المؤلفون: Z Luo, A Steegen, M Eller, R Mann, C Baiocco, P Nguyen, L Kim, M Hoinkis, V Ku, V Klee3, F Jamin, P Wrschka, P Shafer, W Lin2, S Fang, A Ajmera, W Tan2, D Park, R Mo, J Lian3, D Vietzke3, C Co, A Vayshenker, T Hook, V Chan, K Kim3, A Cowley, S Kim3, E T Schiml, J Sudijono&apos, I Yang, Clement Wann, B Kaltalioglu3, P Zhang, S Marokkef, Y Lin, K Lee&apos, H Zhu, M Weybright, R Rengarajan, Technology J Ku4

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://randywmann.com/pubs/lou2004.pdf.

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.1054.9626; http://randywmann.com/pubs/lou2004.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.1054.9626
http://randywmann.com/pubs/lou2004.pdf

المؤلفون: I. Yang, F. Zhang, A. Tilke, P. Wrschka, Y.-H. Lin, J. Lian, P. Nguyen, V. Ramanchandran, Gregory M. Johnson, L.S. Leong, Atul C. Ajmera, A. Ebert, S.O. Kim, H. Zhuang, M.-C. Sun, J.-P. Kim, Andy Cowley, Christopher V. Baiocco, J.-H. Ku, W. Lin, J. Greg Massey, Alvin G. Thomas, M. Naujok, A. Vayshenker, G. Leake, A. Fischer, M. Sherony, E. Kaltalioglu, K. Hooper, Dirk Vietzke, C. Griffin, Y.-W. Teh, W. Gao, J. Sudijohno, Manfred Eller, Randy W. Mann, G. Matusiewicz, Y.K. Siew, T. Schiml, Renee T. Mo, S.-M. Choi, R. Knoefler, W.L. Tan, J. Benedict, T. Pompl, J.-H. Yang, F.F. Jamin, Fernando Guarin, K.C. Park, K.-W. Lee, An L. Steegen, Jae-Eun Park, S. Scheer, V. Klee, D.H. Hong, L. Tai, V. Ku, S.L. Liew

المصدر: IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..

مصطلحات موضوعية: Interconnection, Reliability (semiconductor), Materials science, CMOS, business.industry, Low-power electronics, Gate dielectric, Electrical engineering, Optoelectronics, Static random-access memory, business, Voltage, Power (physics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::80b515e6807384d732a1a136ebc7ef9d
https://doi.org/10.1109/iedm.2005.1609267

المؤلفون: Matthias Hierlemann, J. Yuan, Thomas W. Dyer, Terence B. Hook, J. Sudijono, R. Stierstorfer, J. Kim, JiYeon Ku, R. Amos, Z. Luo, James Chingwei Li, K. Barton, R. Lindsay, S. Fang, Z. Yang, K. Ng, S.S. Tan, Nivo Rovedo, Yoo-Mi Lee, Woei Ming Lee, T. Schiml, V. Sardesai

المصدر: Scopus-Elsevier

مصطلحات موضوعية: Engineering, Reliability (semiconductor), Digital subscriber line, Nanoelectronics, business.industry, Low-power electronics, MOSFET, Electrical engineering, Electronic engineering, business, NMOS logic, PMOS logic, Power (physics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5fc1aacc4555d8d9b17d3bc83e75495d
https://doi.org/10.1109/vlsit.2006.1705236

المؤلفون: Erdem Kaltalioglu, Zhijiong Luo, Victor Ku, Y. H. Lin, A. Ajmera, Seong-Dong Kim, T. Schiml, W. L. Tan, S. Marokkey, P. Wrschka, Dirk Vietzke, M. Weybright, F.F. Jamin, R. Mo, D.-G. Park, An L. Steegen, Wenhe Lin, Padraic Shafer, Terence B. Hook, V. Klee, JiYeon Ku, Rajesh Rengarajan, C. Wann, K. Kim, Jenny Lian, Andy Cowley, Victor Chan, Sunfei Fang, A. Vayshenker, K-C. Lee, Christopher V. Baiocco, I. Yang, L. Kim, Manfred Eller, Randy W. Mann, B. Zhang, C. Coppock, Mark Hoinkis, J. Sudijono, Huilong Zhu, Phung T. Nguyen

