-
1Academic Journal
المؤلفون: Singh, J. (Joseph), Thissen, N.F.W., Kim, W.-H., Johnson, H., Kessels, W.M.M., Bol, A.A., Bent, S.F., Mackus, A.J.M.
المصدر: Singh , J , Thissen , N F W , Kim , W-H , Johnson , H , Kessels , W M M , Bol , A A , Bent , S F & Mackus , A J M 2018 , ' Area-selective atomic layer deposition of metal oxides on noble metals through catalytic oxygen activation ' , Chemistry of Materials , vol. 30 , no. 3 , pp. 663–670 . https://doi.org/10.1021/acs.chemmater.7b03818
وصف الملف: application/pdf
-
2Academic Journal
المؤلفون: Thissen, N.F.W., Vervuurt, R.H.J., Mackus, A.J.M., Mulders, J.J.L., Weber, J.-W., Kessels, W.M.M., Bol, A.A.
المصدر: Thissen , N F W , Vervuurt , R H J , Mackus , A J M , Mulders , J J L , Weber , J-W , Kessels , W M M & Bol , A A 2017 , ' Graphene devices with bottom-up contacts by area-selective atomic layer deposition ' , 2D Materials , vol. 4 , no. 2 , 025046 . https://doi.org/10.1088/2053-1583/aa636a
مصطلحات موضوعية: Atomic layer deposition, Contact induced doping, Contact resistance, Coupling strength, Field-effect transistor, Graphene, Resist residue
وصف الملف: application/pdf
الاتاحة: https://research.tue.nl/en/publications/4237119b-394f-4562-8e40-8a34099a72c0
https://doi.org/10.1088/2053-1583/aa636a
https://pure.tue.nl/ws/files/62764290/Manuscript_NickThissen_Revised_R2.pdf
https://pure.tue.nl/ws/files/58254608/Thissen_2017_2D_Mater._4_025046.pdf
http://www.scopus.com/inward/record.url?scp=85020884673&partnerID=8YFLogxK -
3Academic Journal
المؤلفون: Mackus, A.J.M., Thissen, N.F.W., Mulders, J.J.L., Trompenaars, P.H.F., Chen, Z., Kessels, W.M.M., Bol, A.A.
المصدر: Mackus , A J M , Thissen , N F W , Mulders , J J L , Trompenaars , P H F , Chen , Z , Kessels , W M M & Bol , A A 2017 , ' Resist-free fabricated carbon nanotube field-effect transistors with high-quality atomic-layer-deposited platinum contacts ' , Applied Physics Letters , vol. 110 , no. 1 , 013101 , pp. 1-5 . https://doi.org/10.1063/1.4973359
وصف الملف: application/pdf
-
4Academic Journal
المؤلفون: Thissen, N.F.W., Verheijen, M.A., Houben, R.G., van der Marel, C., Kessels, W.M.M., Bol, A.A.
المصدر: Thissen , N F W , Verheijen , M A , Houben , R G , van der Marel , C , Kessels , W M M & Bol , A A 2017 , ' Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films ' , Carbon , vol. 121 , pp. 389-398 . https://doi.org/10.1016/j.carbon.2017.06.001
وصف الملف: application/pdf
-
5Academic Journal
المؤلفون: Mackus, A.J.M., Weber, M.J., Thissen, N.F.W., Garcia-Alonso Garcia, D., Vervuurt, R.H.J., Assali, S., Bol, A.A., Verheijen, M.A., Kessels, W.M.M.
المصدر: Mackus , A J M , Weber , M J , Thissen , N F W , Garcia-Alonso Garcia , D , Vervuurt , R H J , Assali , S , Bol , A A , Verheijen , M A & Kessels , W M M 2016 , ' Atomic layer deposition of Pd and Pt nanoparticles for catalysis : on the mechanisms of nanoparticle formation ' , Nanotechnology , vol. 27 , no. 3 , 034001 , pp. 1-13 . https://doi.org/10.1088/0957-4484/27/3/034001
مصطلحات موضوعية: atomic layer deposition, catalysis, nanoparticles, palladium, platinum, thin film, nanostructures
وصف الملف: application/pdf
-
6Academic Journal
المؤلفون: Vos, Martijn, Macco, B., Thissen, N.F.W., Bol, A.A., Kessels, W.M.M.
