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المؤلفون: Karsten Arts, Saurabh Karwal, Mariadriana Creatore, Tahsin Faraz, Wilhelmus M. M. Kessels, Marcel A. Verheijen
المساهمون: Plasma & Materials Processing, Mechanical Engineering, Interfaces in future energy technologies, Atomic scale processing, Processing of low-dimensional nanomaterials, EIRES, EIRES Chem. for Sustainable Energy Systems
المصدر: Plasma Chemistry and Plasma Processing, 40(3), 697-712. Springer
مصطلحات موضوعية: Materials science, General Chemical Engineering, 02 engineering and technology, Substrate (electronics), 01 natural sciences, Ion, Atomic layer deposition, Electrical resistivity and conductivity, 0103 physical sciences, Electrical conductivity, Hafnium nitride, Thin film, 010302 applied physics, RF substrate bias, business.industry, Biasing, General Chemistry, Plasma, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Microstructure, Surfaces, Coatings and Films, Optoelectronics, 0210 nano-technology, business
وصف الملف: application/pdf
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المؤلفون: Vivek Beladiya, Tahsin Faraz, Paul Schmitt, Anne-Sophie Munser, Sven Schröder, Sebastian Riese, Christian Mühlig, Daniel Schachtler, Fabian Steger, Roelene Botha, Felix Otto, Torsten Fritz, Christian van Helvoirt, Wilhelmus M. M. Kessels, Hassan Gargouri, Adriana Szeghalmi
المساهمون: Plasma & Materials Processing, Processing of low-dimensional nanomaterials, Atomic scale processing, Publica
المصدر: ACS Applied Materials & Interfaces, 14(12), 14677-14692. American Chemical Society
مصطلحات موضوعية: substrate biasing, tailoring material properties, high-reflective mirrors, laser-induced damage threshold, HfO thin films, General Materials Science, plasma-enhanced ALD, HfO thin films 2
وصف الملف: application/pdf
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المؤلفون: Vivek, Beladiya, Tahsin, Faraz, Paul, Schmitt, Anne-Sophie, Munser, Sven, Schröder, Sebastian, Riese, Christian, Mühlig, Daniel, Schachtler, Fabian, Steger, Roelene, Botha, Felix, Otto, Torsten, Fritz, Christian, van Helvoirt, Wilhelmus M M, Kessels, Hassan, Gargouri, Adriana, Szeghalmi
المصدر: ACS applied materialsinterfaces. 14(12)
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المؤلفون: Vincent Vandalon, Shashank Balasubramanyam, Ageeth A. Bol, Matthew A. Bloodgood, Mark van Ommeren, Marcel A. Verheijen, Tahsin Faraz, Wilhelmus M. M. Kessels
المساهمون: Plasma & Materials Processing, Processing of low-dimensional nanomaterials, Atomic scale processing, EIRES
المصدر: ACS Applied Materials & Interfaces, 12(3), 3873-3885. American Chemical Society
ACS Applied Materials & Interfacesمصطلحات موضوعية: grain size, suppression of 2D vertical layers, Materials science, Nanostructure, 2D WS2, Nanotechnology, 02 engineering and technology, low-temperature processing, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, Grain size, vertical growth of 2D layers, 0104 chemical sciences, 2D WS, Transition metal, General Materials Science, 0210 nano-technology, plasma-enhanced atomic layer deposition, Research Article
وصف الملف: application/pdf
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المؤلفون: Adriaan J. M. Mackus, Erik Heijdra, Wouter J. H. van Gennip, Tahsin Faraz, Wilhelmus M. M. Kessels, Marcel A. Verheijen, Yuri G. P. Verstappen, Javier Escandon Lopez, Nicholas J. Chittock
المساهمون: Plasma & Materials Processing, Applied Physics and Science Education, Selective atomic-scale processing for nanoelectronics, Atomic scale processing, Processing of low-dimensional nanomaterials, EIRES
المصدر: Journal of Applied Physics, 128(21):213301. American Institute of Physics
