المؤلفون: Jeffrey Weintraub, Scott Warrick

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.

مصطلحات موضوعية: Generality, Casual, Yield (finance), Industry standard, Code (cryptography), Algorithm, Die (integrated circuit), Mathematics, Causal analysis

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2b02ecf4654604682879a5f561ae119b
https://doi.org/10.1117/12.2515080

المؤلفون: Jeffrey Weintraub, Scott Warrick

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.

مصطلحات موضوعية: Contamination control, Computer science, Control limits, Control (management), Outlier, Process (computing), Anomaly detection, Data mining, computer.software_genre, computer

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2ca56f4a0187cc9f09a08dcfe3e60f07
https://doi.org/10.1117/12.2297379

المؤلفون: Scott Warrick, Jeffrey Weintraub

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Data collection, Computer science, Process (engineering), Control (management), Sampling (statistics), Sample (statistics), 02 engineering and technology, 021001 nanoscience & nanotechnology, computer.software_genre, 01 natural sciences, Industrial engineering, 010309 optics, Work (electrical), 0103 physical sciences, Process control, Data mining, Product (category theory), 0210 nano-technology, Sampling methodology, computer

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d8df31422df4e633ead7c0c9052c5375
https://doi.org/10.1117/12.2258031

المؤلفون: Jeffrey Weintraub, Scott Warrick

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Short run, Computer science, Process (computing), 02 engineering and technology, Geometric distribution, 021001 nanoscience & nanotechnology, Statistical process control, 01 natural sciences, Stability (probability), 010309 optics, Sampling distribution, 0103 physical sciences, Process control, Probability distribution, 0210 nano-technology, Algorithm

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b76f6e7f5660b8129c67b7352ce8fb1a
https://doi.org/10.1117/12.2218623

المؤلفون: Scott Warrick, S. Gaugiran, Bénédicte Mortini, David Cruau, M. Benndorf, Romain Feilleux, C. Sourd, Vincent Farys

المصدر: Microelectronic Engineering. 84:1054-1057

مصطلحات موضوعية: Chemistry, Nanotechnology, Photoresist, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Barrier layer, Resist, Chemical engineering, law, Immersion (virtual reality), Leaching (metallurgy), Electrical and Electronic Engineering, Photolithography, Lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fe32a376ce1413a07a45a1296fb2c4a1
https://doi.org/10.1016/j.mee.2007.01.117

المؤلفون: Scott Warrick, Will Conley, Mazen Saied, Yves Rody, Christian Gardin, Jonathan Planchot, Christophe Couderc, Patrick Montgomery, Pierre-Jerome Goirand, Catherine Martinelli, Amandine Borjon, Frank Sundermann, Bill Wilkinson, Yorick Trouiller, Jean-Christophe Urbani, Frederic Robert, Laurent Le Cam, Florent Vautrin, G. Kerrien, Jerome Belledent, Emic Yesilada, Vincent Farys

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Resolution enhancement technologies, Computer science, Transistor, Integrated circuit, Design for manufacturability, law.invention, law, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Multiple patterning, Process window, System on a chip, Photolithography, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c32fba57c3e8540d10beaa1e15e963b6
https://doi.org/10.1117/12.714116

المؤلفون: Michael Benndorf, Jan-Willem Gemmink, Vincent Farys, Scott Warrick, Yorick Trouiller, Pascal Gouraud, Jerome Belledent, Dejan Jovanovic, Will Conley

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, Computational lithography, business.industry, law.invention, Optics, law, Thin-film interference, Process integration, Optoelectronics, Node (circuits), Photolithography, business, Lithography, Immersion lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d2833a86ea69029b79b3814fb7e7475f
https://doi.org/10.1117/12.716807

المؤلفون: Vincent Farys, Catherine Chaton, Scott Warrick, Jean-Damien Chapon

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Chemical vapor deposition, law.invention, Wavelength, Optics, Anti-reflective coating, Stack (abstract data type), law, Process window, Photolithography, business, Lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::517e1f6e5ccef75dc19c77487a65f25c
https://doi.org/10.1117/12.712882

المؤلفون: Michael Benndorf, Vincent Farys, Scott Warrick, Karim Mestadi, Danilo DeSimone, Will Conley, Jan-Willem Gemmink, David Cruau

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Optical proximity correction, Resist, Computer science, law, Miniaturization, Nanotechnology, Photolithography, Engineering physics, Lithography, Immersion lithography, Numerical aperture, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e8417bde10dfb046a9ed0843b37b180e
https://doi.org/10.1117/12.715987

المؤلفون: David Van Steenwinckel, Cesar Garza, Will Conley, Scott Warrick, Pierre-Jerome Goirand, Jan-Willem Gemmink

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Mercury-vapor lamp, Computer science, law, Water immersion, business.industry, Optoelectronics, Photoresist, Photolithography, business, Refractive index, Engineering physics, Lithography, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::dc27dbc0af5a2e58ff43bf3a971da4ec
https://doi.org/10.1117/12.714341

المؤلفون: Scott Warrick, K. Mestadi, David Cruau, S. Gaugiran, Michael Benndorf, Vincent Farys, Romain Feilleux, C. Sourd

المصدر: 23rd European Mask and Lithography Conference.

