المؤلفون: Frank. C.C. Wang, J.Y. Wu, Michael Chan, Shao Wei Wang, Chan Lon Yang, Yu-Ren Wang, Charles Cl Lin, Tsuo Wen Lu

المصدر: 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP).

مصطلحات موضوعية: chemistry.chemical_compound, Atomic layer deposition, Materials science, CMOS, Silicon nitride, chemistry, Analytical chemistry, Dielectric, Thin film, Concentration ratio, Nitriding, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::004f955329fe6e09552ff6ae9ea4f1de
https://doi.org/10.1109/rtp.2010.5623791

المؤلفون: Sheng-Min Chiu, Chin-Fu Lin, Yu-Ren Wang, Zhiming Jiang, Chao-Yu Cheng, Juli Cheng, Zhengquan Tan, Chien-Jen Huang, Getin Raphael, Tsuo-Wen Lu, Shao-Ju Chang, Juan-Yuan Wu, Tsai-Yu Wen

المصدر: ECS Meeting Abstracts. :1802-1802

مصطلحات موضوعية: Materials science, chemistry, business.industry, Calculus, Spectroscopic ellipsometry, Optoelectronics, chemistry.chemical_element, business, Boron, Energy (signal processing), Line (formation)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::87ed29b7a4014c24260549ffad1651be
https://doi.org/10.1149/ma2014-02/35/1802

المؤلفون: Wang, F.C.C., Lin, C.C.L., Wang, Y.R., Shao Wei Wang, Tsuo Wen Lu, Chan, M., Chan Lon Yang, Wu, J.Y.

المصدر: 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP), 2010; 2010, p110-111, 2p