic Systems and Quantum Hall Effect, Thermal conduction, Saturation (magnetic)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::65eb0c6278e9e893f79754d1cc042bfd
https://doi.org/10.1557/proc-313-35

المؤلفون: Naomi Yoshida, Xianmin Tang, Khaled Ahmed, Melody Agustin, Steven Hung, Victor Ku, Osbert Chan, Robert Liang, Hao Chen, Bo Zheng, Giuseppina Conti, Christopher Lazik, Miao Jin, Kishore Lavu, Chorng-Ping Chang, Tushar Mandrekar, Srinivas Gandikota

المصدر: ECS Meeting Abstracts. :632-632

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ac366ea97e0ad71ebbb0325d42cab3ca
https://doi.org/10.1149/ma2008-01/16/632