المؤلفون: Kazunari Takada, Nobumitu Niina, Toshirou Itani, hiroaki oizumi, hiroto Kudo, ken Maruyama, tadatomi Nishikubo, toshiyuki Kai, tutomu Shimokawa, 下川 努, 丸山 研, 井谷 俊郎, 工藤 宏人, 新名 伸光, 甲斐 敏之, 老泉 博昭, 西久保 忠臣, 高田 量成

المصدر: Polymer Preprints, Japan. 2010, :3942

المؤلفون: Hiroto KUDO, Hiroyuki SEKI, Ken MARUYAMA, Tadatomi NISHIKUBO, Toshiyuki KAI, Tsutomu SHIMOKAWA, Yuki KATO, 下川 努, 丸山 研, 加藤 由貴, 工藤 宏人, 甲斐 敏之, 西久保 忠臣, 関 浩之

المصدر: Polymer Preprints, Japan. 2009, :1289

المؤلفون: HIROTO KUDO, KEN MARUYAMA, NOBUMITSU NIINA, TADATOMI NISHIKUBO, TOSHIYUKI KAI, TSUTOMU SHIMOKAWA, 下川 努, 丸山 研, 工藤 宏人, 新名 伸光, 甲斐 敏之, 西久保 忠臣

المصدر: Polymer Preprints, Japan. 2009, :1278

المؤلفون: Akio Saitou, Satoru Nishiyama, Toshiyuki Kai, Tsutomu Shimokawa

المصدر: Journal of Photopolymer Science and Technology. 2003, 16(3):447

المؤلفون: Akio Saitou, Daisuke Shimizu, Iwao Nishiyama, Ken Maruyama, Koichi Fujiwara, Toshiyuki Kai, Tsutomu Shimokawa, Yukiko Kikuchi

المصدر: Journal of Photopolymer Science and Technology. 2007, 20(3):423

المؤلفون: Seiichi Tagawa, Takahiro Kozawa, Toshiyuki Kai, Tsutomu Shimokawa

المصدر: Journal of Photopolymer Science and Technology. 2007, 20(4):577

المؤلفون: Ken Maruyama, Kouta Nishino, Makoto Shimizu, Tooru Kimura, Toshiyuki Kai, Yuuki Hirai

المصدر: Journal of Photopolymer Science and Technology. 2010, 23(5):643

المؤلفون: HIROAKI OIZUMI, hiroto KUDO, hiroyuki SEKI, ken MARUYAMA, tadatomi NISHIKUBO, toshirou ITANI, toshiyuki KAI, tsutomu SHIMOKAWA, yuki KATO, 下川 努, 丸山 研, 井谷 俊郎, 加藤 由貴, 工藤 宏人, 甲斐 敏之, 老泉 博昭, 西久保 忠臣, 関 浩之

المصدر: Polymer Preprints, Japan. 2009, :4364

المؤلفون: Hiroaki Oizumi, Hiroto Kudo, Ken Maruyama, Nobumitsu Niina, Tadatomi Nishikubo, Toshiro Itani, Toshiyuki Kai, Tsutomu Shimokawa, 下川 努, 丸山 研, 井谷 俊朗, 工藤 宏人, 新名 伸光, 甲斐 敏之, 老泉 博昭, 西久保 忠臣

المصدر: Polymer Preprints, Japan. 2009, :4362

المؤلفون: Ken Maruyama, Tadatomi Nishikubo, Toshiro Itani, Tsutomu Shimokawa, Hiroaki Oizumi, Hiroto Kudo, Nobumitsu Niina, Toshiyuki Kai

المصدر: Polymer Journal. 43:407-413

مصطلحات موضوعية: Noria, Reaction mechanism, Polymers and Plastics, Chemistry, Extreme ultraviolet lithography, Photoresist, Condensation reaction, law.invention, law, Polymer chemistry, Materials Chemistry, Alkoxy group, Photolithography, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5aa35b929bdbd32a674157fa4aa883eb
https://doi.org/10.1038/pj.2010.146

المؤلفون: Toshiyuki Kai, Tsutomu Shimokawa, Seiichi Tagawa, Kenichiro Natsuda, Takahiro Kozawa, Akinori Saeki

المصدر: Japanese Journal of Applied Physics. 47:4932-4935

مصطلحات موضوعية: Physics and Astronomy (miscellaneous), Chemistry, Extreme ultraviolet, Radiolysis, General Engineering, Solvation, General Physics and Astronomy, Reactivity (chemistry), Electron, Atomic physics, Radiation, Solvated electron, Secondary electrons

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3ca7dad8165457a9b967c92b4b4b7594
https://doi.org/10.1143/jjap.47.4932

المؤلفون: Atsuro Nakano, Seiichi Tagawa, Kazumasa Okamoto, Toshiyuki Kai, Takahiro Kozawa, Tsutomu Shimokawa

