المؤلفون: Andrew Metz, Hao Tang, Jeffrey C. Shearer, John C. Arnold, Karen Petrillo, Lin Lee Cheong, Nicole A. Saulnier, Stuart A. Sieg

المصدر: Journal of Photopolymer Science and Technology. 2015, 28(1):13

المؤلفون: Martin Burkhardt, Zheng G. Chen, Scott Halle, Romain J. Lallement, Stuart A. Sieg, Luciana Meli

المصدر: Optical and EUV Nanolithography XXXV.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4faddf8716892b18226ab10c424cadde
https://doi.org/10.1117/12.2614296

المؤلفون: Tao Li, Chris A. Mack, Frougier Julien, Andrew M. Greene, Daniel J. Dechene, Chris Waskiewicz, Veeraraghavan S. Basker, Jingyun Zhang, Stuart A. Sieg, Carl J. Radens, Prateek Hundekar, Tsung-Sheng Kang, Indira Seshadri, Nelson Felix, Jennifer Church, Eric R. Miller, Mary Breton

المصدر: Extreme Ultraviolet (EUV) Lithography XII.

مصطلحات موضوعية: Materials science, Resist, business.industry, Extreme ultraviolet lithography, Multiple patterning, Optoelectronics, Node (circuits), business, Critical dimension, Scaling, AND gate, Nanosheet

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ecd35b8cc836ad368baf97505bac549a
https://doi.org/10.1117/12.2583897

المؤلفون: Anuja De Silva, Romain Lallement, Dario L. Goldfarb, Jennifer Church, Karen Petrillo, Dallas Lea, Cody Murray, Martin Burkhardt, Stuart A. Sieg, Nelson Felix, Luciana Meli

المصدر: Extreme Ultraviolet (EUV) Lithography XII.

مصطلحات موضوعية: Computer science, law, Extreme ultraviolet lithography, Transistor, Audio time-scale/pitch modification, Process (computing), Electronic engineering, Node (circuits), IBM, Chip, Line (electrical engineering), law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5d9ccacda2530d3d00ca8ba13b262b01
https://doi.org/10.1117/12.2583566

المؤلفون: Pietro Montanini, Stuart A. Sieg, Andrew M. Greene, Nelson Felix, Xu Wenyu, Daniel J. Dechene, Jingyun Zhang, Eric R. Miller, Yann Mignot, Carl J. Radens, Indira Seshadri, Praveen Joseph, Veeraraghavan S. Basker, Mary Breton, Tao Li

المصدر: Design-Process-Technology Co-optimization for Manufacturability XIV.

مصطلحات موضوعية: Front and back ends, Materials science, business.industry, Extreme ultraviolet lithography, Multiple patterning, Optoelectronics, Node (circuits), Surface finish, Edge (geometry), business, AND gate, Nanosheet

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6c1657e32b8611133cff6f9ccc289143
https://doi.org/10.1117/12.2552159

المؤلفون: Stuart A. Sieg, Mohamed Ramadan, Michael Green, Romain Lallement, Henry Kamberian, Young Ham, Chris Progler, Derren N. Dunn

المصدر: Extreme Ultraviolet (EUV) Lithography XI.

مصطلحات موضوعية: Interconnection, business.industry, Computer science, Extreme ultraviolet lithography, Rounding, Hardware_INTEGRATEDCIRCUITS, Key (cryptography), Process (computing), Node (circuits), Wafer, Process window, business, Computer hardware

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ae178d70c19764812b57ba1405584361
https://doi.org/10.1117/12.2560545

المؤلفون: Xinghua Sun, Yann Mignot, Christopher Cole, Eric Liu, Daniel Santos, Angelique Raley, Jennifer Church, Luciana Meli, Stuart A. Sieg, Peter Biolsi

المصدر: Journal of Vacuum Science & Technology B. 40:023207

مصطلحات موضوعية: Process Chemistry and Technology, Materials Chemistry, Electrical and Electronic Engineering, Instrumentation, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::239707cf623729ba84b02f692626cc08
https://doi.org/10.1116/6.0001671