مصطلحات موضوعية: 010302 applied physics, Materials science, Plasma etching, business.industry, Physics::Instrumentation and Detectors, General Physics and Astronomy, Biasing, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Ion, Computer Science::Other, Sputtering, Etching (microfabrication), Physics::Plasma Physics, 0103 physical sciences, Remote plasma, Optoelectronics, Waveform, Thin film, 0210 nano-technology, business
وصف الملف: application/pdf
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المؤلفون: Marcel A. Verheijen, Tahsin Faraz, Wilhelmus M. M. Kessels, Marc J. M. Merkx, Sander Vlaanderen, Adriaan J. M. Mackus
المساهمون: Plasma & Materials Processing, Selective atomic-scale processing for nanoelectronics, Atomic scale processing, Processing of low-dimensional nanomaterials, EIRES
المصدر: Chemistry of Materials, 32(18), 7788-7795. American Chemical Society
مصطلحات موضوعية: Materials science, General Chemical Engineering, chemistry.chemical_element, 02 engineering and technology, General Chemistry, Dielectric, Nitride, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, Metal, Atomic layer deposition, Chemical engineering, chemistry, visual_art, Materials Chemistry, visual_art.visual_art_medium, Molecule, 0210 nano-technology, Selectivity, Tin, Deposition (chemistry)
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المؤلفون: J. H. Deijkers, Riikka L. Puurunen, Karsten Arts, Harm C. M. Knoops, Tahsin Faraz, Wilhelmus M. M. Kessels
المساهمون: Plasma & Materials Processing, Selective atomic-scale processing for nanoelectronics, Atomic scale processing, Processing of low-dimensional nanomaterials, EIRES, EIRES Chem. for Sustainable Energy Systems, Center for Quantum Materials and Technology Eindhoven, Eindhoven University of Technology, Catalysis, Department of Chemical and Metallurgical Engineering, Aalto-yliopisto, Aalto University
المصدر: Applied Physics Letters, 117(3):031602. American Institute of Physics
مصطلحات موضوعية: 010302 applied physics, Work (thermodynamics), Materials science, Physics and Astronomy (miscellaneous), Analytical chemistry, 02 engineering and technology, Quartz crystal microbalance, Plasma, 021001 nanoscience & nanotechnology, 01 natural sciences, Ion, Atomic layer deposition, Low energy, Membrane, 0103 physical sciences, 0210 nano-technology, Buffered oxide etch
وصف الملف: application/pdf
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المؤلفون: Mariadriana Creatore, Jon Henri, Adriana Szeghalmi, Harm C. M. Knoops, Saurabh Karwal, Marcel A. Verheijen, Vivek Beladiya, Akhil Sharma, Dennis M. Hausmann, Tahsin Faraz, Wilhelmus M. M. Kessels, Cristian A. A. van Helvoirt
المساهمون: Plasma & Materials Processing, Interfaces in future energy technologies, Atomic scale processing, Processing of low-dimensional nanomaterials, Center for Quantum Materials and Technology Eindhoven
المصدر: ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces, 10(15), 13158-13180. American Chemical Societyمصطلحات موضوعية: ion bombardment, nitrides, Materials science, thin film, plasma ALD, Oxide, 02 engineering and technology, Substrate (electronics), Nitride, 01 natural sciences, SiNx, Atomic layer deposition, chemistry.chemical_compound, TiN, 0103 physical sciences, TiO2, General Materials Science, Thin film, Plasma processing, HfO2, 010302 applied physics, business.industry, tuning material properties, HfNx, Biasing, ion energy control, 021001 nanoscience & nanotechnology, substrate biasing, chemistry, atomic layer deposition, oxides, Optoelectronics, SiO2, 0210 nano-technology, Material properties, business, Research Article
وصف الملف: application/pdf
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المؤلفون: Klaus D. Jandt, Vivek Beladiya, Torsten Fritz, Marco Gruenewald, Paul Schenk, Christian Helbing, Felix Otto, Tahsin Faraz, Martin Becker, Wilhelmus M. M. Kessels, Adriana Szeghalmi, Andreas Tünnermann, Marek Sierka
المساهمون: Publica, Plasma & Materials Processing, Atomic scale processing, Processing of low-dimensional nanomaterials, EIRES
