يعرض 1 - 20 نتائج من 32 نتيجة بحث عن '"TiF4"', وقت الاستعلام: 0.63s تنقيح النتائج
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    Academic Journal
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    Academic Journal

    المساهمون: Department of Chemistry, Department of Physics, Mikko Ritala / Principal Investigator, HelsinkiALD

    مصطلحات موضوعية: Tif4, Precursor, Chemical sciences

    وصف الملف: application/pdf

    Relation: Atosuo , E , Mäntymäki , M , Pesonen , L , Mizohata , K , Hatanpää , T , Leskelä , M & Ritala , M 2023 , ' Atomic layer deposition of CoF 2 , NiF 2 and HoF 3 thin films ' , Dalton Transactions , vol. 52 , no. 31 , pp. 10844-10854 . https://doi.org/10.1039/d3dt01717f; ORCID: /0000-0003-0880-0427/work/150691719; ORCID: /0000-0003-1703-2247/work/150692504; ORCID: /0000-0002-6210-2980/work/150705213; ORCID: /0000-0003-3745-8296/work/150726299; ORCID: /0000-0001-5830-2800/work/150757662; ORCID: /0000-0002-2662-7202/work/150768049; http://hdl.handle.net/10138/565551; e9429d50-fe51-4879-8c05-4fecbafe9c13; 85167346141; 001031907100001

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    Academic Journal

    المساهمون: Department of Chemistry, Materials Physics, Mikko Ritala / Principal Investigator, HelsinkiALD

    وصف الملف: application/pdf

    Relation: SUOMEN AKATEMIA Vähäkylä Leena; 330086; Weiß , A , Popov , G , Atosuo , E K , Vihervaara , A , Jalkanen , P , Vehkamäki , M , Leskelä , M , Ritala , M & Kemell , M 2022 , ' Atomic Layer Deposition of CsI and CsPbI 3 ' , Chemistry of Materials , vol. 34 , no. 13 , pp. 6087-6097 . https://doi.org/10.1021/acs.chemmater.2c01202; ORCID: /0000-0001-5830-2800/work/119999831; ORCID: /0000-0002-3583-2064/work/119999918; ORCID: /0000-0002-6210-2980/work/119999940; ORCID: /0000-0002-0174-8366/work/120002543; ORCID: /0000-0002-2662-7202/work/120006155; ORCID: /0000-0001-5585-2655/work/120007357; ORCID: /0000-0003-1233-8327/work/159903552; http://hdl.handle.net/10138/349477; 5d0b0e1e-3aae-4ad4-a811-e1df8e24d653; 85134845286; 000821902900001

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    Academic Journal

    المساهمون: Department of Chemistry, Department of Physics, HelsinkiALD, Mikko Ritala / Principal Investigator

    وصف الملف: application/pdf

    Relation: Atosuo , E , Mizohata , K , Mattinen , M , Mäntymäki , M , Vehkamäki , M , Leskelä , M & Ritala , M 2022 , ' Atomic layer deposition of GdF 3 thin films ' , Journal of Vacuum Science Technology A: Vacuum, Surfaces, and Films , vol. 40 , no. 2 , 022402 . https://doi.org/10.1116/6.0001629; RIS: urn:28722F9A4F6C77172C44BC6DE8DF8D9C; ORCID: /0000-0003-0880-0427/work/150691718; ORCID: /0000-0003-1703-2247/work/150692503; ORCID: /0000-0002-6210-2980/work/150705215; ORCID: /0000-0001-5830-2800/work/150757664; ORCID: /0000-0002-2662-7202/work/150768048; ORCID: /0000-0003-4837-1823/work/150779801; http://hdl.handle.net/10138/340089; e043fa02-4d51-4ad4-bf93-e64953aa844e; 85123643966; 000748458300001

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    Academic Journal
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    Academic Journal

    المساهمون: 村上, 美和, 野田, 泰斗, 竹腰, 清乃理, 60455269, 00631384

    وصف الملف: application/pdf

    Relation: http://hdl.handle.net/2433/245036; Solid State Nuclear Magnetic Resonance; 101; 82; 88

