المؤلفون: Ruilong Xie, Heng Wu, Muthumanickam Sankarapandian, Dechao Guo, Huiming Bu, Balasubramanian S. Haran, Jingyun Zhang, Prasad Bhosale, Su-Chen Fan, Shogo Mochizuki, Zuoguang Liu, Andrew M. Greene, Jean E. Wynne, Frougier Julien, Nicolas Loubet, Veeraraghavan S. Basker, Shanti Pancharatnam

المصدر: 2020 IEEE International Interconnect Technology Conference (IITC).

مصطلحات موضوعية: Materials science, business.industry, Transistor, RC time constant, Epitaxy, Line (electrical engineering), law.invention, chemistry.chemical_compound, chemistry, law, Parasitic element, Silicide, Optoelectronics, Wafer, business, Nanosheet

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bb66210a04273bfa45f8a15fb4f60f60
https://doi.org/10.1109/iitc47697.2020.9515644

المؤلفون: Vimal Kamineni, Junli Wang, Susan Su Chen Fan, Andre Labonte, Ruilong Xie, Dinesh Gupta, Raja Muthinti, Juntao Li, Dechao Guo, Ryan Kevin J, B. Peethala, Richard Conte, Christopher Prindle, Veeraraghavan S. Basker, Shanti Pancharatnam, Kangguo Cheng, Albert M. Young, Stan D. Tsai, Huiming Bu, H. P. Amanapu, Chanro Park, Balasubramanian S. Haran, Robert R. Robison, Nicolas Loubet, Y. Liang, Huimei Zhou, Kisik Choi, Richard A. Conti, Andreas Knorr, Cave Nigel, Adra Carr, Saraf Iqbal Rashid, Andrew M. Greene, Michael P. Belyansky, Hao Tang, Mark Raymond

المصدر: 2019 Symposium on VLSI Technology.

مصطلحات موضوعية: Interconnection, Materials science, business.industry, Oxide, chemistry.chemical_element, Nitride, Tungsten, chemistry.chemical_compound, chemistry, Process integration, Optoelectronics, Static random-access memory, Routing (electronic design automation), business, Scaling

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ddd686fefd2d3d87577b75e554a2b83f
https://doi.org/10.23919/vlsit.2019.8776492

المؤلفون: Balasubramanian S. Haran, Kisup Chung, Spyridon Skordas, Stan D. Tsai, Mark L. Lenhardt, Su Chen Fan, Sean Teehan, Alex Joseph Varghese, Ruilong Xie, Pietro Montanini

المصدر: 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

مصطلحات موضوعية: Materials science, Yield (engineering), Gas cluster ion beam, business.industry, Logic gate, Chemical-mechanical planarization, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Node (circuits), Wafer, Nitride, business, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8fbd27d6ee98fb8fd9dfb24709c5f9b4
https://doi.org/10.1109/asmc.2018.8373209

المؤلفون: Nelson Felix, Spyridon Skordas, Rohit Galatage, Junli Wang, Dinesh Gupta, Xin Miao, Deok-Hyung Lee, R. Divakaruni, John C. Arnold, Vamsi Paruchuri, Ohyun Kwon, Adra Carr, Seng Luan Lee, Soon-Cheon Seo, T. Gow, James Chingwei Li, Muthumanickam Sankarapandian, Y. Xu, Zuoguang Liu, D. Corliss, Stuart A. Sieg, Robert C. Wong, Chun Wing Yeung, Albert M. Young, Jingyun Zhang, Jeffrey C. Shearer, Huiming Bu, C. Labelle, Zhenxing Bi, Bassem Hamieh, M. Guillom, Andreas Knorr, Tenko Yamashita, Jae-Yoon Yoo, D. Brown, Peng Xu, Robin Chao, Dexin Kong, Terence B. Hook, P. Oldiges, T. Wu, Shogo Mochizuki, Young-Kwan Park, W. Xu, Raja Muthinti, S. Lian, Ruqiang Bao, S. Kanakasabapathy, Myung-Hee Na, Richard A. Conti, Frougier Julien, Robert R. Robison, Nicolas Loubet, Yann Mignot, Theodorus E. Standaert, Hemanth Jagannathan, Ho Ju Song, Pietro Montanini, Myounggon Kang, John G. Gaudiello, Mukesh Khare, Abraham Arceo, Su Chen Fan, Andrew M. Greene

المصدر: 2017 Symposium on VLSI Technology.

مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Extreme ultraviolet lithography, Transistor, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, Electrostatics, 01 natural sciences, law.invention, law, Logic gate, 0103 physical sciences, Stiction, Optoelectronics, Work function, 0210 nano-technology, business, Nanosheet, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8172c77d8489643bbaac20dc37532850
https://doi.org/10.23919/vlsit.2017.7998183

المؤلفون: Junli Wang, Matthew E. Colburn, Nelson Felix, Andreas Knorr, Tenko Yamashita, Charan V. V. S. Surisetty, Peter Zeitzoff, Dinesh Gupta, Y. Xu, Su Chen Fan, D. Park, Xin Miao, R. Divakaruni, Scott C. Johnson, Hiroaki Niimi, S. Lian, Balasubramanian S. Pranatharthi Haran, Andre Labonte, Eric R. Miller, Richard A. Conti, Shogo Mochizuki, Zhenxing Bi, M. Mottura, Bhagawan Sahu, Chengyu Niu, Donald F. Canaperi, John R. Sporre, James J. Demarest, Spyridon Skordas, Vamsi Paruchuri, Praneet Adusumilli, Seng Luan Lee, Lars W. Liebmann, Christopher Prindle, Walter Kleemeier, Oleg Gluschenkov, Peng Xu, Hemanth Jagannathan, Pietro Montanini, Rohit Galatage, Jody A. Fronheiser, Ruilong Xie, P. Oldiges, Neeraj Tripathi, Abraham Arceo, F. Lie, Robin Chao, Zuoguang Liu, D. Corliss, Stuart A. Sieg, Vimal Kamineni, Lee Choonghyun, Jeffrey C. Shearer, C. Labelle, J. Zhang, S. Kanakasabapathy, Stan D. Tsai, James Chingwei Li, Soon-Cheon Seo, H. Chen, H. P. Amanapu, Min Gyu Sung, Mark Raymond, Huiming Bu, Andrew M. Greene, Kisup Chung, Kerem Akarvardar, Sanjay Mehta, Richard G. Southwick, Chanro Park, C.-C. Yeh, John C. Arnold, K. Cheon, Myung-Hee Na, Mukesh Khare, Jungho Cha, Shariq Siddiqui, S. Whang, Lei Sun, Theodorus E. Standaert, Derren N. Dunn, Bassem Hamieh, T. Gow, Ki-chul Kim, Nicolas Loubet, Muthumanickam Sankarapandian, Terence B. Hook

المصدر: 2016 IEEE International Electron Devices Meeting (IEDM).

مصطلحات موضوعية: 010302 applied physics, Very-large-scale integration, Materials science, Silicon, business.industry, Extreme ultraviolet lithography, chemistry.chemical_element, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, chemistry, law, Logic gate, 0103 physical sciences, Multiple patterning, Optoelectronics, Photolithography, 0210 nano-technology, business, Lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::75a8807331b86a9948840b3fa0fbe3d5
https://doi.org/10.1109/iedm.2016.7838334

المؤلفون: Injo Ok, Tenko Yamashita, Su Chen Fan, Vijay Narayanan, Takashi Ando, Shahrukh A. Khan, Huiming Bu, Patrick W. DeHaven, Rajesh Sathiyanarayanan, Rajan K. Pandey, Anita Madan, Q. Yuan, A. Dasgupta, M. Chace

المصدر: 2015 IEEE International Electron Devices Meeting (IEDM).

