المؤلفون: Sunil Kumar D R, Apoorva Patel, Srividya Jayaram, Vidya Ramesh

المصدر: European Journal of Health Research, Vol 8, Iss 1, Pp 1-17 (2022)

مصطلحات موضوعية: covid -19 vaccination, break through infection, vaccine hesitancy, adverse events, covid vaccination, urban slums, Medicine (General), R5-920

وصف الملف: electronic resource

Relation: https://revistas.uautonoma.cl/index.php/ejhr/article/view/1786; https://doaj.org/toc/2444-9067; https://doaj.org/toc/2445-0308

URL الوصول: https://doaj.org/article/99b56a1186ed4155b3180f51b00fe249

المؤلفون: Nathan G. Greeneltch, Haizhou Yin, Juan A. Torres, Melody Tao, Steven M. Lubin, Srividya Jayaram, Ivan Kissiov, Martin Niehoff, Marcus Wolf, Paul Jungmann, Todd C. Bailey

المصدر: DTCO and Computational Patterning II.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1e65a549b4b6a5078b848280a29b8e4c
https://doi.org/10.1117/12.2661150

المؤلفون: Dongin Kim, Hyung Joo Lee, Sanghyun Choi, S.P. Hong, Seungjae Lee, Doohwan Kwak, Srividya Jayaram, Seungwon Paek, Minho Kwon, Yeongdo Kim, Hyobe Jung, Ivan Kissiov, Melody Tao, Andres Torres, Nathan Greeneltch, Ho Lee

المصدر: Metrology, Inspection, and Process Control XXXVII.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bbc52a97e1756e4d4dc9c20294527504
https://doi.org/10.1117/12.2662880

المؤلفون: Hyung Joo Lee, Dongin Kim, Sanghyun Choi, Seungpyo Hong, Doohwan Kwak, Srividya Jayaram, Seungwon Paek, Minho Kwon, Yeongdo Kim, Hyobe Jung, Ivan Kissiov, Melody Tao, Andres Torres, Nathan Greeneltch, Ho Lee

المصدر: 2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::84c1a8672a77400fcfb42470b27b401c
https://doi.org/10.1109/edtm55494.2023.10103011

المؤلفون: Juan A. Torres, Ivan Kissiov, Melody Tao, Graham Muller, Stefan Schueler, Carsten Hartig, Richard Gardner, Srividya Jayaram

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4a40c0223cd46a863f18a4aa164eb1fc
https://doi.org/10.1117/12.2614943

المؤلفون: Sunil Kumar, Dodderi, Apoorva E., Patel, Srividya, Jayaram, Vidya, Ramesh

المصدر: European Journal of Health Research: (EJHR), ISSN 2445-0308, Vol. 8, Nº. 1, 2022

مصطلحات موضوعية: Vacunación COVID-19, infecciones irruptivas, vacilación ante vacunas, eventos adversos, vacunación COVID, barrios marginales urbanos, COVID -19 vaccination, Break through infection, Vaccine hesitancy, Adverse events, COVID vaccination, Urban slums

وصف الملف: application/pdf

Relation: https://dialnet.unirioja.es/servlet/oaiart?codigo=8428366; (Revista) ISSN 2444-9067; (Revista) ISSN 2445-0308

الاتاحة: https://dialnet.unirioja.es/servlet/oaiart?codigo=8428366

المؤلفون: Essam Mohamed, Richard Gardner, Srividya Jayaram, Andres Torres, Carsten Hartig, Stefan Schueler, Ivan Kissiov

المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.

مصطلحات موضوعية: Set (abstract data type), Computer science, business.industry, Data quality, Systems engineering, Reticle, Virtual metrology, Reuse, Internet of Things, business, Bridge (nautical), Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::69a10aab32d15dc547e17184d62a97e7
https://doi.org/10.1117/12.2588467

المؤلفون: Joerg Mellmann, Fan Jiang, Doohwan Kwak, Germain Fenger, James Word, Liang Cao, Srividya Jayaram, Le Hong, Young-Chang Kim, Vlad Liubich, Yuansheng Ma, Ananthan Raghunathan

المصدر: Advanced Etch Technology for Nanopatterning IX.

مصطلحات موضوعية: Computational lithography, Computer science, business.industry, Process (computing), Machine learning, computer.software_genre, Design for manufacturability, Reduction (complexity), Design phase, Resist, Hardware_INTEGRATEDCIRCUITS, Unsupervised learning, Artificial intelligence, business, Lithography, computer

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a2daaa20877fa73945cfbf366847e01b
https://doi.org/10.1117/12.2551703

المؤلفون: Sherif Hany Mousa, Zhenguo Zheng, Ashutosh Rathi, Jun Yao, Feng Yaobin, Srividya Jayaram, Pat LaCour, Lei Zhang

المصدر: Optical Microlithography XXXIII.

مصطلحات موضوعية: Reduction (complexity), Consistency (database systems), Computer engineering, Optical proximity correction, Feature (computer vision), Computer science, Hardware_INTEGRATEDCIRCUITS, Leverage (statistics), Chip, Lithography, Critical dimension

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9da51bc6aea6455c2fc9fc466f64f736
https://doi.org/10.1117/12.2551829

المؤلفون: James Word, Yuyang Sun, Fan Jiang, Srividya Jayaram, Xima Zhang, Alexander Tritchkov, Alex Wei

المصدر: Extreme Ultraviolet (EUV) Lithography X.

