المؤلفون: Chun Shao, Tomoyuki Matsuyama, Toshihiko Sei, Zhengkai Yang, Quan Chen, Tami Miyazawa, Kengo Takemasa, Wuping Wang, Hajime Aoyama

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Scanner, Optics, Resist, business.industry, Computer science, Computational lithography, Extreme ultraviolet lithography, Electronic engineering, business, Lithography, Next-generation lithography, Immersion lithography, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6af944100d6c55848485c21f8c808884
https://doi.org/10.1117/12.2086062

المؤلفون: Toshiyuki Sekito, Yasuhiro Iriuchijima, Katsushi Nakano, Soichi Owa, Rei Seki, Toshihiko Sei, Yoshihiro Maruta, Tsunehito Hayashi, Tomoharu Fujiwara, Kenichi Shiraishi, Tadamasa Kawakubo

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Contact angle, Cost reduction, Materials science, Resist, business.industry, Multiple patterning, Optoelectronics, Wafer, Overlay, business, Immersion lithography, Manufacturing cost

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6110aecfaa49b34d2e530e425b6e7a75
https://doi.org/10.1117/12.846520

المؤلفون: Hiroshi Ooki, Derek Coon, Soichi Owa, Toshihiko Sei, Kazuya Okamoto

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Multiple exposure, Materials science, Field (physics), business.industry, Fine line, law.invention, Nonlinear system, Optics, Resist, law, Optoelectronics, Stepper, Photolithography, business, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bd5fd06329753dc470eabb8936ed3403
https://doi.org/10.1117/12.276012

المؤلفون: Akira MORISHIMA, Hiroshi SHIBATA, Naoki HAYASHI, Toshihiko SEINO, Toshihisa MATSUZAKI

المصدر: Japanese Heart Journal. 1977, 18(4):457