المؤلفون: Sulania, Indra, Sondhi, Harpreet, Kumar, Tanuj, Ojha, Sunil, Umapathy, G. R., Mishra, Ambuj, Tripathi, Ambuj, Krishna, Richa, Avasthi, Devesh Kumar, Mishra, Yogendra Kumar

المصدر: Sulania , I , Sondhi , H , Kumar , T , Ojha , S , Umapathy , G R , Mishra , A , Tripathi , A , Krishna , R , Avasthi , D K & Mishra , Y K 2024 , ' Investigating ripple pattern formation and damage profiles in Si and Ge induced by 100 keV Ar+ ion beam : a comparative study ' , Beilstein Journal of Nanotechnology , vol. 15 , pp. 367-375 . https://doi.org/10.3762/bjnano.15.33

مصطلحات موضوعية: atomic force microscopy, ion beam, nanopatterns, radiation damage, Rutherford backscattering spectrometry, transmission electron microscopy

Relation: https://portal.findresearcher.sdu.dk/da/publications/f8682080-cbfe-40de-8a89-bf47f9735ca1

الاتاحة: https://portal.findresearcher.sdu.dk/da/publications/f8682080-cbfe-40de-8a89-bf47f9735ca1
https://doi.org/10.3762/bjnano.15.33
http://www.scopus.com/inward/record.url?scp=85191313139&partnerID=8YFLogxK

المؤلفون: Saxena, Nishtha, Sondhi, Harpreet, Sharma, Rishabh, Joshi, Monika, Amirthapandian, S., Rajput, Parasmani, Sinha, Om Prakash, Krishna, Richa

المصدر: Chemical Physics Impact ; volume 5, page 100119 ; ISSN 2667-0224

الاتاحة: http://dx.doi.org/10.1016/j.chphi.2022.100119
https://api.elsevier.com/content/article/PII:S2667022422000573?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S2667022422000573?httpAccept=text/plain

المؤلفون: Sondhi, Harpreet¹ (AUTHOR), Nijboer, Michiel¹ (AUTHOR), Makhoul, Elissa² (AUTHOR), Nijmeijer, Arian¹ (AUTHOR), Roozeboom, Fred¹ (AUTHOR), Bechelany, Mikhael^2,3 (AUTHOR), Kovalgin, Alexey⁴ (AUTHOR), Luiten-Olieman, Mieke¹ (AUTHOR) m.w.j.luiten@utwente.nl

المصدر: Applied Surface Science. Feb2025:Part A, Vol. 683, pN.PAG-N.PAG. 1p.

مصطلحات موضوعية: *CHEMICAL affinity, *X-ray photoelectron spectroscopy, *DIFFERENTIAL thermal analysis, *CHEMICAL properties, *CONTACT angle, *ALIPHATIC alcohols

المؤلفون: Sharma, Mahima, Sondhi, Harpreet, Krishna, Richa, Srivastava, Sanjeev Kumar, Rajput, Parasmani, Nigam, Subhasha, Joshi, Monika

المساهمون: Department of Science and Technology, Ministry of Science and Technology

المصدر: Environmental Science and Pollution Research ; volume 27, issue 25, page 32076-32087 ; ISSN 0944-1344 1614-7499

الاتاحة: http://dx.doi.org/10.1007/s11356-020-08849-3
https://link.springer.com/content/pdf/10.1007/s11356-020-08849-3.pdf
https://link.springer.com/article/10.1007/s11356-020-08849-3/fulltext.html