المؤلفون: Menelaos Tsigkourakos, Bivragh Majeed, Thomas Nuytten, T. Clarysse, Kristof Paredis, A. Ajaykumar, Pierre Eyben, Thomas Hantschel, F. Seidel, Wilfried Vandervorst, D. S. Tezcan

المصدر: Microelectronic Engineering. 121:19-23

مصطلحات موضوعية: Materials science, Fabrication, Scanning electron microscope, Doping, chemistry.chemical_element, Diamond, Nanotechnology, Tungsten, engineering.material, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Characterization (materials science), chemistry, Nanoelectronics, engineering, Electrical and Electronic Engineering, Nanoprobing

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::22d780ac330f32aa5dfe43f1e8ce7f3d
https://doi.org/10.1016/j.mee.2014.02.024

المؤلفون: Roger Loo, Kristiaan Temst, M. Adachi, Shigeaki Zaima, Jelle Demeulemeester, Marika Nakamura, T. Clarysse, Federica Gencarelli, Osamu Nakatsuka, Shotaro Takeuchi, Matty Caymax, André Vantomme, Yosuke Shimura, Benjamin Vincent

المصدر: ECS Transactions. 41:231-238

مصطلحات موضوعية: Materials science, CMOS, business.industry, Optoelectronics, business, Engineering physics, Technology impact

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8d4e6cfec3bc5a8f129976c83258173a
https://doi.org/10.1149/1.3633303

المؤلفون: Johan Dekoster, André Vantomme, Shigeaki Zaima, Jelle Demeulemeester, T. Clarysse, Tsuyoshi Nishimura, Akira Sakai, Matty Caymax, Shotaro Takeuchi, Yosuke Shimura, Geert Eneman, Osamu Nakatsuka, Roger Loo, Benjamin Vincent

المصدر: Solid-State Electronics. 60:53-57

مصطلحات موضوعية: Materials science, Annealing (metallurgy), business.industry, Doping, Analytical chemistry, Condensed Matter Physics, Epitaxy, Crystallographic defect, Electronic, Optical and Magnetic Materials, Crystal, Lattice constant, Semiconductor, Materials Chemistry, Electronic engineering, Crystallite, Electrical and Electronic Engineering, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::250467647f77db6e976e0ce873435c98
https://doi.org/10.1016/j.sse.2011.01.022

المؤلفون: Johan Dekoster, Roger Loo, T. Clarysse, Andrea Firrincieli, Shotaro Takeuchi, Benjamin Vincent, Tsuyoshi Nishimura, Matty Caymax, Jelle Demeulemeester, Geert Eneman, Shigeaki Zaima, Yosuke Shimura, Osamu Nakatsuka, André Vantomme

المصدر: Microelectronic Engineering. 88:342-346

مصطلحات موضوعية: Materials science, Silicon, business.industry, Binary alloy, chemistry.chemical_element, Germanium, Strained silicon, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Lattice constant, chemistry, MOSFET, Semiconductor alloys, Optoelectronics, Commutation, Electrical and Electronic Engineering, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::24be97c9f2fd6d5a3907ba08e1f9cf1b
https://doi.org/10.1016/j.mee.2010.10.025

المؤلفون: Osamu Nakatsuka, Akira Sakai, Jelle Demeulemeester, Geert Eneman, Benjamin Vincent, André Vantomme, T. Clarysse, J Dekoster, Roger Loo, Shigeaki Zaima, Yosuke Shimura, Matty Caymax, Shotaro Takeuchi, Kristiaan Temst, Tsuyoshi Nishimura

المصدر: ECS Transactions. 33:529-535

مصطلحات موضوعية: Materials science, CMOS, business.industry, Optoelectronics, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::893a19b634cae7be9236c9b9f16413ab
https://doi.org/10.1149/1.3487583

المؤلفون: W. Vandervorst, D. Vanhaeren, T. Clarysse, Alain Moussa, Pierre Eyben, Thomas Hantschel, Edouard Duriau

المصدر: Microelectronic Engineering. 86:1234-1237

مصطلحات موضوعية: Hard metal, Fabrication, Cantilever, Materials science, Spreading resistance profiling, business.industry, Conductive atomic force microscopy, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Scanning probe microscopy, Optics, Microscopy, Electrical and Electronic Engineering, Thin film, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::700b8d57b9cd6fefe92f55e96ca852c9
https://doi.org/10.1016/j.mee.2008.11.098