المصدر: Japanese Journal of Applied Physics. 45:6866-6871

مصطلحات موضوعية: chemistry.chemical_classification, Reaction mechanism, Physics and Astronomy (miscellaneous), Proton, Chemistry, Extreme ultraviolet lithography, General Engineering, General Physics and Astronomy, Polymer, Photochemistry, law.invention, Deprotonation, Resist, law, Yield (chemistry), Photolithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a689569e3f89fd6a9979d7bf2e00549b
https://doi.org/10.1143/jjap.45.6866

المؤلفون: James F. Wishart, Seiichi Tagawa, Atsuro Nakano, Toshiyuki Kai, Takahiro Kozawa, Tsutomu Shimokawa, Tomasz Szreder

المصدر: Japanese Journal of Applied Physics. 45:L197-L200

مصطلحات موضوعية: Physics and Astronomy (miscellaneous), Chemistry, Extreme ultraviolet, Extreme ultraviolet lithography, General Engineering, Cathode ray, General Physics and Astronomy, Reactivity (chemistry), Electron, Solvated electron, Photochemistry, Electron-beam lithography, Ionizing radiation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0e14d5fda13d35049c8d2d0c42fe76eb
https://doi.org/10.1143/jjap.45.l197

المؤلفون: Toshiyuki Kai, Daisuke Shimizu, Takahiro Kozawa, Seiichi Tagawa, Ryo Hirose, Tsutomu Shimokawa

المصدر: Japanese Journal of Applied Physics. 47:7125-7127

مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Physics and Astronomy (miscellaneous), business.industry, Extreme ultraviolet lithography, General Engineering, General Physics and Astronomy, Polymer, Photochemistry, chemistry.chemical_compound, Semiconductor, Deprotonation, Resist, chemistry, Extreme ultraviolet, Methyl methacrylate, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fe0b13e16925cb811ffb232c744c2156
https://doi.org/10.1143/jjap.47.7125

المؤلفون: Tsutomu Shimokawa, Takahiro Kozawa, Toshiyuki Kai, Seiichi Tagawa, Ryo Hirose

المصدر: Japanese Journal of Applied Physics. 46:L979-L981

مصطلحات موضوعية: Range (particle radiation), Materials science, Key factors, Physics and Astronomy (miscellaneous), Resist, Acid sensitive, Extreme ultraviolet, Extreme ultraviolet lithography, Attenuation coefficient, General Engineering, Analytical chemistry, General Physics and Astronomy, Molecule

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5aead842b6ce45a02ebede42cdd03326
https://doi.org/10.1143/jjap.46.l979

المؤلفون: Kouta Nishino, Ken Maruyama, Tooru Kimura, Toshiyuki Kai, Kentaro Goto, Shalini Sharma

المصدر: SPIE Proceedings.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::261f723332cb8deed5ee9247e28c0917
https://doi.org/10.1117/12.879430

المؤلفون: Tomohisa Fujisawa, Toshiyuki Kai, Tooru Kimura, Yoshi Hishiro, Hiroki Nakagawa, Kentaro Goto

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, law.invention, Resist, Etching (microfabrication), law, Optoelectronics, X-ray lithography, Photolithography, business, Lithography, Next-generation lithography, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1f66a0a36f44327ef58ea9e7736b7998
https://doi.org/10.1117/12.879303

المؤلفون: Tooru Kimura, Toshiyuki Kai, Shalini Sharma, Ken Maruyama, Kouta Nishino, Makoto Shimizu, Yuuki Hirai, Kentaro Goto

المصدر: SPIE Proceedings.

مصطلحات موضوعية: chemistry.chemical_classification, Noria, Materials science, business.industry, Extreme ultraviolet lithography, Polymer, law.invention, Resist, chemistry, law, Extreme ultraviolet, Optoelectronics, Quantum efficiency, Photolithography, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::356914fd70ccec96a0cdd43ea8a0a636
https://doi.org/10.1117/12.846332

المؤلفون: Tsutomu Shimokawa, Toshiyuki Kai, Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa

المصدر: Advances in Resist Materials and Processing Technology XXV.

مصطلحات موضوعية: Materials science, Optics, Resist, business.industry, Extreme ultraviolet lithography, Extreme ultraviolet, Attenuation coefficient, Analytical chemistry, Ionic bonding, Molecule, Molecular electronics, Absorption (electromagnetic radiation), business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::92d5717df782c5e3708400d090376e08
https://doi.org/10.1117/12.772569

المؤلفون: Takahiro Kozawa, Toshiyuki Kai, Akinori Saeki, Seiichi Tagawa, Kenichiro Natsuda, Tsutomu Shimokawa

المصدر: 2007 Digest of papers Microprocesses and Nanotechnology.

مصطلحات موضوعية: Materials science, Resist, Yield (chemistry), Extreme ultraviolet lithography, Solvation, Electron, Solvated electron, Photochemistry, Secondary electrons

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e126c3ea20fdda72be0ba50911ab2ccf
https://doi.org/10.1109/imnc.2007.4456113