المؤلفون: Anne-Laure Charley, Frieda Van Roey, Toru Ishimoto, Chami Perera, Alain Moussa, Shunsuke Koshihara, Vito Rutigliani, Takumichi Sutani, Masami Ikota, Patrick P. Naulleau, Vassilios Constantoudis, Gian Lorusso, Chris A. Mack

المصدر: Lorusso, GF; Sutani, T; Rutigliani, V; Van Roey, F; Moussa, A; Charley, AL; et al.(2018). Need for LWR metrology standardization: The imec roughness protocol. Journal of Micro/ Nanolithography, MEMS, and MOEMS, 17(4). doi: 10.1117/1.JMM.17.4.041009. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/1hz5s0w7

مصطلحات موضوعية: 010302 applied physics, Protocol (science), Standardization, Computer science, Atomic force microscopy, Mechanical Engineering, Mechanical engineering, 02 engineering and technology, Surface finish, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Line width, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Metrology, Noise, 0103 physical sciences, Point (geometry), Electrical and Electronic Engineering, 0210 nano-technology

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::02d225ced8adc2830c49210a7aea46e4
http://www.escholarship.org/uc/item/1hz5s0w7

المؤلفون: Shunsuke Koshihara, Vito Rutigliani, Masami Ikota, Patrick P. Naulleau, Alain Moussa, Toru Ishimoto, Gian Lorusso, Frieda Van Roey, Takumichi Sutani, Anne-Laure Charley, Chris A. Mack, Vassilios Constantoudis

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.

مصطلحات موضوعية: 010302 applied physics, Protocol (science), Standardization, Point (typography), Computer science, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Field (computer science), Reliability engineering, Metrology, Term (time), International Technology Roadmap for Semiconductors, Deliverable, 0103 physical sciences, 0210 nano-technology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::424700185ae34d82f52f8b5e7b750b8d
https://doi.org/10.1117/12.2294617

المؤلفون: Paulina Rincon Delgadillo, Munirathna Padmanaban, Masami Ikota, Toru Ishimoto, Takumichi Sutani, Shunsuke Koshihara, Durairaj Baskaran, Jin Li, Yi Cao, Hyo Seon Suh, Akhil Nair, Victor Monreal, Jan Doise, Paul F. Nealey, Gian Lorusso, Takeshi Kato

المصدر: Advances in Patterning Materials and Processes XXXV.

مصطلحات موضوعية: Materials science, Annihilation, Annealing (metallurgy), Kinetics, Critical factors, Process window, Thin film, Cost of ownership, Lithography, Engineering physics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::59869dbce36c50a4d02647c09e2057ec
https://doi.org/10.1117/12.2299496

المؤلفون: Kazuhisa Hasumi, Raf Appeltans, Osamu Inoue, Takumichi Sutani, Paulina Rincon Delgadillo, Naoto Horiguchi, Yutaka Okagawa, Masami Ikota, Basoene Briggs, R. Delhougne, Laurent Souriau, Tom Raymaekers, Christopher J. Wilson, Geert Van den bosch, G. L. Donadio, Arnaud Furnemont, Siddharth Rao, Andrea Fantini, Daisy Zhou, D. Crotti, Luca Di Piazza, Anabela Veloso, Takeyoshi Ohashi, Gouri Sankar Kar, Philippe Leray, Astuko Yamaguchi, Chi Lim Tan, Danilo De Simone, Nadine Collaert, Jürgen Bömmels, Toru Ishimoto, Shunsuke Koshihara, Anne-Laure Charley, Farrukh Yasin, Gian Lorusso

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Back end of line, Materials science, Semiconductor device fabrication, Extreme ultraviolet lithography, Shallow trench isolation, NAND gate, Nanotechnology, Front end of line, Critical dimension, Engineering physics, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::aeca0d15a5e982f7de257b7e229a4437
https://doi.org/10.1117/12.2257468

المؤلفون: Lorusso, Gian Francesco, Takumichi Sutani, Rutigliani, Vito, Van Roey, Frieda, Moussa, Alain., Charley, Anne-Laure, Mack, Chris, Naulleau, Patrick, Constantoudis, Vassilios, Masami Ikota, Toru Ishimoto, Shunsuke Koshihara

المصدر: Proceedings of SPIE; 2018, Vol. 10585, p1-11, 11p

المؤلفون: Julien Mailfert, Daisuke Fuchimoto, Hitoshi Sugahara, Toru Ishimoto, Peter De Bisschop, Yasutaka Toyoda, Hiroyuki Shindo

المصدر: Metrology, Inspection, and Process Control for Microlithography XXVIII.

مصطلحات موضوعية: Computer science, Position (vector), Etching (microfabrication), Process (computing), Multiple patterning, Nanotechnology, Layer (object-oriented design), Measure (mathematics), Lithography, Algorithm, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0847c65cc16a3288e9514ed6bc06e04f
https://doi.org/10.1117/12.2046783

المؤلفون: Shunsuke Koshihara, Shoji Hotta, Ioana Graur, Toru Ishimoto, Derren N. Dunn, Marshal N. Miller, Nobuhiro Okai, Scott Halle, A. Yamaguchi, Yutaka Hojo, Keiichiro Hitomi, Nicole Saulnier, Hitoshi Komuro

المصدر: SPIE Proceedings.

