المؤلفون: Akira Tokuhisa, Hiroshi Kitano, Hiroshi Matsuura, Hitoshi Kawai, Masaaki Doi, Satoshi Miwa, Soichi Owa, Yoshinori Oshita, 三輪 聡, 北野 博史, 土肥 正明, 大和 壮一, 尾下 善紀, 徳久 章, 松浦 裕, 河井 斉

المصدر: レーザー研究 / The Review of Laser Engineering. 2005, 33(Supplement):52

المؤلفون: Soichi OWA, 大和 壮一

المصدر: 応用物理 / Oyo Buturi. 2005, 74(9):1192

المؤلفون: Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Steve Renwick, Noriyuki Hirayanagi, Bausan Yuan

المصدر: Optical and EUV Nanolithography XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ec4fda250b7401c4c0166c6b01d7f229
https://doi.org/10.1117/12.2657730

المؤلفون: Yuho Kanaya, Yoji Watanabe, Yusuke Saito, Toshiaki Sakamoto, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

المصدر: Photomask Technology 2022.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a635984af57a598fc4648046dc7b5d71
https://doi.org/10.1117/12.2641419

المؤلفون: Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Thomas Koo, Rocky Mai, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

المصدر: Optical and EUV Nanolithography XXXV.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3f06dbee0fa462b610798733d173f0ea
https://doi.org/10.1117/12.2613902

المؤلفون: Yoji Watanabe, Thomas Koo, David Tseng, Toshiaki Sakamoto, Yusuke Saito, Stephen Renwick, Hwan Lee, Bausan Yuan, Yuho Kanaya, Noriyuki Hirayanagi, Craig Poppe, Conrad Sorensen, Soichi Owa

المصدر: Photomask Technology 2021.

مصطلحات موضوعية: Scanner, Spatial light modulator, Pixel, Computer science, business.industry, Subpixel rendering, law.invention, Controllability, Optics, law, Point (geometry), Photolithography, business, Maskless lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e6b8de011b99a128b2c35bdcdba2f786
https://doi.org/10.1117/12.2600898

المؤلفون: Conrad Sorensen, Hwan Lee, Soichi Owa, Yoji Watanabe, Yusuke Saito, Craig Poppe, Stephen Renwick, Yuho Kanaya, Hirotaka Kono, Bausan Yuan, Thomas Koo, David Tseng, Noriyuki Hirayanagi, Toshiaki Sakamoto

المصدر: Optical Microlithography XXXIV.

مصطلحات موضوعية: Scanner, Wavelength, Optics, Materials science, Light source, Spatial light modulator, Solid-state laser, business.industry, Resolution (electron density), business, Chip

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::06a9c4d2b32aa12af04823fb9e034d31
https://doi.org/10.1117/12.2583680

المؤلفون: Mark C. Phillips, Soichi Owa

المصدر: Optical Microlithography XXXIII.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::192ef4e414b733e36aae563b632018b5
https://doi.org/10.1117/12.2570937

المؤلفون: Jongwook Kye, Soichi Owa

المصدر: Optical Microlithography XXXI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b138bd180cb33f85589e415fc1456824
https://doi.org/10.1117/12.2324760

المؤلفون: Soichi Owa, Noriyuki Hirayanagi

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Computer science, business.industry, Computational lithography, Extreme ultraviolet lithography, Metamaterial, 01 natural sciences, Engineering physics, law.invention, 010309 optics, law, 0103 physical sciences, Multiple patterning, Optoelectronics, Stencil lithography, X-ray lithography, Wafer, Photolithography, business, Lithography, Maskless lithography, Next-generation lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::aaf48ef0f40a4e622adcb8cba672d36a
https://doi.org/10.1117/12.2219918

المؤلفون: Gene Fuller, Soichi Owa, Martin McCallum

المصدر: Microelectronic Engineering. 83:667-671

مصطلحات موضوعية: Physics, business.industry, Extreme ultraviolet lithography, Condensed Matter Physics, Polarization (waves), Interference (wave propagation), Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Wavelength, Optics, law, Electrical and Electronic Engineering, Photolithography, business, Lithography, Immersion lithography, Order of magnitude

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::db84818c6f32e06e789abcee33076c83
https://doi.org/10.1016/j.mee.2005.12.036

المؤلفون: Masashi Yoshimura, Kenichi Muramatsu, Hiroshi Kitano, Soichi Owa, Yusuke Mori, Takatomo Sasaki, Hitoshi Kawai

المصدر: Japanese Journal of Applied Physics. 42:L166-L169

مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), business.industry, Laser source, Energy conversion efficiency, General Engineering, General Physics and Astronomy, Second-harmonic generation, Power (physics), Crystal, Optics, Light source, Harmonic, Fiber amplifier, Optoelectronics, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8609a09900cefcb6fb12e09ced296661
https://doi.org/10.1143/jjap.42.l166