مصطلحات موضوعية: Contact angle, Scanner, Materials science, Resist, Immersion (virtual reality), Nanotechnology, Process optimization, Composite material, Photomask, Lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2524577a182950b5dc77b5c578a490ff
https://doi.org/10.1117/12.736328

المؤلفون: N. Cave, Vincent Huard, C. Monget, C. Le Cam, S. Zoll, S. Parihar, S. Bordez, F. Guyader, D. Delille, N. Auriac, Michel Haond, R. Pantel, B. Icard, M. Zaleski, S. Harrison, A. Margain, C. Blanc, Scott Warrick, D. Barge, J. Belledent, D. Villanueva, Francois Leverd, G. Ribes, E. Baylac, Alexis Farcy, C. Laviron, Kathy Barla, E. Perrin, K. Rochereau, M. Bidaud, S. Manakli, Pascal Gouraud, Laurent Pain, O. Callen, Blandine Minghetti, Emmanuel Josse, Paulo Ferreira, R. Ranica

المصدر: 2006 International Electron Devices Meeting.

مصطلحات موضوعية: Materials science, business.industry, Transistor, Electrical engineering, Hardware_PERFORMANCEANDRELIABILITY, AC power, law.invention, Reliability (semiconductor), Strain engineering, law, Gate oxide, Hardware_INTEGRATEDCIRCUITS, Power semiconductor device, Electronics, Static random-access memory, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cd04a63739424f6f3bc7798a8d44e368
https://doi.org/10.1109/iedm.2006.346880

المؤلفون: Joseph S. Gordon, Scott Warrick, Mazen Saied, Craig A. West, Franklin D. Kalk, Mark D. Smith, Jan Pieter Kuijten, Mike Pochkowski, Kevin Lucas, Will Conley

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, law.invention, Numerical aperture, Optics, Optical proximity correction, law, Thin-film interference, Reticle, Photolithography, Photomask, business, Lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3dc4fa31a2d4a185425013922d7f2794
https://doi.org/10.1117/12.686741

المؤلفون: Jean-Damien Chapon, A. Pouydebasque, S. Vadot, Stephane Denorme, C. Laviron, Scott Warrick, K. Romanjek, D. Delille, H. Bernard, Aomar Halimaoui, Franck Arnaud, Francois Leverd, Romain Gwoziecki, B. Dumont, Tomasz Skotnicki, I. Pouilloux, C. Chaton, Pascal Gouraud, M. Bidaud, Frederic Boeuf, Francois Wacquant, Nicolas Planes

المصدر: IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..

مصطلحات موضوعية: Materials science, business.industry, Annealing (metallurgy), Electrical engineering, Ring oscillator, Laser, PMOS logic, Ion, law.invention, CMOS, law, Optoelectronics, Static random-access memory, business, NMOS logic

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::90b0ca29a4ffd23bb80e55ad2667d71b
https://doi.org/10.1109/iedm.2005.1609438

المؤلفون: Jerome Belledent, Scott Warrick, Juan-Manuel Gomez, Alex Barr, Emmanuel Sicurani, Rob Morton, Jan-Willem Gemmink, Kevin Lucas, David Cruau, Valerie Plantier, Andrea Mauri, C. Monget, Will Conley, Jean-Damien Chapon

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Engineering, Engineering drawing, Resist, business.industry, Process integration, Reticle, Manufacturing line, Direct transfer, business, Lithography, Simulation, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8c305d13e3cf69552e7c67761b9ad7cd
https://doi.org/10.1117/12.657158

المؤلفون: Jan-Willem Gemmink, C. Monget, Marc Mikolajczak, Joost van Herk, Scott Warrick, Jean de Caunes, Bertrand Le Gratiet, Jean-Damien Chapon

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Engineering, Multivariate statistics, Noise, Application-specific integrated circuit, Control theory, business.industry, Electronic engineering, Node (circuits), Overlay, Robust control, Performance improvement, business, Reliability engineering

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6007824921ae2cb7963e8a0882d6dc66
https://doi.org/10.1117/12.657177

المؤلفون: Scott Warrick, Francois Weisbuch, Jerome Depre, Will Conley

المصدر: Optical Microlithography XVIII.

مصطلحات موضوعية: Diffraction, Engineering, Optics, business.industry, Imaging lens, Process (computing), Range (statistics), Node (circuits), Process window, Radius, business, Aerial image

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e97d028615cfd468f352e45631d894c7
https://doi.org/10.1117/12.599760

المؤلفون: Richard Johannes Franciscus Van Haren, Rob Morton, Henry Megens, Paul Christiaan Hinnen, Kevin E. Cooper, Clyde Browning, Jerome Depre, Ramon Navarro, Scott Warrick, Pierre-Olivier Sassoulas, Doug Reber

المصدر: Optical Microlithography XVIII.

مصطلحات موضوعية: Engineering, business.industry, Electrical engineering, Stacking, chemistry.chemical_element, Overlay, Copper, Back end of line, Scanning probe microscopy, chemistry, Signal strength, Robustness (computer science), Copper metal, business, Computer hardware

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::48aa27bfc71782b7a1c69a59d40dcd3a
https://doi.org/10.1117/12.599807

المؤلفون: Olivier Toublan, Philippe Thony, Kyle Patterson, Sergei V. Postnikov, Emilien Robert, Daniel Henry, Scott Warrick, Andres Torres

المصدر: Optical Microlithography XVIII.

مصطلحات موضوعية: Dipole, Materials science, Optics, business.industry, Extreme ultraviolet lithography, Perpendicular, Multiple patterning, Optoelectronics, Process window, business, Lithography, Immersion lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8515c911fa803bc3bcffdf67fac8de99
https://doi.org/10.1117/12.601756

المؤلفون: Cesar M. Garza, Lena Zavyalova, Adrian van Zwol, Scott Warrick, Gary Stanley Seligman, James Foster

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Scanner, Engineering, business.industry, Zernike polynomials, Transistor, Image processing, law.invention, Metrology, Wafer fabrication, Lens (optics), Interferometry, symbols.namesake, Optics, law, symbols, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fb5ae2da532cb35d98228cef96e97fcd
https://doi.org/10.1117/12.485428