المؤلفون: Nelson Felix, Spyridon Skordas, Rohit Galatage, Junli Wang, Dinesh Gupta, Xin Miao, Deok-Hyung Lee, R. Divakaruni, John C. Arnold, Vamsi Paruchuri, Ohyun Kwon, Adra Carr, Seng Luan Lee, Soon-Cheon Seo, T. Gow, James Chingwei Li, Muthumanickam Sankarapandian, Y. Xu, Zuoguang Liu, D. Corliss, Stuart A. Sieg, Robert C. Wong, Chun Wing Yeung, Albert M. Young, Jingyun Zhang, Jeffrey C. Shearer, Huiming Bu, C. Labelle, Zhenxing Bi, Bassem Hamieh, M. Guillom, Andreas Knorr, Tenko Yamashita, Jae-Yoon Yoo, D. Brown, Peng Xu, Robin Chao, Dexin Kong, Terence B. Hook, P. Oldiges, T. Wu, Shogo Mochizuki, Young-Kwan Park, W. Xu, Raja Muthinti, S. Lian, Ruqiang Bao, S. Kanakasabapathy, Myung-Hee Na, Richard A. Conti, Frougier Julien, Robert R. Robison, Nicolas Loubet, Yann Mignot, Theodorus E. Standaert, Hemanth Jagannathan, Ho Ju Song, Pietro Montanini, Myounggon Kang, John G. Gaudiello, Mukesh Khare, Abraham Arceo, Su Chen Fan, Andrew M. Greene

المصدر: 2017 Symposium on VLSI Technology.

مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Extreme ultraviolet lithography, Transistor, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, Electrostatics, 01 natural sciences, law.invention, law, Logic gate, 0103 physical sciences, Stiction, Optoelectronics, Work function, 0210 nano-technology, business, Nanosheet, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8172c77d8489643bbaac20dc37532850
https://doi.org/10.23919/vlsit.2017.7998183

المؤلفون: Stuart A. Sieg, Ravi K. Bonam, Nicole Saulnier, Chi-Chun Liu, Raghuveer R. Patlolla, Mary Breton, Jeffrey C. Shearer, Huai Huang, Raja Muthinti, Indira Seshadri

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Image processing, 02 engineering and technology, Surface finish, Edge (geometry), 021001 nanoscience & nanotechnology, 01 natural sciences, Noise (electronics), Metrology, 010309 optics, Optics, Dimensional metrology, 0103 physical sciences, Line (geometry), 0210 nano-technology, business, Critical dimension

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::62fa53a003f29db9d59f37edeb8fba94
https://doi.org/10.1117/12.2258196

المؤلفون: Robert L. Bruce, Stuart A. Sieg, Mark Somervell, Daniel P. Sanders, Richard A. Farrell, Hoa Truong, Kafai Lai, Akiteru Ko, Chi-Chun Liu, Andrew Metz, Matthew E. Colburn, Kristin Schmidt, Nelson Felix, Elliott Franke, Daniel Corliss, John C. Arnold, Tsuyoshi Furukawa, Indira Seshadri, Hsinyu Tsai, Yann Mignot, Ekmini Anuja De Silva, Lovejeet Singh, David Hetzer, Luciana Meli, Doni Parnell, Martha I. Sanchez, Scott LeFevre, Cheng Chi

المصدر: SPIE Proceedings.

مصطلحات موضوعية: 010302 applied physics, Flexibility (engineering), business.industry, Computer science, 02 engineering and technology, Direct transfer, 021001 nanoscience & nanotechnology, 01 natural sciences, Computer architecture, 0103 physical sciences, Computer data storage, 0210 nano-technology, business, Simulation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::621ee7f5d3e718c914e8decb0858a3ef
https://doi.org/10.1117/12.2260479

المؤلفون: Stuart A. Sieg, Huai Huang, Chi-Chun Liu, Raja Muthinti, Ravi K. Bonam, Jeffrey C. Shearer, Mary Breton, Nicole Saulnier, Indira Seshadri, Raghuveer R. Patlolla

المصدر: SPIE Proceedings.

مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Extreme ultraviolet lithography, 02 engineering and technology, Surface finish, Edge (geometry), 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, Optics, Resist, Material selection, 0103 physical sciences, Line (geometry), 0210 nano-technology, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::aa7515f8d182d8e19b56b00d58ba373f
https://doi.org/10.1117/12.2258194

المؤلفون: Junli Wang, Matthew E. Colburn, Nelson Felix, Andreas Knorr, Tenko Yamashita, Charan V. V. S. Surisetty, Peter Zeitzoff, Dinesh Gupta, Y. Xu, Su Chen Fan, D. Park, Xin Miao, R. Divakaruni, Scott C. Johnson, Hiroaki Niimi, S. Lian, Balasubramanian S. Pranatharthi Haran, Andre Labonte, Eric R. Miller, Richard A. Conti, Shogo Mochizuki, Zhenxing Bi, M. Mottura, Bhagawan Sahu, Chengyu Niu, Donald F. Canaperi, John R. Sporre, James J. Demarest, Spyridon Skordas, Vamsi Paruchuri, Praneet Adusumilli, Seng Luan Lee, Lars W. Liebmann, Christopher Prindle, Walter Kleemeier, Oleg Gluschenkov, Peng Xu, Hemanth Jagannathan, Pietro Montanini, Rohit Galatage, Jody A. Fronheiser, Ruilong Xie, P. Oldiges, Neeraj Tripathi, Abraham Arceo, F. Lie, Robin Chao, Zuoguang Liu, D. Corliss, Stuart A. Sieg, Vimal Kamineni, Lee Choonghyun, Jeffrey C. Shearer, C. Labelle, J. Zhang, S. Kanakasabapathy, Stan D. Tsai, James Chingwei Li, Soon-Cheon Seo, H. Chen, H. P. Amanapu, Min Gyu Sung, Mark Raymond, Huiming Bu, Andrew M. Greene, Kisup Chung, Kerem Akarvardar, Sanjay Mehta, Richard G. Southwick, Chanro Park, C.-C. Yeh, John C. Arnold, K. Cheon, Myung-Hee Na, Mukesh Khare, Jungho Cha, Shariq Siddiqui, S. Whang, Lei Sun, Theodorus E. Standaert, Derren N. Dunn, Bassem Hamieh, T. Gow, Ki-chul Kim, Nicolas Loubet, Muthumanickam Sankarapandian, Terence B. Hook

المصدر: 2016 IEEE International Electron Devices Meeting (IEDM).

مصطلحات موضوعية: 010302 applied physics, Very-large-scale integration, Materials science, Silicon, business.industry, Extreme ultraviolet lithography, chemistry.chemical_element, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, chemistry, law, Logic gate, 0103 physical sciences, Multiple patterning, Optoelectronics, Photolithography, 0210 nano-technology, business, Lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::75a8807331b86a9948840b3fa0fbe3d5
https://doi.org/10.1109/iedm.2016.7838334

المؤلفون: Richard A. Farrell, Fee Li Lie, Michael A. Guillorn, Hoa Truong, Elliott Franke, Sean D. Burns, Matthew E. Colburn, Akiteru Ko, Mark Somervell, Nelson Felix, John C. Arnold, David Hetzer, Hsinyu Tsai, Stuart A. Sieg, Kafai Lai, Chi-Chun Liu, Daniel P. Sanders

المصدر: SPIE Newsroom.

مصطلحات موضوعية: Directed self assembly, Materials science, Fin, business.industry, Optoelectronics, Field-effect transistor, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b0f7f1588d44e7df8463769208c909dc
https://doi.org/10.1117/2.1201606.006519

المؤلفون: Karen Petrillo, Anuja De Silva, Yongan Xu, Stuart A. Sieg, Luciana Meli, Indira Seshadri, Matthew E. Colburn, Nelson Felix, Nicole Saulnier, Derren N. Dunn

المصدر: SPIE Newsroom.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d263a9998b2433b7dba0a9d7d6c2407b
https://doi.org/10.1117/2.1201605.006518

المؤلفون: Kerem Akarvardar, K-Y Lim, R. Mo, Bruce B. Doris, Richard G. Southwick, Muthumanickam Sankarapandian, F. Lie, Dechao Guo, Bhagawan Sahu, Huiming Bu, Stuart A. Sieg, Chun Wing Yeung, Junli Wang, Andreas Knorr, Tenko Yamashita, John R. Sporre, Matthew E. Colburn, Nelson Felix, Jody A. Fronheiser, D. K. Sadana, Neeraj Tripathi, Jay W. Strane, R. Divakaruni, P. Oldiges, Gauri Karve, Derrick Liu, T. Hook, Shogo Mochizuki, Nicolas Loubet, Sean D. Burns, Vijay Narayanan, Rajasekhar Venigalla, James Chingwei Li, Pouya Hashemi, Dinesh Gupta, Koji Watanabe, James J. Demarest, Victor Chan, Ruqiang Bao, S. Kanakasabapathy, Robert R. Robison, Mukesh Khare, Stephen W. Bedell, Pietro Montanini, Hemanth Jagannathan, Vamsi Paruchuri, Gen Tsutsui, Kangguo Cheng, James H. Stathis, James J. Kelly, Reinaldo A. Vega, Jacob Ajey Poovannummoottil, Miaomiao Wang

