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1
المؤلفون: Shuo Huang, Prem Panneerchelvam, Chad M. Huard, Shyam Sridhar, Peter L. G. Ventzek, Mark D. Smith
المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XII.
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2
المؤلفون: Stefanos Leonardos, Shyam Sridhar, Yun Kuen Cheung, Georgios Piliouras
المصدر: Mathematical Research for Blockchain Economy ISBN: 9783031186783
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3
المؤلفون: Yun Kuen Cheung, Stefanos Leonardos, Shyam Sridhar, Georgios Piliouras
المصدر: Mathematical Research for Blockchain Economy ISBN: 9783031186783
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4
المؤلفون: Daniel Reijsbergen, Shyam Sridhar, Barnabe Monnot, Stefanos Leonardos, Stratis Skoulakis, Georgios Piliouras
المصدر: 2021 IEEE International Conference on Blockchain (Blockchain).
مصطلحات موضوعية: Social and Information Networks (cs.SI), FOS: Computer and information sciences, Computer Science - Computer Science and Game Theory, FOS: Mathematics, Computer Science - Multiagent Systems, Computer Science - Social and Information Networks, Dynamical Systems (math.DS), Mathematics - Dynamical Systems, 91A80, 91-10, 91B26, Computer Science and Game Theory (cs.GT), Multiagent Systems (cs.MA)
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5
المؤلفون: Peter Ventzek, Shyam Sridhar, Ya-Ming Chen, Roberto Longo, Gregory Hartmann, Jianping Zhao, Jun Shinagawa, Zhiying Chen
المصدر: ECS Meeting Abstracts. :864-864
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6
المؤلفون: Vijay Narayanan, Dexin Kong, Saraf Iqbal Rashid, Youngseok Kim, Takashi Ando, Soon-Cheon Seo, Sergey Voronin, Nicole Saulnier, Shyam Sridhar, Catano Christopher
المصدر: Advanced Etch Technology for Nanopatterning IX.
مصطلحات موضوعية: business.industry, Computer science, Analog computer, Electrical engineering, Resistive random-access memory, law.invention, Etching (microfabrication), law, Resistive switching, Scalability, Metal electrodes, business, Efficient energy use, Voltage
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7
المؤلفون: Alok Ranjan, Talone Christopher, Shyam Sridhar, Joy Nicholas, Catano Christopher, Sergey Voronin, Peter Biolsi
المصدر: Advanced Etch Technology for Nanopatterning VIII.
مصطلحات موضوعية: Planar, Fabrication, business.industry, law, Transistor, Isotropy, Nanowire, Optoelectronics, Wafer, Dry etching, business, Isotropic etching, law.invention
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8
المؤلفون: Shyam Sridhar, Alok Ranjan, Peter L. G. Ventzek
المصدر: Journal of Vacuum Science & Technology A. 38:043007
مصطلحات موضوعية: Materials science, fungi, technology, industry, and agriculture, macromolecular substances, Surfaces and Interfaces, Partial pressure, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry.chemical_compound, Adsorption, Chemical engineering, Silicon nitride, chemistry, Physisorption, Chemisorption, Etching (microfabrication), Desorption, Surface modification
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9
المؤلفون: Li Wang, Nolan Andrew, Peter Biolsi, Karakas Erdinc, Alok Ranjan, Sergey Voronin, Shyam Sridhar
المصدر: Advanced Etch Technology for Nanopatterning VII.
مصطلحات موضوعية: Materials science, Plasma etching, Silicon, technology, industry, and agriculture, chemistry.chemical_element, engineering.material, law.invention, chemistry.chemical_compound, Hydrofluoric acid, Anti-reflective coating, chemistry, Chemical engineering, Coating, Etching (microfabrication), law, engineering, Dry etching, Layer (electronics)
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10
المصدر: European Polymer Journal. 75:495-503
مصطلحات موضوعية: Materials science, Polymers and Plastics, General Physics and Astronomy, 02 engineering and technology, Substrate (electronics), engineering.material, Physics and Astronomy(all), 010402 general chemistry, 01 natural sciences, chemistry.chemical_compound, Coating, Polymer chemistry, Materials Chemistry, Lamellar structure, Composite material, Thin film, Silanes, Organic Chemistry, 021001 nanoscience & nanotechnology, Silane, 0104 chemical sciences, chemistry, engineering, Grazing-incidence small-angle scattering, Self-assembly, 0210 nano-technology
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11Academic Journal
المؤلفون: Gautam Shaw, Shyam Sridharan, Shashank Ranu, Foram Shingala, Prabha Mandayam, Anil Prabhakar
المصدر: IEEE Photonics Journal, Vol 14, Iss 5, Pp 1-7 (2022)
مصطلحات موضوعية: Differential phase, QBER, quantum key distri- bution, secure key, time-bin superposition methods, Applied optics. Photonics, TA1501-1820, Optics. Light, QC350-467
وصف الملف: electronic resource
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12
المؤلفون: Vincent M. Donnelly, Lei Liu, Weiye Zhu, Mark J. Kushner, H. Shin, Demetre J. Economou, Shyam Sridhar, Michael D. Logue
المصدر: 2013 Abstracts IEEE International Conference on Plasma Science (ICOPS).