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    المساهمون: Department of Chemistry, Doctoral Programme in Materials Research and Nanosciences, Department of Physics, Mikko Ritala / Principal Investigator, Doctoral Programme in Chemistry and Molecular Sciences, Plasma & Materials Processing, Processing of low-dimensional nanomaterials

    المصدر: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 40(2):022402. AVS Science and Technology Society

    وصف الملف: application/pdf

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    Academic Journal

    المؤلفون: Nieminen, Heta, Ritala, Mikko

    المساهمون: Department of Chemistry, Mikko Ritala / Principal Investigator, HelsinkiALD

    وصف الملف: application/pdf

    Relation: Nieminen , H & Ritala , M 2022 , ' Reaction mechanism studies on atomic layer deposition process of AlF 3 ' , Journal of vacuum science & technology : an official journal of the American Vacuum Society , vol. 40 , no. 2 , 022401 . https://doi.org/10.1116/6.0001624; ORCID: /0000-0002-6210-2980/work/110389368; ORCID: /0000-0003-1361-3829/work/110393712; http://hdl.handle.net/10138/339323; bef96dab-264a-4ca6-80b2-5d6c6632f1d7; 000741082300001

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    Dissertation/ Thesis
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    Academic Journal
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    Academic Journal

    المساهمون: Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN)-Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS), Rhodia, Centre de Recherches d'Aubervilliers (RHODIA), RHODIA, Institut de Chimie de la Matière Condensée de Bordeaux (ICMCB), Université de Bordeaux (UB)-Institut Polytechnique de Bordeaux-Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS), Department of Chemistry (NCSU), North Carolina State University Raleigh (NC State), University of North Carolina System (UNC)-University of North Carolina System (UNC)

    المصدر: ISSN: 0020-1669.

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    المصدر: Brazilian Dental Journal, Volume: 28, Issue: 3, Pages: 337-345, Published: JUN 2017
    Brazilian Dental Journal v.28 n.3 2017
    Brazilian Dental Journal
    Fundação Odontológica de Ribeirão Preto (FUNORP)
    instacron:FUNORP

    وصف الملف: text/html

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    Dissertation/ Thesis

    المؤلفون: Taís Fonseca Mantilla

    Thesis Advisors: Patricia Moreira de Freitas Costa e Silva, Taís Scaramucci Forlin, Cecilia Pedroso Turssi

    المصدر: Biblioteca Digital de Teses e Dissertações da USPUniversidade de São PauloUSP.

    مصطلحات موضوعية: Dentina, Erosão, In situ, TiF4, Dentin, Erosion

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    Academic Journal
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    Academic Journal

    المساهمون: Anastasia, Luigi, Giannini, Elio, Zanoni, Giuseppe, Vidari, Giovanni

    مصطلحات موضوعية: BIOMIMETIC CYCLIZATION, CASCADE REACTION, TiF4

    وصف الملف: STAMPA

    Relation: info:eu-repo/semantics/altIdentifier/wos/WOS:000231209000003; volume:46; firstpage:5803; lastpage:5806; numberofpages:4; journal:TETRAHEDRON LETTERS; http://hdl.handle.net/11571/119857; info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-23044486560

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    المساهمون: Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN), Rhodia, Centre de Recherches d'Aubervilliers (RHODIA), RHODIA, Institut de Chimie de la Matière Condensée de Bordeaux (ICMCB), Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Université de Bordeaux (UB), Department of Chemistry (NCSU), North Carolina State University [Raleigh] (NC State), University of North Carolina System (UNC)-University of North Carolina System (UNC), Centre de Recherches d'Aubervilliers, Department of Chemistry, North Carolina Raleigh

    المصدر: Inorganic Chemistry
    Inorganic Chemistry, American Chemical Society, 2005, 44, pp.3589. ⟨10.1021/ic048259w⟩
    Inorganic Chemistry, American Chemical Society, 2005, 44 (10), pp.3589-3593. ⟨10.1021/ic048259w⟩

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