مصطلحات موضوعية: Optical proximity correction, Computer engineering, Computer science, Image quality, Extreme ultraviolet lithography, Critical factors, Critical question, Process window, Overlay, Nominal condition

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::391b450780439811e69d068ac0a43f0b
https://doi.org/10.1117/12.2513560

المؤلفون: Jed H. Rankin, Larry Zhuang, Ingo Bork, Fan Jiang, Alexander Wei, Alexander Tritchkov, Todd Bailey, Yuyang Sun, Xima Zhang, Vivian Wei Guo, James Word, Srividya Jayaram

المصدر: Photomask Technology 2018.

مصطلحات موضوعية: Depth of focus, Curvilinear coordinates, Optical proximity correction, Image quality, Computer science, Extreme ultraviolet lithography, Process (computing), Electronic engineering, Lithography, Design for manufacturability

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b5a9d31b0f757b020087afbc78437795
https://doi.org/10.1117/12.2501973

المؤلفون: Hyoung-Soon Yune, Srividya Jayaram, Yuansheng Ma, Gyu-Yeol Chae, Chanha Park, Jeong-Woo Lee, Le Hong, Ahmed Seoud, Juhwan Kim, Daejin Park, Se-Young Oh

المصدر: Optical Microlithography XXXI.

مصطلحات موضوعية: Consistency (database systems), Template, Relation (database), Computer engineering, Computer science, Decision tree learning, Feature (machine learning), Process (computing), Process window, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1704485b8cffd769b5094560c0e2f96e
https://doi.org/10.1117/12.2297659

المؤلفون: Yuyang Sun, Larry Zhuang, Srividya Jayaram, Todd Bailey, Fan Jiang, Scott M. Mansfield, Vivian Wei Guo, Alexander Tritchkov, Xima Zhang

المصدر: Extreme Ultraviolet (EUV) Lithography IX.

مصطلحات موضوعية: Depth of focus, Optics, business.industry, Computer science, Extreme ultraviolet lithography, Node (circuits), Process window, Overlay, business, Focus (optics), Lithography, Numerical aperture

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::682d2e6a7ffde0f2b3b8ff4ea99e3527
https://doi.org/10.1117/12.2297410

المؤلفون: Martin Burkhardt, Srividya Jayaram, Fan Jiang, Nicole Saulnier, Ananthan Raghunathan, James Word, Alexander Tritchkov

المصدر: Extreme Ultraviolet (EUV) Lithography VII.

مصطلحات موضوعية: Depth of focus, Resolution enhancement technologies, Computer science, business.industry, Extreme ultraviolet lithography, Process variation, Optics, Resist, Feature (computer vision), Multiple patterning, Computer vision, Process window, Wafer, Artificial intelligence, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::974fc3f0844a0ebe566b0dc5315066c5
https://doi.org/10.1117/12.2218315

المؤلفون: Todd Bailey, Alexander Tritchkov, Scott M. Mansfield, James Word, Xima Zhang, Yuyang Sun, Larry Zhuang, Srividya Jayaram, Fan Jiang, Vivian Wei Guo

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS. 18:1

مصطلحات موضوعية: Depth of focus, Computer science, Image quality, Mechanical Engineering, Extreme ultraviolet lithography, Condensed Matter Physics, 01 natural sciences, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, 010309 optics, 0103 physical sciences, Electronic engineering, Node (circuits), Process window, Electrical and Electronic Engineering, Photomask, Focus (optics), Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5b92cfc1ef5b4ce8fa172f62913534a4
https://doi.org/10.1117/1.jmm.18.1.011003

المؤلفون: Norbert Strecker, Shashidhara K. Ganjugunte, Ilhami Torunoglu, Pat LaCour, Srividya Jayaram

المصدر: Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII.

مصطلحات موضوعية: Conflict resolution strategy, Mathematical optimization, Engineering, Semiconductor device fabrication, business.industry, Bounded function, Independent set, Conflict resolution, Geometric shape, business, Algorithm, Vertex (geometry), Design for manufacturability

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::601ccfc6abbf7b806fe2e356d57a466c
https://doi.org/10.1117/12.2193023

المؤلفون: Srividya Jayaram, James Word, Pat LaCour, Alexander Tritchkov

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Engineering, Engineering drawing, Computer engineering, business.industry, Hardware_INTEGRATEDCIRCUITS, Process window, business, Chip, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6c795137fae722d36cbfe6e02d95ba30
https://doi.org/10.1117/12.2031789

المؤلفون: Srividya Jayaram, James Word, Pat LaCour, Alexander Tritchkov

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Computer science, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Process window, Chip, Lithography, Simulation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c35c598a728511bd2c9531d575b42697
https://doi.org/10.1117/12.2011611

المؤلفون: Aasutosh Dave, Rachit Gupta, Edita Tejnil, Pat LaCour, Srividya Jayaram

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Computer engineering, Computer science, law, Process window, Photolithography, Lithography, Simulation, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a0504f64a50b596784efc32a77bb4357
https://doi.org/10.1117/12.879492

المؤلفون: Aasutosh Dave, Omar El-Sewefy, John L. Sturtevant, Pat LaCour, Srividya Jayaram

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Pixel, Computer science, business.industry, law, ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION, Process (computing), Computer vision, Process window, Artificial intelligence, Photolithography, business, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0fdf7579f49d7a1b1d3642b5eea1acaa
https://doi.org/10.1117/12.846620