مصطلحات موضوعية: Metal, Materials science, business.industry, visual_art, MOSFET, Electronic engineering, visual_art.visual_art_medium, Optoelectronics, business, Hafnium compounds, Metal gate, High-κ dielectric

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::aa9ebd55574294d40aba2f80054590c1
https://doi.org/10.1109/iedm.2015.7409747

المؤلفون: Hsueh-Chung Chen, Yi-Lung Cheng, Su-Chen Fan, Jian-Hong Lin, Chii-Ming Wu, Shin-Puu Jeng

المصدر: Thin Solid Films. :487-490

مصطلحات موضوعية: Interconnection, Materials science, Metallurgy, Metals and Alloys, Polishing, chemistry.chemical_element, Surfaces and Interfaces, Copper, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Back end of line, International Technology Roadmap for Semiconductors, chemistry, Chemical-mechanical planarization, MOSFET, Materials Chemistry, Composite material, Scaling

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::84b24597b2741027e4800c2cc5a0c6da
https://doi.org/10.1016/j.tsf.2004.06.169

المؤلفون: J. L. Herman, Pranita Kulkarni, H. He, Sanjay Mehta, Alexander Reznicek, James A. O’Neill, Bruce B. Doris, Paul C. Jamison, Bala S. Haran, A. Upham, Lisa F. Edge, Shom Ponoth, Z. Zhu, A. Kimball, Soon-Cheon Seo, Huiming Bu, P. Kozlowski, D. K. Sadana, Thomas N. Adam, Su Chen Fan, Stefan Schmitz, J. Kuss, Ghavam G. Shahidi, S. Kanakasabapathy, Ali Khakifirooz, R. Johnson, Kangguo Cheng, Yu Zhu

المصدر: 2010 IEEE International SOI Conference (SOI).

مصطلحات موضوعية: business.industry, Computer science, Electrical engineering, Silicon on insulator, business, Cmos scaling

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a4dc9cf38d59eeff35f7c3c5250281b2
https://doi.org/10.1109/soi.2010.5641473

المؤلفون: Vamsi Paruchuri, Zhibin Ren, Wilfried Haensch, Bruce B. Doris, Hemanth Jagannathan, Huiming Bu, Balasubramanian S. Haran, A. Byrant, Su Chen Fan, Kangguo Cheng, Sanjay Mehta, Yu Zhu, Shom Ponoth, H. He, Vijay Narayanan, Alexander Reznicek, J. Kuss, Ghavam G. Shahidi, Ali Khakifirooz, Soon-Cheon Seo, Z. Zhu, Paul C. Jamison, A. Upham, D. McHerron, Pranita Kulkarni, A. Kimball, L. H. Vanamurth, S. Kanakasabapathy, J. Faltermeier, Basanth Jagannathan, Amit Kumar, Amlan Majumdar, Thomas N. Adam, Mukesh Khare, Terence B. Hook, S. Holmes, D. Horak, R. Johnson, D. Yang, D. K. Sadana, J. Cai, J. O'Neil, E. Leobondung, Lisa F. Edge, S. Schmiz, P. Kozlowsk, J. L. Herman

المصدر: Extended Abstracts of the 2010 International Conference on Solid State Devices and Materials.

مصطلحات موضوعية: Materials science, CMOS, Silicon on insulator, Mainstream, Nanotechnology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cbe458735d7a77e337be1fa74ec08d0f
https://doi.org/10.7567/ssdm.2010.c-6-1

المؤلفون: H. He, Paul C. Jamison, Bala S. Haran, Sanjay Mehta, Kangguo Cheng, D. Horak, Bruce B. Doris, Yu Zhu, D. K. Sadana, Basanth Jagannathan, J. L. Herman, Huiming Bu, Soon-Cheon Seo, S. Kanakasabapathy, Alexander Reznicek, L. H. Vanamurth, Amlan Majumdar, J. Cai, Thomas N. Adam, James A. O’Neill, P. Kozlowski, E. Leobondung, Pranita Kulkarni, Shom Ponoth, Nicolas Loubet, A. Upham, D. McHerron, S. Holmes, Z. Zhu, A. Kimball, Lisa F. Edge, Su Chen Fan, Stefan Schmitz, J. Kuss, Ghavam G. Shahidi, Ali Khakifirooz, R. Johnson, Daewon Yang, W. Haensch, J. Faltermeier

المصدر: Proceedings of 2010 International Symposium on VLSI Technology, System and Application.

