المؤلفون: Spoldi, G., Beuer, Susanne, Rommel, Mathias, Yanev, V., Bauer, A.J., Ryssel, H.

مصطلحات موضوعية: focused ion beam (FIB), ion implantation damage, scanning capacitance microscopy, scanning spreading resistance microscopy

Time: 670, 620, 530, 621

وصف الملف: application/pdf

Relation: International Conference on Micro- and Nano-Engineering (MNE) 2008; 34th International Conference on Micro- and Nano-Engineering, MNE 2008; https://publica.fraunhofer.de/handle/publica/362085

الاتاحة: https://publica.fraunhofer.de/handle/publica/362085
https://doi.org/10.1016/j.mee.2009.01.003

المؤلفون: Rommel, M, Spoldi, G., Yanev, V., Beuer, Susanne, Amon, B., Jambreck, J., Petersen, S., Bauer, A.J., Frey, L.

مصطلحات موضوعية: FIB, SPM, focused ion beam, scanning probe microscopy, FIB damage, SSRM, SCM

Time: 670, 620, 530, 533

وصف الملف: application/pdf

Relation: Journal of vacuum science and technology B. Microelectronics and nanometer structures; https://publica.fraunhofer.de/handle/publica/221628

الاتاحة: https://publica.fraunhofer.de/handle/publica/221628
https://doi.org/10.1116/1.3431085

المؤلفون: Mica, I., Di Piazza, L., Laurin, L., Mariani, M., Mauri, A.G., Polignano, M.L., Ricci, E., Sammiceli, F., Spoldi, G.

المصدر: Materials Science and Engineering: B ; volume 159-160, page 168-172 ; ISSN 0921-5107

الاتاحة: http://dx.doi.org/10.1016/j.mseb.2008.05.022
https://api.elsevier.com/content/article/PII:S0921510708002353?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0921510708002353?httpAccept=text/plain

المؤلفون: Polignano, M. L., Mica, I., Bontempo, V., Cazzaniga, F., Mariani, M., Mauri, A., Pavia, G., Sammiceli, F., Spoldi, G.

المصدر: Journal of Materials Science: Materials in Electronics ; volume 19, issue S1, page 182-188 ; ISSN 0957-4522 1573-482X

الاتاحة: http://dx.doi.org/10.1007/s10854-008-9630-4
http://link.springer.com/content/pdf/10.1007/s10854-008-9630-4.pdf
http://link.springer.com/article/10.1007/s10854-008-9630-4/fulltext.html
http://link.springer.com/content/pdf/10.1007/s10854-008-9630-4

المؤلفون: Yanev, V., Rommel, M., Spoldi, G., Beuer, S., Amon, B., Petersen, S., Lugstein, A., Steiger, A., Bauer, A.J., Ryssel, H.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::877ba9dda64c4ed91a908da0f7fa94a6

المؤلفون: Rommel, M., Spoldi, G., Yanev, V., Beuer, S., Amon, B., Jambreck, J., Petersen, S., Bauer, A. J., Frey, L.

المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; May2010, Vol. 28 Issue 3, p595-607, 13p, 5 Diagrams, 8 Graphs

مصطلحات موضوعية: ION bombardment, SILICON, SCANNING probe microscopy, TRANSMISSION electron microscopy, IRRADIATION, SCATTERING (Physics)

المؤلفون: Spoldi, G., Beuer, Susanne, Rommel, Mathias, Yanev, V., Bauer, A.J., Ryssel, H.

مصطلحات موضوعية: focused ion beam, ion implantation damage, scanning capacitance microscopy, scanning spreading resistance microscopy

Time: 670, 620, 530

وصف الملف: application/pdf

Relation: International Conference on Micro- and Nano-Engineering (MNE) 2008; https://publica.fraunhofer.de/handle/publica/360169

الاتاحة: https://publica.fraunhofer.de/handle/publica/360169
https://doi.org/10.24406/publica-fhg-360169