مصطلحات موضوعية: symbols.namesake, Materials science, Ionization, symbols, Langmuir probe, Capacitively coupled plasma, Plasma, Atomic physics, Inductively coupled plasma, Pulsed power, Electron ionization, Secondary source
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13
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 34:061303
مصطلحات موضوعية: 010302 applied physics, animal structures, Photon, Silicon, technology, industry, and agriculture, Analytical chemistry, chemistry.chemical_element, 02 engineering and technology, Surfaces and Interfaces, Plasma, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Dissociation (chemistry), Surfaces, Coatings and Films, symbols.namesake, chemistry, Desorption, Torr, 0103 physical sciences, Faraday effect, symbols, Reactive-ion etching, 0210 nano-technology
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14
المؤلفون: Shyam Sridhar, Vaibhaw Kumar, Jeffrey R. Errington
المصدر: The Journal of chemical physics. 135(18)
مصطلحات موضوعية: Surface (mathematics), Work (thermodynamics), Materials science, Surface Properties, Monte Carlo method, General Physics and Astronomy, Physics::Fluid Dynamics, Contact angle, symbols.namesake, Gibbs isotherm, Lennard-Jones potential, symbols, Surface roughness, Wettability, Thermodynamics, Computer Simulation, Wetting, Statistical physics, Physical and Theoretical Chemistry, Monte Carlo Method
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15
المؤلفون: Vincent M. Donnelly, Shyam Sridhar, Demetre J. Economou, Lei Liu
المصدر: Journal of Physics D: Applied Physics. 48:485201
مصطلحات موضوعية: Acoustics and Ultrasonics, Chemistry, Analytical chemistry, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Ion, Afterglow, Computer Science::Robotics, symbols.namesake, Physics::Plasma Physics, Duty cycle, symbols, Electron temperature, Langmuir probe, Continuous wave, Atomic physics, Inductively coupled plasma
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16
المؤلفون: Weiye Zhu, Demetre J. Economou, Michael D. Logue, Vincent M. Donnelly, Lei Liu, Mark J. Kushner, Shyam Sridhar
المصدر: Journal of Applied Physics. 118:083303
مصطلحات موضوعية: Chemistry, General Physics and Astronomy, Plasma, Electron, Pulsed power, symbols.namesake, Physics::Plasma Physics, Ionization, symbols, Langmuir probe, Electron temperature, Plasma diagnostics, Atomic physics, Inductively coupled plasma
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17
المؤلفون: Vincent M. Donnelly, Weiye Zhu, Lei Liu, Eduardo Hernandez, Demetre J. Economou, Shyam Sridhar
المصدر: Journal of Applied Physics. 115:203303
مصطلحات موضوعية: X-ray photoelectron spectroscopy, Silicon, chemistry, Etching (microfabrication), Scanning electron microscope, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Plasma, Dry etching, Reactive-ion etching, Ion
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18Academic Journal
المؤلفون: Weiye Zhu, Shyam Sridhar, Lei Liu, Eduardo Hernandez, Vincent M Donnelly, Demetre J Economou
المساهمون: The Pennsylvania State University CiteSeerX Archives
وصف الملف: application/pdf
Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.1049.3543; http://doeplasma.eecs.umich.edu/files/PSC_Zhu1.pdf
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19Academic Journal
المؤلفون: Weiye Zhu, Lei Liu, Shyam Sridhar, Demetre J. Economou, Vincent M. Donnelly
المساهمون: The Pennsylvania State University CiteSeerX Archives
وصف الملف: application/pdf
Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.651.129; http://doeplasma.eecs.umich.edu/files/DOE_PLSC_highlight_2013_10.pdf
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20Academic Journal
المؤلفون: Hyungjoo Shin, Weiye Zhu, Lei Liu, Shyam Sridhar, Vincent M. Donnelly (a, Demetre J. Economou (b
المساهمون: The Pennsylvania State University CiteSeerX Archives
وصف الملف: application/pdf
Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.352.8830; http://doeplasma.eecs.umich.edu/files/DOE_PLSC_highlight_2012_10_v01.pdf