المؤلفون: Junji Suzuki, Atsushi Komai, Yasushi Ohuchi, Yasuo Tezuka, Hiroshi Konishi, Madoka Nishiyama, Yoshihiko Suzuki, Soichi Owa

المصدر: 2008 IEEE 21st International Conference on Micro Electro Mechanical Systems ; page 762-765 ; ISSN 1084-6999

الاتاحة: http://dx.doi.org/10.1109/memsys.2008.4443768
http://xplorestaging.ieee.org/ielx5/4443569/4443570/04443768.pdf?arnumber=4443768

المؤلفون: Hidetami Yaegashi, Masayuki Murayama, Shinji Wakamoto, Soichi Owa, Kenichi Oyama

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Transistor, Nanotechnology, Grating, Repetition Number, Trim, law.invention, law, Multiple patterning, Optoelectronics, Node (circuits), business, Next-generation lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d0e584922aa875488a0da1dd0d1dc124
https://doi.org/10.1117/12.2046604

المؤلفون: Masaomi Kameyama, Martin McCallum, Soichi Owa

المصدر: Microelectronic Engineering. 83:640-642

مصطلحات موضوعية: Cutting tool, Computer science, business.industry, Mechanical engineering, Space manufacturing, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Catadioptric system, Optics, law, Immersion (virtual reality), Electrical and Electronic Engineering, Photolithography, business, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f506668d7f9dbfce510eb847abebc075
https://doi.org/10.1016/j.mee.2006.01.251

المؤلفون: Hiroshi Kitano, Hiroshi Kitano, Akira Tokuhisa, Akira Tokuhisa, Masaaki Doi, Masaaki Doi, Soichi Owa, Soichi Owa

المصدر: Japanese Journal of Applied Physics ; volume 40, issue 9A, page L955 ; ISSN 0021-4922 1347-4065

الاتاحة: http://dx.doi.org/10.1143/jjap.40.l955
https://iopscience.iop.org/article/10.1143/JJAP.40.L955
https://iopscience.iop.org/article/10.1143/JJAP.40.L955/pdf

المؤلفون: Hiroyoshi Matsumura, Takatomo Sasaki, Soichi Owa, Hiroaki Adachi, Hiroshi Kitano, Tsuyoshi Inoue, Yusuke Mori, Atsutoshi Murakami, Kazufumi Takano

المصدر: Japanese Journal of Applied Physics. 43:L297-L299

مصطلحات موضوعية: Process protein, Diffraction, Materials science, Physics and Astronomy (miscellaneous), business.industry, General Engineering, General Physics and Astronomy, Photoablation, Optics, X-ray crystallography, Ablative case, Uv laser, business, Protein crystallization, Electron backscatter diffraction

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b6449af346ca0b22f37f87470eb1f269
https://doi.org/10.1143/jjap.43.l297

المؤلفون: Atsutoshi Murakami, Kazufumi Takano, Hiroaki Adachi, Hiroyoshi Matsumura, Tsuyoshi Inoue, Takatomo Sasaki, Hiroshi Kitano, Soichi Owa, Yusuke Mori

المصدر: Japanese Journal of Applied Physics. 43:L73-L75

مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), business.industry, General Engineering, General Physics and Astronomy, Photoablation, Laser, law.invention, Crystal, Wavelength, Optics, Light source, law, X-ray crystallography, Uv laser, Optoelectronics, business, Protein crystallization

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::120c08bd7e1551b4b636ed085951216a
https://doi.org/10.1143/jjap.43.l73

المؤلفون: Toshiyuki Sekito, Yasuhiro Iriuchijima, Katsushi Nakano, Soichi Owa, Rei Seki, Toshihiko Sei, Yoshihiro Maruta, Tsunehito Hayashi, Tomoharu Fujiwara, Kenichi Shiraishi, Tadamasa Kawakubo

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Contact angle, Cost reduction, Materials science, Resist, business.industry, Multiple patterning, Optoelectronics, Wafer, Overlay, business, Immersion lithography, Manufacturing cost

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6110aecfaa49b34d2e530e425b6e7a75
https://doi.org/10.1117/12.846520

المؤلفون: Naonori Kita, Yasushi Mizuno, Soichi Owa, Tomoyuki Matsuyama, Osamu Tanitsu, Masahiko Okumura

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Light intensity, Optics, Margin (machine learning), law, business.industry, Computer science, Photolithography, Focus (optics), business, Grayscale, Pupil, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::baa05e7f1994fa7fec8e77adedbc62c8
https://doi.org/10.1117/12.846476