المصدر: Nanoscale, 12(3), 2089-2102. Royal Society of Chemistry
مصطلحات موضوعية: Materials science, Oxide, bias voltage, 02 engineering and technology, Substrate (electronics), 01 natural sciences, Atomic layer deposition, chemistry.chemical_compound, Electric field, 0103 physical sciences, Deposition (phase transition), General Materials Science, Thin film, density functional theory, 010302 applied physics, business.industry, computation theory, Biasing, Plasma, 021001 nanoscience & nanotechnology, chemistry, atomic layer deposition, Optoelectronics, crystal atomic structure, 0210 nano-technology, business
وصف الملف: application/pdf
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المؤلفون: Maarten van Drunen, Dennis M. Hausmann, Tahsin Faraz, Wilhelmus M. M. Kessels, Harm C. M. Knoops, Anupama Mallikarjunan, Iain Buchanan, Jon Henri
المساهمون: Plasma & Materials Processing, Atomic scale processing, Processing of low-dimensional nanomaterials
المصدر: ACS Applied Materials & Interfaces, 9(2), 1858-1869. American Chemical Society
مصطلحات موضوعية: Silicon nitride, Materials science, Wet etch, Nanotechnology, 02 engineering and technology, Substrate (electronics), 01 natural sciences, DSBAS, law.invention, Atomic layer deposition, chemistry.chemical_compound, Planar, law, 0103 physical sciences, General Materials Science, Thin film, 010302 applied physics, Transistor, Di(sec-butylamino)silane, Plasma, Atmospheric temperature range, 021001 nanoscience & nanotechnology, Silane, Chemical engineering, chemistry, ALD, Plasma ALD, 0210 nano-technology
وصف الملف: application/pdf
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المؤلفون: Martijn F. J. Vos, Tahsin Faraz, Nicholas J. Chittock, Wilhelmus M. M. Kessels, Harm C. M. Knoops, Adriaan J. M. Mackus
المساهمون: Plasma & Materials Processing, Selective atomic-scale processing for nanoelectronics, Atomic scale processing, Processing of low-dimensional nanomaterials, EIRES, EIRES Chem. for Sustainable Energy Systems, Center for Quantum Materials and Technology Eindhoven
المصدر: Applied Physics Letters, 117(16):162107. American Institute of Physics
مصطلحات موضوعية: 010302 applied physics, Materials science, Physics and Astronomy (miscellaneous), Isotropy, Analytical chemistry, Infrared spectroscopy, 02 engineering and technology, Plasma, 021001 nanoscience & nanotechnology, 01 natural sciences, Isotropic etching, chemistry.chemical_compound, Nanolithography, chemistry, Transmission electron microscopy, Etching (microfabrication), 0103 physical sciences, 0210 nano-technology, Trimethylaluminium
وصف الملف: application/pdf
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المؤلفون: Tahsin Faraz, Wilhelmus M. M. Kessels, Adriana Szeghalmi, Andreas Tünnermann, Vivek Beladiya
المساهمون: Plasma & Materials Processing, Atomic scale processing, Processing of low-dimensional nanomaterials
المصدر: Advances in Optical Thin Films VI
مصطلحات موضوعية: Materials science, plasma ALD, optical loss, 02 engineering and technology, Substrate (electronics), 01 natural sciences, aluminum oxide, Atomic layer deposition, X-ray photoelectron spectroscopy, Ellipsometry, 0103 physical sciences, XPS, Thin film, Fourier transform infrared spectroscopy, 010302 applied physics, business.industry, mechanical stress, Biasing, 021001 nanoscience & nanotechnology, X-ray reflectivity, substrate biasing, atomic layer deposition, Optoelectronics, 0210 nano-technology, business, ellipsometry
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المؤلفون: Wmm Erwin Kessels, Hcm Harm Knoops, Tahsin Faraz, Fred Roozeboom
المساهمون: Plasma & Materials Processing, Atomic scale processing, Processing of low-dimensional nanomaterials
المصدر: ECS Journal of Solid State Science and Technology, 4(6), NS-023/032. Electrochemical Society, Inc.
