المؤلفون: Boyce S. Chang (6419303), Whitney S. Loo (5627723), Beihang Yu (4907749), Scott Dhuey (1748818), Lei Wan (290406), Paul F. Nealey (1328088), Ricardo Ruiz (1408471)

مصطلحات موضوعية: Cell Biology, Computational Biology, Biological Sciences not elsewhere classified, Chemical Sciences not elsewhere classified, Physical Sciences not elsewhere classified, ” pattern transfer, “ inks ”, sequentially graft onto, sequential brush grafting, line width roughness, existing polymer brushes, use brush interpenetration, polymer molecules, polymer film, via <, thermal annealing, substrate ’, robust cross, powerful technique, lithographic mask, linkable mats, higher tolerance, guiding patterns, guiding features, generate self, directed self, desired chemistry, chemical imperfections, block copolymers

Relation: https://figshare.com/articles/journal_contribution/Sequential_Brush_Grafting_for_Chemically_and_Dimensionally_Tolerant_Directed_Self-Assembly_of_Block_Copolymers/21750950

الاتاحة: https://doi.org/10.1021/acsami.2c16508.s001