المؤلفون: Jonathan England, Alexander Kontos, Anthony Renau, Russell Gwilliam, Andrew Smith, Andrew Knights, Amitabh Jain, Edmund G. Seebauer, Susan B. Felch, Yevgeniy V. Kondratenko

مصطلحات موضوعية: Materials science, Ion implantation, chemistry, Dopant, Annealing (metallurgy), Analytical chemistry, Fluorine, chemistry.chemical_element, Wafer, Germanium, Sheet resistance, Indium

وصف الملف: text

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7bf7f745eb5c511325a9ce3c23a985c6
https://surrey.eprints-hosting.org/841346/

المؤلفون: A. J. Smith, S. H. Yeong, B. Colombeau, B. J. Sealy, R. M. Gwilliam, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Ion implantation, Materials science, chemistry, business.industry, Vacancy defect, MOSFET, Doping, Optoelectronics, chemistry.chemical_element, Nanotechnology, Diffusion (business), business, Boron

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::dcb5ffc2aa8aa32c5df2cfb382986d23
https://doi.org/10.1063/1.3033643

المؤلفون: Nobuyuki Ikarashi, Kazuya Uejima, Takeo Ikezawa, Toshinori Fukai, Akio Toda, Masami Hane, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Materials science, Dopant, business.industry, Analytical chemistry, Holography, Electron, Electron holography, Characterization (materials science), law.invention, Scaling limit, law, MOSFET, Optoelectronics, Diffusion (business), business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c4ff3131e873ae578d7c45927ec056e5
https://doi.org/10.1063/1.3033686

المؤلفون: Toshio Seki, Takaaki Aoki, Jiro Matsuo, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Secondary ion mass spectrometry, Ion beam deposition, Ion beam, Ion beam mixing, Physics::Plasma Physics, Chemistry, Analytical chemistry, Irradiation, Spectroscopy, Mass spectrometry, Ion

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6219acdfa6a00627bf3a10a68b9c802a
https://doi.org/10.1063/1.3033653

المؤلفون: Amitabh Jain, Edmund G. Seebauer, Susan B. Felch, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Millisecond, Materials science, Silicon, Annealing (metallurgy), business.industry, Doping, chemistry.chemical_element, Epitaxy, Ion, Ion implantation, chemistry, Electronic engineering, Optoelectronics, business, Sheet resistance

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bcb541a1063f33f5df6d4f52ed15ac1b
https://doi.org/10.1063/1.3033592

المؤلفون: S. H. Yeong, D. X. M. Tan, B. Colombeau, C. H. Poon, K. R. C. Mok, A. See, F. Benistant, K. L. Pey, C. M. Ng, L. Chan, M. P. Srinivasan, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المساهمون: School of Electrical and Electronic Engineering, ION IMPLANTATION TECHNOLOGY: 17th International Conference on Ion Implantation Technology, Microelectronics Centre

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Flash-lamp, Materials science, Dopant, Silicon, business.industry, Annealing (metallurgy), chemistry.chemical_element, Germanium, Ion implantation, chemistry, Flash Lamp Annealing, Engineering::Electrical and electronic engineering [DRNTU], Electronic engineering, Optoelectronics, business, Sheet resistance, Boron, Leakage (electronics)

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::96e3fd2f2f3b18eb2f48de44c9db02bf
https://doi.org/10.1063/1.3033667

المؤلفون: Jeffri Halim, Akira Mineji, Vladimir Faifer, Michael Current, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Materials science, Pixel, Ion beam, business.industry, Low dose, Analytical chemistry, chemistry.chemical_element, High resolution, Optics, Ion implantation, chemistry, Wafer, business, Boron, Sheet resistance

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6c6230caa3cf9ab0ee9078c921e83027
https://doi.org/10.1063/1.3033585

المؤلفون: F. Milesi, E. Nolot, Z. Mehrez, F. Mazen, S. Favier, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Materials science, Silicon, business.industry, Quantitative Biology::Tissues and Organs, Physics::Medical Physics, Doping, chemistry.chemical_element, Characterization (materials science), Ion, Ion beam deposition, Optics, Ion implantation, chemistry, Physics::Plasma Physics, Wafer, business, Sheet resistance

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e6e46584c3f83ee88d8fd133f38fc3be
https://doi.org/10.1063/1.3033587

المؤلفون: Nicholas R. White, Nobuhiro Tokoro, Edward Bell, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: High energy, Range (particle radiation), Fabrication, Materials science, Ion implantation, business.industry, Doping, Optoelectronics, Semiconductor device, Radiation, business, Energy (signal processing)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c85d28f7bbe8ac913f4bc8a37c29bbf8
https://doi.org/10.1063/1.3033613

المؤلفون: Isao Yamada, Jiro Matsuo, Noriaki Toyoda, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Industrial technology, Materials science, Semiconductor, Ion beam, Etching (microfabrication), Process (engineering), business.industry, Cluster (physics), Compound semiconductor, Nanotechnology, Thin film, business, Engineering physics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5418b618acebe3252cb3f2b21a1aea7e
https://doi.org/10.1063/1.3033651