ECS Journal of Solid State Science and Technology, 6, 4, N5023-N5032مصطلحات موضوعية: TS - Technical Sciences, Industrial Innovation, Materials science, Atomic layer etching, Atomic layer deposition, Nanotechnology, Semiconductor device, Electronic, Optical and Magnetic Materials, TFT - Thin Film Technology, Etching (microfabrication), Monolayer, Atomic layer epitaxy, Nano Technology, Nanometre, Dry etching, Energy Materials Industry Electronics, Layer (electronics)
وصف الملف: application/pdf; application/x-www-form-urlencoded; charset=utf-8
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المؤلفون: Tahsin Faraz
المصدر: ECS Meeting Abstracts. :1135-1135
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المؤلفون: Karsten Arts, Tahsin Faraz, Erwin Kessels, Harm C. M. Knoops
المساهمون: Plasma & Materials Processing, Atomic scale processing, Processing of low-dimensional nanomaterials, Center for Quantum Materials and Technology Eindhoven
المصدر: Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 37(3):030902. AVS Science and Technology Society
مصطلحات موضوعية: Fabrication, Materials science, Nanotechnology, 02 engineering and technology, Surfaces and Interfaces, Plasma, 010402 general chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Atomic units, 0104 chemical sciences, Surfaces, Coatings and Films, Atomic layer deposition, Etching (microfabrication), Electronics, 0210 nano-technology, Layer (electronics), Nanoscopic scale
وصف الملف: application/pdf
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المؤلفون: Tahsin, Faraz, Maarten, van Drunen, Harm C M, Knoops, Anupama, Mallikarjunan, Iain, Buchanan, Dennis M, Hausmann, Jon, Henri, Wilhelmus M M, Kessels
المصدر: ACS applied materialsinterfaces. 9(2)
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المساهمون: Plasma & Materials Processing, Atomic scale processing, Processing of low-dimensional nanomaterials, Center for Quantum Materials and Technology Eindhoven
المصدر: Plasma Sources Science and Technology, 28(2):024002. Institute of Physics
مصطلحات موضوعية: 010302 applied physics, RFEA, displacement energy threshold, Work (thermodynamics), Materials science, ion energy dose, plasma ALD, Biasing, Substrate (electronics), Plasma, Condensed Matter Physics, 01 natural sciences, 010305 fluids & plasmas, Ion, Atomic layer deposition, substrate biasing, Chemical physics, atomic layer deposition, 0103 physical sciences, Atom, ion energy flux, Material properties
وصف الملف: application/pdf
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المؤلفون: Jurgen Palmans, Tahsin Faraz, Wilhelmus M. M. Kessels, Mariadriana Creatore, Marcel A. Verheijen
المساهمون: Plasma & Materials Processing, Interfaces in future energy technologies, Atomic scale processing, Processing of low-dimensional nanomaterials
المصدر: Journal of Physics D: Applied Physics, 49(5):055205. Institute of Physics
مصطلحات موضوعية: Materials science, Acoustics and Ultrasonics, microcrystalline silicon, nucleation, Nucleation, Flux, 02 engineering and technology, Substrate (electronics), 01 natural sciences, 0103 physical sciences, substrate topography, substrate nature, nano-imprint lithography, 010302 applied physics, Surface diffusion, 021001 nanoscience & nanotechnology, Condensed Matter Physics, plasma-surface interactions, Surface energy, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Crystallography, Microcrystalline, Chemical physics, thin-film solar cells, Classical nucleation theory, Crystallite, 0210 nano-technology
وصف الملف: application/pdf
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المؤلفون: Tahsin Faraz, Sabbir Ahmed Khan, Asif Iqbal, Nafiz Ur Rahman
المصدر: NEMS
مصطلحات موضوعية: Fabrication, Materials science, Transition metal, Condensed matter physics, Electrical resistivity and conductivity, business.industry, Antiferromagnetism, Optoelectronics, Semiconductor device, Metal–insulator transition, Epitaxy, business, Perovskite (structure)
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المؤلفون: Tahsin Faraz, A. Azad
المصدر: GHTC
مصطلحات موضوعية: Battery (electricity), Engineering, business.industry, Off-the-grid, Photovoltaic system, Electrical engineering, ComputerApplications_COMPUTERSINOTHERSYSTEMS, Solar energy, Renewable energy, Charging station, Solar battery, Hardware_GENERAL, ComputerSystemsOrganization_SPECIAL-PURPOSEANDAPPLICATION-BASEDSYSTEMS, Electricity, business