المصدر: 2016 IEEE Symposium on VLSI Technology.

مصطلحات موضوعية: 010302 applied physics, business.industry, Computer science, Electrical engineering, Hardware_PERFORMANCEANDRELIABILITY, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Reliability (semiconductor), CMOS, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Node (circuits), 0210 nano-technology, business, Technology insertion, Communication channel

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d9013e63588fce0b723f1726672dc180
https://doi.org/10.1109/vlsit.2016.7573360

المؤلفون: Peter Gin, Matthew Sendelbach, Robin Chao, Cornel Bozdog, Matthew Wormington, Tom Cardinal, Fee li Le, Brock Mendoza, Stuart A. Sieg, Raja Muthinti, John G. Gaudiello, Florence Nelson, Aron Cepler, Sivananda K. Kanakasabapathy, Shay Wolfling, B. Lherron, Mary Breton, Eric R. Miller, Abraham Arceo de la Pena, James J. Demarest, Nelson Felix

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Diffraction, Computer science, Scanning electron microscope, Semiconductor device fabrication, business.industry, Process (computing), 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, 010309 optics, Crystal, Optics, 0103 physical sciences, Electronic engineering, Process control, Sensitivity (control systems), 0210 nano-technology, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::97a1983109528f300cb1f79a7604bfdc
https://doi.org/10.1117/12.2220601

المؤلفون: Richard A. Farrell, Michael A. Guillorn, Sean D. Burns, Kafai Lai, Fee Li Lie, Hsinyu Tsai, Elliott Franke, Stuart A. Sieg, Matthew E. Colburn, Nelson Felix, John C. Arnold, Daniel P. Sanders, David Hetzer, Hoa Truong, Chi-Chun Charlie Liu, Akiteru Ko, Mark Somervell

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Fabrication, Fin, Silicon, Computer science, chemistry.chemical_element, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, chemistry, 0103 physical sciences, Electronic engineering, Node (circuits), 0210 nano-technology, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3c0994496273b2831133bf7a7a6a0cd1
https://doi.org/10.1117/12.2219670

المؤلفون: Bong Cheol Kim, Bassem Hamieh, Genevieve Beique, Karen Petrillo, Eunshoo Han, Erik Verduijn, Lei Sun, Martin Burkhardt, Shinichiro Kawakami, Corey Lemley, Jongsu Kim, Dave Hetzer, Yann Mignot, Andre Labonte, R. Johnson, Stuart A. Sieg, Indira Seshadri, Geng Han, Derren N. Dunn, Nelson Felix, Eric R. Miller, Hao Tang, Koichi Hontake, Anuja De Silva, Yongan Xu, Lior Huli, Dan Corliss, Koichi Matsunaga, Christopher F. Robinson, Mary Breton, Nicole Saulnier, Luciana Meli

المصدر: Extreme Ultraviolet (EUV) Lithography VII.

مصطلحات موضوعية: 010302 applied physics, Process (engineering), Computer science, Extreme ultraviolet lithography, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Engineering physics, Resist, 0103 physical sciences, Multiple patterning, Process window, Node (circuits), IBM, 0210 nano-technology, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0a13233cfa0c903396500e45f9f68353
https://doi.org/10.1117/12.2219894

المؤلفون: Bassem Hamieh, Stuart A. Sieg, Chiew-seng Koay, Chumeng Zheng, Scott Halle, Nelson Felix

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Computer science, Node (networking), Process (computing), 02 engineering and technology, Overlay, Image segmentation, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, 010309 optics, Computer engineering, 0103 physical sciences, Reticle, Wafer, 0210 nano-technology, Simulation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fbcef7872b90fe3ea006d7cbbc2fd5a4
https://doi.org/10.1117/12.2220382