المؤلفون: Y. Kato, T. Satani, Y. Matsui, T. Watanabe, M. Muramatsu, K. Tanaka, T. Asaji, A. Kitagawa, F. Sato, T. Iida, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Ion beam, business.industry, Plasma parameters, Chemistry, Cyclotron resonance, Particle accelerator, Ion gun, Ion source, Electron cyclotron resonance, law.invention, Optics, Physics::Plasma Physics, law, Atomic physics, business, Microwave

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::724674e4189f3601f2de6b18b3016e6b
https://doi.org/10.1063/1.3033631

المؤلفون: Gholamhosain Haidari, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Numerical sign problem, Physics, Hybrid Monte Carlo, Numerical analysis, Monte Carlo method, Dynamic Monte Carlo method, Monte Carlo integration, Interatomic potential, Statistical physics, Midpoint method, Computational physics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d44b5c439e4c56970691c2a9a989b4fd
https://doi.org/10.1063/1.3033601

المؤلفون: Thomas Feudel, Ralf Illgen, Christian Krüger, Marek Braun, Karuppanan Sekar, David Lee, Wade Krull, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Laser annealing, Millisecond, Materials science, Low energy, Ion implantation, law, Transistor, Electronic engineering, Silicon on insulator, law.invention, PMOS logic

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8a56c4ec4696bc068d11c51377ee1981
https://doi.org/10.1063/1.3033642

المؤلفون: Tae-Hoon Huh, Byung-Jae Kang, Geum-Joo Ra, Kyung-Won Lee, Steve Kim, Ronald N. Reece, Leonard M. Rubin, Michael S. Ameen, Won-Min Moon, Min-Sung Lee, Young-Ho Lee, Jong-Oh Lee, Dong-Chul Park, Jung-Youn Lim, Youn-Soo Kim, Jae-Sang Ro, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Materials science, Annealing (metallurgy), business.industry, Transistor, Temperature measurement, law.invention, PMOS logic, Amorphous solid, Ion implantation, law, MOSFET, Electronic engineering, Optoelectronics, Wafer, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::631df2e06f94c1dc7395429ec3bf3452
https://doi.org/10.1063/1.3033690

المؤلفون: W. Aderhold, A. Hunter, S. B. Felch, J. Ranish, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Materials science, Ion implantation, Photon, Rapid thermal processing, business.industry, Optoelectronics, Wafer, Irradiation, Atomic physics, Diffusion (business), Radiation, Dopant Activation, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::104611d66691dad45db4b7a51398b078
https://doi.org/10.1063/1.3033692

المؤلفون: L. A. Edelman, K. S. Jones, R. G. Elliman, L. M. Rubin, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Amorphous silicon, Materials science, Dopant, Diffusion, Inorganic chemistry, Analytical chemistry, Nanocrystalline silicon, chemistry.chemical_element, Germanium, Amorphous solid, chemistry.chemical_compound, chemistry, Amorphous carbon, Boron

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a43e209b1b77b5a8ba53c68474cc57ea
https://doi.org/10.1063/1.3033598

المؤلفون: Claudiu Muntele, Daryush Ila, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: chemistry.chemical_compound, Resistive touchscreen, Materials science, chemistry, Hydrogen, Hydrazine, Analytical chemistry, chemistry.chemical_element, Cryogenics, Atmospheric temperature range, Platinum, Palladium, Catalysis

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5f4101b3eec89fe729b7433a74d25363
https://doi.org/10.1063/1.3033606

المؤلفون: Volker Häublein, Lothar Frey, Heiner Ryssel, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Ion implantation, Chemical physics, Chemistry, Mass spectrum, Contamination, Atomic physics, computer.software_genre, Mass spectrometry, computer, Dissociation (chemistry), Charge exchange, Simulation software, Ion

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0f510a46b3736c31706e7d576c3b0707
https://doi.org/10.1063/1.3033581

المؤلفون: D. Nicolaescu, S. Sakai, K. Matsuda, Y. Gotoh, J. Ishikawa, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Ion beam deposition, Ion implantation, Ion beam mixing, Ion beam, Chemistry, Physics::Accelerator Physics, Ion current, Electron, Atomic physics, Ion gun, Ion

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7c4249a363175e5d41fe5e62d8f64ef9
https://doi.org/10.1063/1.3033609

المؤلفون: Shaun M. Wilson, Paul Marganski, Joseph Sweeney, Steve Roberge, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko

المصدر: AIP Conference Proceedings.

مصطلحات موضوعية: Dopant, Chemistry, business.industry, Analytical chemistry, Infrared spectroscopy, Octadecaborane, Integrated circuit, law.invention, chemistry.chemical_compound, Ion implantation, law, Remote plasma, Fourier transform infrared spectroscopy, Process engineering, business, Spectroscopy

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::db3d20fd5ac3573545b71d15c45854ef
https://doi.org/10.1063/1.3033659