المصدر: Scopus-Elsevier

مصطلحات موضوعية: Space technology, Materials science, business.industry, Electrical engineering, CMOS, Gate oxide, Low-power electronics, MOSFET, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Power semiconductor device, Node (circuits), business, Voltage

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d5455847fc85f7a2c23cdb1895e40c02
https://doi.org/10.1109/iedm.2004.1419254

المؤلفون: Thomas Schafbauer, S. Sportouch, Baozhen Li, Pak Leung, Y. H. Lin, Yi-Cheng Chen, Yimin Huang, Phung T. Nguyen, Chuan Lin, Shih-Fen Huang, Ming-Tsan Lee, A. Olbrich, Philipp Riess, J. Brighten, G. Knoblinger, Andy Cowley, U. Hodel, A. Grassmann, W. Nissl, Dirk Vietzke, Kun-Chi Lin, Larry Clevenger, Kai Esmark, Robert C. Wong, Hsiang-Jen Huang, C. Wann, M. Commons, Alan J. Leslie, T. Schiml, Martin Wendel, Qiuyi Ye, Erdem Kaltalioglu, Nivo Rovedo, Alvin G. Thomas

المصدر: 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303).

مصطلحات موضوعية: Materials science, business.industry, Electrical engineering, Mixed-signal integrated circuit, Capacitance, law.invention, Capacitor, CMOS, law, Low-power electronics, Microelectronics, Radio frequency, business, Low voltage

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9a1f93d57ef161cbbc8cc1ab25585ee1
https://doi.org/10.1109/vlsit.2002.1015388

المؤلفون: P. Wensley, Norman Robson, B. Lemaitre, E. Demm, F. Grellner, C. Wann, P. Kim, Klaus Schruefer, Robert C. Wong, G. Friese, G. Knoblinger, O. Prigge, R. Zoeller, Robert Hannon, J. Barth, G. Brase, Mark Hoinkis, Reinhard Mahnkopf, J. Pape, S.S. Iyer, T. Schiml, B. Flietner, K. Han, K. Holloway, F. Towler, Michael D. Armacost, A. Augustin, Nivo Rovedo, R. Busch, R. Mih, Terence B. Hook, W. Neumueller, G. Dietz, Chih-Yung Lin, B. Chen, S. Srinivasan, M. Stetter, Herbert L. Ho, Thomas Schafbauer, K.-H. Allers

المصدر: International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318).

مصطلحات موضوعية: Engineering, business.industry, Copper interconnect, Electrical engineering, Mixed-signal integrated circuit, Hardware_PERFORMANCEANDRELIABILITY, eDRAM, Modular design, law.invention, Capacitor, Hardware_GENERAL, law, Low-power electronics, Hardware_INTEGRATEDCIRCUITS, System on a chip, business, Realization (systems)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8fa20d96b8d7c82b1289914c78639a1d
https://doi.org/10.1109/iedm.1999.824282

المؤلفون: Y.O. Kim, T. Schiml, George E. Georgiou, M. Furtsch, J. Bevk, M. Frei, H. S. Luftman, Steven James Hillenius, P.J. Silverman, E.J. Lloyd

المصدر: Proceedings of International Electron Devices Meeting.

مصطلحات موضوعية: Ion implantation, Materials science, CMOS, Dopant, business.industry, Electrical engineering, Optoelectronics, Polycide, Dopant Activation, business, Sheet resistance, NMOS logic, Threshold voltage

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b0689aff9697cbbabece9665565bbaae
https://doi.org/10.1109/iedm.1995.499360

المؤلفون: E. Hsiung, Terry A. Spooner, G. Brase, Erdem Kaltalioglu, F. Grellner, Mark Hoinkis, B. von Ehrenwall, D. Warner, Klaus Schruefer, T. Schiml, L. Burrell, Robert C. Wong, C. Wang, Thomas Schafbauer, A. Von Ehrenwall, Tobias Mono, P. Kim, G. Knoblinger, Fernando Guarin, K.C. Chen, Petra Felsner, Alan J. Leslie, Uwe Schroeder, S. Biesemans, E. Demm, Andy Cowley, J. Gill, L.K. Han, S. Kulkarni, P. Leung

المصدر: 2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184).

