المؤلفون: Maas, D. (author), Van veldhoven, E. (author), Chen, P. (author), Sidorkin, V. (author), Salemink, H. (author), Van der Drift, E. (author), Alkemade, P. (author)

مصطلحات موضوعية: Helium Ion Microscopy, HIM, nanoimaging, nanofabrication, scanning helium ion beam lithography, SHIBL, lithographyhelium ion beam induced deposition, HIBID

Relation: Proceedings of SPIE, 2010 vol. 7638--0277-786X; https://doi.org/10.1117/12.862438; http://resolver.tudelft.nl/uuid:662cc9b5-c69f-4e9e-8b3e-17b8df382885

الاتاحة: https://doi.org/10.1117/12.862438
http://resolver.tudelft.nl/uuid:662cc9b5-c69f-4e9e-8b3e-17b8df382885

المؤلفون: Dündar, M.A. (author), Christova, C. (author), Silov, A.Y. (author), Karouta, F. (author), Nötzel, R. (author), Wienk, M. (author), Salemink, H. (author), Van der Heijden, R. (author)

مصطلحات موضوعية: photonic crystal, infiltration, tuning, liquid crystal, colloidal quantum dots

Relation: Proceedings of SPIE, 2010, vol. 7713--0277-786X; http://resolver.tudelft.nl/uuid:1c40a58f-ab7c-4388-a8c3-58edc68358a0

الاتاحة: http://resolver.tudelft.nl/uuid:1c40a58f-ab7c-4388-a8c3-58edc68358a0

المؤلفون: Van der Heijden, R. (author), Kjellander, C. (author), Carlström, C.F. (author), Snijders, J. (author), Kicken, H. (author), Van der Heijden, R.W. (author), Bastiaansen, C. (author), Broer, D. (author), Van der Drift, E. (author), Salemink, H. (author)

مصطلحات موضوعية: photonic crystal, infiltration, tuning, polymer, liquid crystal

Relation: Proceedings of SPIE, 2006 vol. 6322--0277-786X; http://resolver.tudelft.nl/uuid:df35e0b4-e416-4225-884b-042213b37537

الاتاحة: http://resolver.tudelft.nl/uuid:df35e0b4-e416-4225-884b-042213b37537

المؤلفون: Van Veldhoven, E. (author), Sidorkin, V. (author), Chen, P. (author), Alkemade, P. (author), Van der Drift, E. (author), Salemink, H. (author), Zandbergen, H. (author), Maas, D. (author)

Relation: Microscopy and Microanalysis, 16 (supplement 2), 2010--1431-9276; https://doi.org/10.1017/S1431927610063270; http://resolver.tudelft.nl/uuid:9f809337-43c9-49e6-8c82-aff8e57c3686

الاتاحة: https://doi.org/10.1017/S1431927610063270
http://resolver.tudelft.nl/uuid:9f809337-43c9-49e6-8c82-aff8e57c3686

المؤلفون: Sidorkin, V. (author), Van Veldhoven, E. (author), Van der Drift, E.W.J.M. (author), Alkemade, P.F.A. (author), Salemink, H. (author), Maas, D. (author)

مصطلحات موضوعية: ion beam lithography, nanolithography, organic compounds, proximity effect (lithography), resists, hydrogen silsesquioxane, poly(methyl methacrylate), methyl isobutyl ketone

Relation: Journal of Vacuum Science & Technology B, 27 (4), 2009--1071-1023; http://resolver.tudelft.nl/uuid:c43921e0-20ba-4ba4-9df8-2d07020ba8ac

الاتاحة: http://resolver.tudelft.nl/uuid:c43921e0-20ba-4ba4-9df8-2d07020ba8ac

المؤلفون: Sidorkin, V. (author), Van der Drift, E.W.J.M. (author), Salemink, H. (author)

مصطلحات موضوعية: atomic force microscopy, electron beam lithography, organic compounds, resists, scanning electron microscopy, Resist temperature, hydrogen silsesquioxane, electron beam heating

Relation: Journal of Vacuum Science & Technology B, 26 (6), 2008--1071-1023; http://resolver.tudelft.nl/uuid:c48fa6d2-383c-4e85-a418-1d2bd9d2de78

الاتاحة: http://resolver.tudelft.nl/uuid:c48fa6d2-383c-4e85-a418-1d2bd9d2de78

المؤلفون: Maas, D. (author), Van Veldhoven, E. (author), Chen, P. (author), Sidorkin, V. (author), Salemink, H. (author), Van der Drift, E. (author), Alkemade, P. (author)

مصطلحات الفهرس: Helium Ion Microscopy, HIM, nanoimaging, nanofabrication, scanning helium ion beam lithography, SHIBL, lithography, helium ion beam induced deposition, HIBID, conference paper, Text

URL: http://resolver.tudelft.nl/uuid:5c0c05cc-c0bd-49f1-905b-a61263cff0a0
Proceedings of SPIE, 2010, vol. 7638--0277-786X