المؤلفون: Gregory Costrini, J. D. Baniecki, M. Wise, Laertis Economikos, Satish D. Athavale, J. Lian, N. Nagel

المصدر: Integrated Ferroelectrics. 38:259-267

مصطلحات موضوعية: Materials science, business.industry, Condensed Matter Physics, Capacitance, Electronic, Optical and Magnetic Materials, law.invention, Capacitor, Stack (abstract data type), Control and Systems Engineering, law, Materials Chemistry, Ceramics and Composites, Optoelectronics, Metalorganic vapour phase epitaxy, Electrical and Electronic Engineering, Thin film, business, Layer (electronics), Scaling, Dram

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::91ffe3f35ecd7ee675fe93a9c4491cf4
https://doi.org/10.1080/10584580108016939

المؤلفون: Timothy M. Shaw, Katherine L. Saenger, G. Kunkel, Cyril Cabral, J. Lian, Robert B. Laibowitz, J. D. Baniecki, Yandong Wang, H. Shen, P. R. Duncombe, M. Gutsche, David E. Kotecki, Richard Wise, Satish D. Athavale, Young-Jin Park

المصدر: IBM Journal of Research and Development. 43:367-382

مصطلحات موضوعية: Materials science, General Computer Science, business.industry, Chemical vapor deposition, Dielectric, Capacitance, law.invention, Capacitor, chemistry.chemical_compound, chemistry, law, Electrode, Electronic engineering, Strontium titanate, Optoelectronics, Thin film, business, Dram

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5b1c56b0b66727c88637c17270fd8a4b
https://doi.org/10.1147/rd.433.0367

المؤلفون: Wei-Kan Chu, Demetre J. Economou, Sri Prakash Rangarajan, Zongshuang Zheng, Satish D. Athavale, Jiarui Liu, David M. Hoffman

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:306-311

مصطلحات موضوعية: Materials science, Inorganic chemistry, Gallium nitride, Surfaces and Interfaces, Substrate (electronics), Chemical vapor deposition, Nitride, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry.chemical_compound, Carbon film, chemistry, Plasma-enhanced chemical vapor deposition, Thin film, Stoichiometry

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3f8d4bde1e5aead998fa5ecc8ea146db
https://doi.org/10.1116/1.579893

المؤلفون: Demetre J. Economou, Satish D. Athavale

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 13:966-971

مصطلحات موضوعية: Silicon, Chemistry, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Condensed Matter Physics, Surfaces, Coatings and Films, Ion, Crystal, Adsorption, Etching (microfabrication), Yield (chemistry), Monolayer, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7ed2a789cbf6c268a31bb58e33003006
https://doi.org/10.1116/1.579659

المؤلفون: David M. Hoffman, Jiarui Liu, Sri Prakash Rangarajan, Wei-Kan Chu, Demetre J. Economou, Zongshuang Zheng, Satish D. Athavale

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 13:820-825

مصطلحات موضوعية: Materials science, Silicon, Inorganic chemistry, chemistry.chemical_element, Germanium, Surfaces and Interfaces, Substrate (electronics), Chemical vapor deposition, Nitride, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry.chemical_compound, Carbon film, chemistry, Plasma-enhanced chemical vapor deposition, Germanium nitride

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::dbe8b4a336722f283bcc59c151518b65
https://doi.org/10.1116/1.579834

المؤلفون: Shashank C. Deshmukh, Demetre J. Economou, Sri Prakash Rangarajan, David M. Hoffman, Wei-Kan Chu, Jiarui Liu, Zongshuang Zheng, Satish D. Athavale

المصدر: Journal of Materials Research. 9:3019-3021

مصطلحات موضوعية: Materials science, Hybrid physical-chemical vapor deposition, Mechanical Engineering, Analytical chemistry, Nitride, Combustion chemical vapor deposition, Condensed Matter Physics, chemistry.chemical_compound, Carbon film, Silicon nitride, chemistry, Mechanics of Materials, Plasma-enhanced chemical vapor deposition, General Materials Science, Thin film, Plasma processing

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d332e7e7236ca183294c83701b5d8452
https://doi.org/10.1557/jmr.1994.3019

المؤلفون: Keith T. Kwietniak, Y. Limb, Katherine L. Saenger, M.L. Wise, Deborah A. Neumayer, Gregory Costrini, P. C. Andricacos, J. D. Baniecki, J. Lian, Cyril Cabral, Robert B. Laibowitz, Satish D. Athavale

المصدر: MRS Proceedings. 655

مصطلحات موضوعية: Dynamic random-access memory, Materials science, business.industry, Dielectric, Ferroelectricity, law.invention, Capacitor, law, Electrode, Ferroelectric RAM, Optoelectronics, Electroplating, business, Dram

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::46566c30ee51dabb7da2e3c2b2704717
https://doi.org/10.1557/proc-655-cc2.1.1

المؤلفون: Sri Prakash Rangarajan, Wei-Kan Chu, Demetre J. Economou, Zongshuang Zheng, Satish D. Athavale, David M. Hoffman, Jiarui Liu

المصدر: MRS Proceedings. 335

مصطلحات موضوعية: chemistry.chemical_compound, Materials science, Carbon film, chemistry, Hybrid physical-chemical vapor deposition, Plasma-enhanced chemical vapor deposition, Analytical chemistry, chemistry.chemical_element, Germanium, Thin film, Combustion chemical vapor deposition, Plasma processing, Germanium nitride

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::eba9c2e132e97fe968502bdbc2e045fb
https://doi.org/10.1557/proc-335-3

المؤلفون: Kurt E. Williams, Danielle S. Hines, Martin Gutsche, Satish D. Athavale

المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:765

مصطلحات موضوعية: Argon, Materials science, Passivation, business.industry, General Engineering, chemistry.chemical_element, Nanotechnology, Titanium nitride, chemistry.chemical_compound, chemistry, Sputtering, Etching (microfabrication), Optoelectronics, Wafer, business, Platinum, Titanium

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d760f0317217d561c4f6674933823bb7
https://doi.org/10.1116/1.591274

المؤلفون: Demetre J. Economou, Satish D. Athavale

المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:3702

مصطلحات موضوعية: Materials science, Silicon, technology, industry, and agriculture, General Engineering, chemistry.chemical_element, Nanotechnology, Ion, Adsorption, Chemical engineering, chemistry, Etching (microfabrication), Monolayer, Dry etching, Reactive-ion etching, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::babfa82a134cf21df103f9ce4153239f
https://doi.org/10.1116/1.588651