مصطلحات موضوعية: Engineering, business.industry, Copper interconnect, Electrical engineering, Mixed-signal integrated circuit, Hardware_PERFORMANCEANDRELIABILITY, law.invention, Capacitor, CMOS, law, Low-power electronics, Hardware_INTEGRATEDCIRCUITS, System on a chip, Resistor, business, Dram

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1a52140b062f05c7d625e27c2facbcf4
https://doi.org/10.1109/vlsit.2001.934969

المؤلفون: C. Wann, N. Rovedo, Yimin Huang, Jia Chen, Yao-Ching Cheng, J. Brighten, Chih-Yung Lin, Shui-Ming Cheng, Ming-Tsan Lee, Thomas Schafbauer, Jen-Kon Chen, A. Grassmann, Alvin G. Thomas, B. von Ehrenwall, N. Chen, Pak Leung, O.S. Park, S. Sportouch, C.H. Liu, Shih-Fen Huang, Manfred Eller, M. Commons, Stewart E. Rauch, Erdem Kaltalioglu, Yu-Shyang Huang, T. Schiml, Wei Jin, L. Clevenger

المصدر: International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224).

مصطلحات موضوعية: Leading edge, Engineering, business.industry, Transistor, Electrical engineering, Hardware_PERFORMANCEANDRELIABILITY, Dielectric, AC power, law.invention, Microprocessor, CMOS, Hardware_GENERAL, law, Low-power electronics, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, business, Lithography, Hardware_LOGICDESIGN

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2d8cf12dc12ca0ab0452598bab6fc228
https://doi.org/10.1109/iedm.2001.979474

المؤلفون: T. Schiml, L.K. Han, C. Wann, S. Biesemans, Chih-Yung Lin, Jen-Kon Chen, Reinhard Mahnkopf, K. Houlihan, Klaus Schruefer

المصدر: International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).

مصطلحات موضوعية: Materials science, business.industry, Oxide, Trapping, PMOS logic, chemistry.chemical_compound, CMOS, chemistry, Gate oxide, Degradation (geology), Optoelectronics, business, NMOS logic, Hot-carrier injection

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5cd3151b1a4e68a3c99c86a323de40f7
https://doi.org/10.1109/iedm.2000.904276

المؤلفون: T. Schiml, Reinhard Mahnkopf, A. Schmidt, K. Houlihan, Vincent J. McGahay, John E. Heidenreich, M. Stetter, D. Warner, S. Biesemans, Bomy A. Chen, Chuan Lin, C. Wann, Uwe Schroeder, L.K. Han

المصدر: 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104).

مصطلحات موضوعية: Engineering, business.industry, Electrical engineering, Hardware_PERFORMANCEANDRELIABILITY, Modular design, Chip, Electricity generation, CMOS, Low-power electronics, Hardware_INTEGRATEDCIRCUITS, System on a chip, business, Lithography, Dram

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e55c3c0d3e1a95b922f1082c37adeadc
https://doi.org/10.1109/vlsit.2000.852749

المؤلفون: George E. Georgiou, Joze Bevk, Steven James Hillenius, M. Furtsch, P. J. Silverman, H. S. Luftman, T. Schiml, D. Schielein

المصدر: MRS Proceedings. 429

مصطلحات موضوعية: Materials science, business.industry, Annealing (metallurgy), Hardware_PERFORMANCEANDRELIABILITY, Semiconductor device, Threshold voltage, Ion implantation, CMOS, Gate oxide, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Polycide, business, NMOS logic

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1710ad79b3406e9881386a1fd361bc00
https://doi.org/10.1557/proc-429-115

المؤلفون: W. Mansfield, M. Furtsch, P. J. Silverman, Joze Bevk, George E. Georgiou, H. S. Lufrman, Raymond A. Cirelli, T. Schiml

المصدر: MRS Proceedings. 429

مصطلحات موضوعية: Secondary ion mass spectrometry, Materials science, CMOS, Dopant, business.industry, Thermal, Analytical chemistry, Optoelectronics, Polycide, Process optimization, Dopant Activation, Diffusion (business), business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::929696d381b06462bff58dc67a84647d
https://doi.org/10.1557/proc-429-121