المؤلفون: Thomas Hantschel, Edouard Duriau, W. Vandervorst, T. Clarysse

المصدر: Microelectronic Engineering. 84:1162-1167

مصطلحات موضوعية: Materials science, Fabrication, Cantilever, Spreading resistance profiling, business.industry, Transistor, Nanotechnology, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Characterization (materials science), Data acquisition, CMOS, law, Miniaturization, Optoelectronics, Electrical and Electronic Engineering, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::92be9070c4703ba76ea9603238c8b6d1
https://doi.org/10.1016/j.mee.2007.01.072

المؤلفون: Wilfried Vandervorst, T. Clarysse

المصدر: Solid-State Electronics. 33:1587-1600

مصطلحات موضوعية: Physics, Basis (linear algebra), Spreading resistance profiling, Mechanics, Radius, Condensed Matter Physics, Stability (probability), Instability, Electronic, Optical and Magnetic Materials, Variable (computer science), Electrical resistivity and conductivity, Control theory, Materials Chemistry, Electrical and Electronic Engineering

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::afb4ad9152c2b033199bcef7e31cd503
https://doi.org/10.1016/0038-1101(90)90139-6

المؤلفون: W. Vandervorst, T. Clarysse

المصدر: Journal of The Electrochemical Society. 137:679-683

مصطلحات موضوعية: Very-large-scale integration, Materials science, Dopant, Spreading resistance profiling, Renewable Energy, Sustainability and the Environment, business.industry, Electrical engineering, Integrated circuit, Mechanics, Condensed Matter Physics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Interpretation (model theory), law, Materials Chemistry, Electrochemistry, Carrier profile, business, Junction depth

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c1042452f85f55d0914a8eac5c350307
https://doi.org/10.1149/1.2086531

المؤلفون: V. N. Faifer, D. K. Schroder, M. I. Current, T. Clarysse, P. J. Timans, T. Zangerle, W. Vandervorst, T. M. H. Wong, A. Moussa, S. McCoy, J. Gelpey, W. Lerch, S. Paul, D. Bolze, David G. Seiler, Alain C. Diebold, Robert McDonald, C. Michael Garner, Dan Herr, Rajinder P. Khosla, Erik M. Secula

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Materials science, Depletion region, business.industry, Rapid thermal processing, Doping, Analytical chemistry, Optoelectronics, Wafer, Dopant Activation, business, Sheet resistance, Leakage (electronics), Diode

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bbba93a6a7618eea584628efd4e05942
https://doi.org/10.1063/1.2799377

المؤلفون: Eddy Simoen, A. Satta, Marc Meuris, Tom Janssens, T. Clarysse, A. Benedetti, C. Demeurisse, B. Brijs, I. Hoflijk, W. Vandervorst, C. Claeys

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::508106a52e2e27515a5b293b0d94a025
https://doi.org/10.4028/3-908451-13-2.691

المؤلفون: Johan Snauwaert, P. De Wolf, T. Clarysse, W. Vandervorst, Louis Hellemans

المصدر: Applied Physics Letters. 66:1530-1532

مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), Silicon, business.industry, Electrostatic force microscope, technology, industry, and agriculture, Analytical chemistry, chemistry.chemical_element, Atomic force acoustic microscopy, Conductive atomic force microscopy, Local oxidation nanolithography, chemistry, Electrical resistivity and conductivity, Optoelectronics, Magnetic force microscope, business, Ohmic contact

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e26ac33403e4e6c508eafa02a5b094f8
https://doi.org/10.1063/1.113636

المؤلفون: Y. Peytier, T. Clarysse, B. Brijs, E. Budiarto, B. J. Pawlak, R. Loo, P. Borden, Wilfried Vandervorst

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Secondary ion mass spectrometry, Ion implantation, Materials science, Dopant, Annealing (metallurgy), Analytical chemistry, Implant, Junction depth, Sheet resistance, Amorphous solid

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6e9f29e197fb45c40d51b3058dc24b3d
https://doi.org/10.1063/1.1622556