مصطلحات موضوعية: business.industry, Computer science, Transistor, Electrical engineering, Silicon on insulator, Hardware_PERFORMANCEANDRELIABILITY, Integrated circuit design, law.invention, CMOS, Parasitic capacitance, law, MOSFET, Hardware_INTEGRATEDCIRCUITS, System on a chip, business, Random dopant fluctuation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a3f37a35730694aacb89bafdca246f94
https://doi.org/10.1109/vtsa.2010.5488928

المؤلفون: R. Johnson, K. Xiu, Lisa F. Edge, Sanjay Mehta, S. Holmes, J. L. Herman, A. Upham, D. McHerron, D. Horak, Bruce B. Doris, D. Yang, Nicolas Loubet, Devendra K. Sadana, Su Chen Fan, Ali Khakifirooz, Z. Zhu, Philip J. Oldiges, A. Kimball, S. Kanakasabapathy, Thomas N. Adam, P. Kozlowski, Alexander Reznicek, Kangguo Cheng, Yu Zhu, James A. O’Neill, Shom Ponoth, Soon-Cheon Seo, L. H. Vanamurth, Huiming Bu, Pranita Kulkarni, H. He, Paul C. Jamison, Bala S. Haran, Stefan Schmitz, J. Kuss, Davood Shahrjerdi

المصدر: 2009 IEEE International Electron Devices Meeting (IEDM).

مصطلحات موضوعية: Materials science, business.industry, Transconductance, Gate dielectric, Electrical engineering, Silicon on insulator, Silicon-germanium, chemistry.chemical_compound, chemistry, CMOS, Logic gate, Optoelectronics, Field-effect transistor, System on a chip, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::58c6b9d023179bb7aff6ae5f39513f0e
https://doi.org/10.1109/iedm.2009.5424422

المؤلفون: Sanjay Mehta, R. H. Kim, V. Basker, Sean D. Burns, Kangguo Cheng, Yu Zhu, A. Ebert, Scott Halle, Chen Jia, Karen Petrillo, Soon-Cheon Seo, D. Horak, Vamsi Paruchuri, R. Johnson, T. Levin, Hemanth Jagannathan, J. Faltermeier, Jason E. Cummings, T. Sparks, M. Raymond, Wilfried Haensch, Lahir Shaik Adam, Su Chen Fan, Amit Kumar, N. Berliner, Bala S. Haran, Terry A. Spooner, S. Kanakasabapathy, Stefan Schmitz, J. Kuss, Josephine B. Chang, Thomas S. Kanarsky, Lisa F. Edge, Chiew-seng Koay, Charles W. Koburger, John C. Arnold, S. Holmes, Bruce B. Doris, Erin Mclellan, D. LaTulipe, Martin Burkhardt, D. McHerron, S. Paparao, Donald F. Canaperi, M. Smalley, James J. Demarest, Matt Colburn

المصدر: 2008 IEEE International Electron Devices Meeting.

مصطلحات موضوعية: Materials science, business.industry, Annealing (metallurgy), Transistor, Copper interconnect, Electrical engineering, law.invention, chemistry.chemical_compound, chemistry, law, Logic gate, Silicide, Optoelectronics, Node (circuits), business, Metal gate, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3f2618a1a98015406797d8aa44d360c1
https://doi.org/10.1109/iedm.2008.4796769