المؤلفون: Shinya Imai, Ryo Ono, Iriya Muneta, Kuniyuki Kakushima, Tetsuya Tatsumi, Shigetaka Tomiya, Kazuo Tsutsui, Hitoshi Wakabayashi

المصدر: IEEE Journal of the Electron Devices Society, Vol 13, Pp 15-23 (2025)

مصطلحات موضوعية: Transition metal di-chalcogenide (TMDC), molybdenum di-sulfide (MoS₂), ultra-high vacuum (UHV) radio frequency (RF) magnetron sputtering, low-rate sputtering, grain size, Electrical engineering. Electronics. Nuclear engineering, TK1-9971

وصف الملف: electronic resource

Relation: https://ieeexplore.ieee.org/document/10758789/; https://doaj.org/toc/2168-6734

URL الوصول: https://doaj.org/article/bc84f01173dc40d4a533ebbff5f2b6a7

المؤلفون: Keita Kurohara, Shinya Imai, Takuya Hamada, Tetsuya Tatsumi, Shigetaka Tomiya, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi

المصدر: IEEE Journal of the Electron Devices Society, Vol 12, Pp 390-398 (2024)

مصطلحات موضوعية: Transition-metal di-chalcogenide (TMDC), tungsten disulfide (WS2), ultra-high-vacuum (UHV) radio-frequency (RF) magnetron sputtering, chlorine (Cl2) plasma treatment, sulfur-vapor annealing (SVA), Electrical engineering. Electronics. Nuclear engineering, TK1-9971

وصف الملف: electronic resource

Relation: https://ieeexplore.ieee.org/document/10475166/; https://doaj.org/toc/2168-6734

URL الوصول: https://doaj.org/article/0f0027c3231c43f5b9517a4346560028