المؤلفون: T. Clarysse, W. Vandervorst, Gonçal Badenes, Natasja Duhayon, C. Stuer, Rita Rooyackers, I. De Wolf, Pierre Eyben

المصدر: MRS Proceedings. 669

مصطلحات موضوعية: Stress (mechanics), Materials science, Spreading resistance profiling, Vacancy defect, Stress relaxation, Nanotechnology, Thermal treatment, Scanning capacitance microscopy, Nitride, Diffusion (business), Composite material

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::18eb24eba31243d2e62dfd2808ed84bf
https://doi.org/10.1557/proc-669-j2.2

المؤلفون: T. Clarysse, Natasja Duhayon, I. De Wolf, Gonçal Badenes, C. Stuer, Rita Rooyackers, Pierre Eyben, W. Vandervorst

المصدر: MRS Proceedings. 610

مصطلحات موضوعية: Stress (mechanics), Materials science, Spreading resistance profiling, Dopant, business.industry, Microscopy, Optoelectronics, Scanning capacitance microscopy, Semiconductor device, Diffusion (business), Nitride, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::845b10a40abf4bbf495199eed33193e8
https://doi.org/10.1557/proc-610-b2.2

المؤلفون: E. Simoen, A. Satta, M. Meuris, T. Janssens, T. Clarysse, A. Benedetti, C. De, B. Brijs, I. Hoflijk, C. Claeys

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.scientific.net/SSP.108-109.691.pdf.

مصطلحات موضوعية: Germanium, ion implantation, dopant activation and diffusion, defect removal

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.697.5817; http://www.scientific.net/SSP.108-109.691.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.697.5817
http://www.scientific.net/SSP.108-109.691.pdf

المؤلفون: Faculteit Toegepaste Wetenschappen, Departement Elektrotechniek, Prof. Dr. Ir. W. Vandervorst, Fabian Dortu, Katholieke Universiteit Leuven, Prof Dr, Y. Willems, R. Puers, Prof Dr. W. V, B. Vanderheyden, De Heer T. Clarysse

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: https://lirias.kuleuven.be/bitstream/1979/2625/5/PhDThesis_FDortu_2009-04-11.pdf.

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.470.7039

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.470.7039

المؤلفون: E. Simoen, A. Satta, M. Meuris, T. Janssens, T. Clarysse, A. Benedetti, C. Demeurisse, B. Brijs, I. Hoflijk, C. Claeys

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.scientific.net/SSP.108-109.691.pdf.

مصطلحات موضوعية: Germanium, ion implantation, dopant activation and diffusion, defect removal

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.430.8075; http://www.scientific.net/SSP.108-109.691.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.430.8075
http://www.scientific.net/SSP.108-109.691.pdf

المؤلفون: T. Clarysse, Alain Moussa, D. K. Schroder, Silke Paul, P. J. Timans, J. Gelpey, Michael I. Current, S. McCoy, T. Zangerle, Vladimir Faifer, W. Vandervorst, Wilfried Lerch, J. Halim, T. M. H. Wong, D. Bolze

المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 25:1588

مصطلحات موضوعية: Millisecond, Materials science, Dopant, Silicon, Annealing (metallurgy), business.industry, Doping, Analytical chemistry, chemistry.chemical_element, Chemical vapor deposition, Condensed Matter Physics, chemistry, Electrical resistance and conductance, Optoelectronics, Electrical and Electronic Engineering, business, Sheet resistance

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::dcc6eabeb0b8797013cd83040c008937
https://doi.org/10.1116/1.2771552

المؤلفون: W. Vandervorst, Thomas Hantschel, T. Trenkler, Robert John Stephenson, T. Clarysse, P. De Wolf

المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:361

مصطلحات موضوعية: Kelvin probe force microscope, Materials science, technology, industry, and agriculture, General Engineering, Scanning gate microscopy, Nanotechnology, Scanning capacitance microscopy, law.invention, Scanning probe microscopy, law, Microscopy, Scanning ion-conductance microscopy, Scanning tunneling microscope, Vibrational analysis with scanning probe microscopy

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6f2647f1dd4ce7140116f252cc264ee9
https://doi.org/10.1116/1.591198