مصطلحات موضوعية: business.industry, Computer science, Process (computing), Stability (probability), Edge detection, Total error, Metrology, Resist, Calibration, Node (circuits), Computer vision, Artificial intelligence, business, Algorithm

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::96048142f54544b259f8fe5746293221
https://doi.org/10.1117/12.2047678

المؤلفون: Lorusso, Gian Francesco, Takumichi Sutani, Rutigliani, Vito, Van Roey, Frieda, Moussa, Alain, Charley, Anne-Laure, Mack, Chris, Naulleau, Patrick, Perera, Chami, Constantoudis, Vassilios, Masami Ikota, Toru Ishimoto, Shunsuke Koshihara

المصدر: Journal of Micro/Nanolithography, MEMS & MOEMS; Oct-Dec2018, Vol. 17 Issue 4, p1-8, 8p

مصطلحات موضوعية: STANDARDIZATION, LENGTH measurement, SCANNING electron microscopes, SEMICONDUCTOR technology, TIME measurements, METROLOGY

المؤلفون: Ioana Graur, Hitoshi Komuro, Yutaka Hojo, Derren N. Dunn, Marshal N. Miller, Atuko Yamaguchi, Keiichiro Hitomi, Toru Ishimoto, Shoji Hotta, Nicole Saulnier, Shunsuke Koshihara, Scott Halle, Nobuhiro Okai

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS. 15:034002

مصطلحات موضوعية: Materials science, business.industry, Mechanical Engineering, Process (computing), 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Data modeling, 010309 optics, Optics, Optical proximity correction, Resist, 0103 physical sciences, Calibration, Correction technique, Node (circuits), Electrical and Electronic Engineering, 0210 nano-technology, business, Root-mean-square deviation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1fbc877661149f00aa1a2c43a0e7acc1
https://doi.org/10.1117/1.jmm.15.3.034002

المؤلفون: L. Carbonell, N. Ban, S. Umehara, K. Kellens, Naomasa Suzuki, S. Takada, Toru Ishimoto, Henny Volders, Nancy Heylen, Zsolt Tokei, R. Caluwaerts

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Void (astronomy), Materials science, business.industry, Detector, Early detection, High resolution, chemistry.chemical_element, Acceleration voltage, Copper, chemistry, Trench, Optoelectronics, Wafer, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0bdb30b31d066a6a756b4acc0c81db58
https://doi.org/10.1117/12.916254

المؤلفون: Hideyuki Kazumi, Toru Ishimoto, Shaunee Cheng, Maki Tanaka

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Semiconductor, Optics, Materials science, Resist, business.industry, Etching (microfabrication), Surface roughness, Semiconductor device, Surface finish, business, Nanoscopic scale, Shrinkage

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6a09c60e0f35c8bc6608811065c49f7d
https://doi.org/10.1117/12.917962

المؤلفون: Toru Ishimoto, Maki Tanaka, Miki Isawa, Shaunee Cheng

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, Optics, Resist, business.industry, Calibration, Surface roughness, Process control, Wafer, Surface finish, business, Immersion lithography, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::813ec9888c07a560c96625de2b9e907c
https://doi.org/10.1117/12.880916

المؤلفون: Maki Tanaka, Shaunee Cheng, Naoki Yasui, Mayuka Osaki, Toru Ishimoto, Miki Isawa, Kohei Sekiguchi, Chie Shishido, Norio Hasegawa

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Reference data (financial markets), Photoresist, law.invention, Optics, law, Line (geometry), Process window, Photolithography, business, Lithography, Critical dimension, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d7352f14ebe546e0afacdd215fd86ae9
https://doi.org/10.1117/12.846504

المؤلفون: Naoki Yasui, Toru Ishimoto, Shaunee Cheng, Maki Tanaka, Norio Hasegawa

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Surface finish, Numerical aperture, law.invention, Optics, Resist, law, Process window, Wafer, Photolithography, business, Lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4d6fdb84b0988810f6086f47b5e7138a
https://doi.org/10.1117/12.846541

المؤلفون: Shaunee Cheng, Mayuka Osaki, David Laidler, Toru Ishimoto, Kohei Sekiguchi, Norio Hasegawa, Kikuo Watanabe

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Metrology, Numerical aperture, law.invention, Optics, Resist, law, Process control, Process window, Photolithography, business, Lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::074caf6ff3b289a76ec0f3531078aa8c
https://doi.org/10.1117/12.771894

المؤلفون: Tatsuya Maeda, Toru Ishimoto, Norio Hasegawa, Kikuo Watanabe, Kohei Sekiguchi, David Laidler, G. Storms, Shaunee Cheng

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Resolution enhancement technologies, Scanning electron microscope, Computer science, business.industry, Numerical aperture, Metrology, law.invention, Optics, law, Multiple patterning, Phase-shift mask, Process control, Wafer, Process window, Photolithography, business, Lithography, Immersion lithography, Advanced process control

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d50c62da6889a52555bdf95e07cb9b64
https://doi.org/10.1117/12.710814

المؤلفون: Keiichiro Hitomi, Halle, Scott, Miller, Marshal, Graur, Ioana, Saulnier, Nicole, Dunn, Derren, Nobuhiro Okai, Shoji Hotta, Atuko Yamaguchi, Hitoshi Komuro, Toru Ishimoto, Shunsuke Koshihara, Yutaka Hojo

المصدر: Journal of Micro/Nanolithography, MEMS & MOEMS; Jul2016, Vol. 15 Issue 3, p034002-1-034002-8, 8p

مصطلحات موضوعية: PROXIMITY effect (Electron beam lithography), SCANNING electron microscopes, ROOT-mean-squares, METROLOGY, ACQUISITION of data

المؤلفون: Alessandro Vaglio Pret, Roel Gronheid, Kohei Sekiguchi, Toru Ishimoto

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS. 9:041308

مصطلحات موضوعية: Materials science, business.industry, Mechanical Engineering, Extreme ultraviolet lithography, Surface finish, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Metrology, Optics, Resist, Extreme ultraviolet, Frequency domain, Electrical and Electronic Engineering, business, Lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::dddcb94b03b7aed7100b35421d384dc7
https://doi.org/10.1117/1.3531982