المصدر: Vos , M , Macco , B , Thissen , N F W , Bol , A A & Kessels , W M M 2016 , ' Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma ' , Journal of Vacuum Science and Technology A , vol. 34 , no. 1 , pp. 01A103-1/8 . https://doi.org/10.1116/1.4930161
وصف الملف: application/pdf
-
7Academic Journal
المؤلفون: Thissen, N.F.W., Vervuurt, R.H.J., Mulders, J.J.L., Weber, J.W., Kessels, W.M.M., Bol, A.A.
المصدر: Thissen , N F W , Vervuurt , R H J , Mulders , J J L , Weber , J W , Kessels , W M M & Bol , A A 2015 , ' The effect of residual gas scattering on Ga ion beam patterning of graphene ' , Applied Physics Letters , vol. 107 , 2131101 . https://doi.org/10.1063/1.4936334
وصف الملف: application/pdf
-
8Academic Journal
المؤلفون: Macco, B., Vos, M., Thissen, N.F.W., Bol, A.A., Kessels, W.M.M.
المصدر: Macco , B , Vos , M , Thissen , N F W , Bol , A A & Kessels , W M M 2015 , ' Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells ' , Physica Status Solidi : Rapid Research Letters , vol. 9 , no. 7 , pp. 393-396 . https://doi.org/10.1002/pssr.201510117
وصف الملف: application/pdf
-
9Academic Journal
المؤلفون: Thissen, N.F.W., Mackus, A.J.M., Kessels, W.M.M., Bol, A.A.
المصدر: Thissen , N F W , Mackus , A J M , Kessels , W M M & Bol , A A 2013 , ' Nanofabricage van koolstofnanobuistransistors met atoomlaagdepositie ' , Nevac Blad , vol. 51 , nr. 3 , blz. 10- .
وصف الملف: application/pdf
-
10
المؤلفون: Thissen, N.F.W.
المساهمون: Kessels, W.M.M. (Erwin), Bol, Ageeth A., Plasma & Materials Processing
مصطلحات موضوعية: 16:00h, Auditorium, Collegezaal 5
وصف الملف: application/pdf
-
11Academic Journal
المؤلفون: Chen, Zhihong, Philip Wong, H.-S., Mitra, S., Bol, A.A., Peng, Lianmao, Hills, Gage, Thissen, N.F.W.
المصدر: Chen , Z , Philip Wong , H-S , Mitra , S , Bol , A A , Peng , L , Hills , G & Thissen , N F W 2014 , ' Carbon nanotubes for high-performance logic ' , MRS Bulletin , vol. 39 , pp. 719-726 . https://doi.org/10.1557/mrs.2014.164
-
12Electronic Resource
المؤلفون: Mackus, A.J.M., Weber, M.J., Thissen, N.F.W., Garcia-Alonso Garcia, D., Vervuurt, R.H.J., Assali, S., Bol, A.A., Verheijen, M.A., Kessels, W.M.M.
المصدر: Nanotechnology vol.27 (2016) nr.3 p.1-13 [ISSN 0957-4484]
مصطلحات الفهرس: atomic layer deposition, catalysis, nanoparticles, palladium, platinum, thin film, nanostructures, Tijdschriftartikel, Article
-
13Academic Journal
المؤلفون: Mackus, A.J.M., Thissen, N.F.W., Mulders, J.J.L., Trompenaars, P.H.F., Verheijen, M.A., Bol, A.A., Kessels, W.M.M.
المصدر: Mackus , A J M , Thissen , N F W , Mulders , J J L , Trompenaars , P H F , Verheijen , M A , Bol , A A & Kessels , W M M 2013 , ' Direct-wire atomic layer deposition of high-quality Pt nanostructures : selective growth conditions and seed layer requirements ' , Journal of Physical Chemistry C , vol. 117 , no. 20 , pp. 10788-10798 . https://doi.org/10.1021/jp402260j
-
14Electronic Resource