المؤلفون: Dinh, Cong Que, Nagahara, Seiji, Kuwahara, Yuhei, Dauendorffer, Arnaud, Okada, Soichiro, Fujimoto, Seiji, Kawakami, Shinichiro, Shimura, Satoru, Muramatsu, Makoto, Cho, Kayoko, Liu, Xiang, Nafus, Kathleen, Carcasi, Michael A., Agarwal, Ankur, Somervell, Mark H., Huli, Lior, Kato, Kanzo, Kocsis, Michael, De Schepper, Peter, Meyers, Stephen T., McQuade, Lauren, Kasahara, Kazuki, Garcia Santaclara, Jara, Hoefnagels, Rik, Anderson, Chris, Naulleau, Patrick

المساهمون: Guerrero, Douglas, Amblard, Gilles R.

المصدر: Advances in Patterning Materials and Processes XL

الاتاحة: http://dx.doi.org/10.1117/12.2655928

المؤلفون: Zhang, Yuanyi, Discekici, Emre H., Burns, Ryan L., Somervell, Mark H., Hawker, Craig J., Bates, Christopher M.

المساهمون: Semiconductor Research Corporation

المصدر: ACS Applied Polymer Materials ; volume 2, issue 2, page 481-486 ; ISSN 2637-6105 2637-6105

الاتاحة: http://dx.doi.org/10.1021/acsapm.9b00914
http://pubs.acs.org/doi/pdf/10.1021/acsapm.9b00914
https://pubs.acs.org/doi/pdf/10.1021/acsapm.9b00914

المؤلفون: Burns, Ryan L., Zhang, Yuanyi, D'Ambra, Colton, Somervell, Mark H., Berglund, Sean, Carcasi, Michael, Huli, Lior, Muramatsu, Makoto, Segalman, Rachel A., Hawker, Craig J., Bates, Chris

المساهمون: Guerrero, Douglas, Sanders, Daniel P.

المصدر: Advances in Patterning Materials and Processes XXXVIII

الاتاحة: http://dx.doi.org/10.1117/12.2583086