المؤلفون: Randall L. Headrick, Andrew R. Melnyk, Yongli Gao, S. Schoemann, Antti Mäkinen

المصدر: Physical Review B. 60:14683-14687

مصطلحات موضوعية: Optics, Materials science, business.industry, Chemical physics, Molecular film, business, Domain (software engineering)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9a83c0286775fd1419d795ccb41eb063
https://doi.org/10.1103/physrevb.60.14683

المؤلفون: B. Krueger, S. Schoemann, F. Schumann, H. Pohl

المصدر: 2008 15th International Symposium on the Physical and Failure Analysis of Integrated Circuits.

مصطلحات موضوعية: Engineering, business.industry, Frequency domain, Bandwidth (signal processing), Path (graph theory), Electronic engineering, Oscilloscope, Reflectometry, business, Electrical impedance, Signal, Domain (software engineering)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::818a2d88b56e880d26b72c7076b6cdff
https://doi.org/10.1109/ipfa.2008.4588163

المؤلفون: M. G. Mason, Andrew R. Melnyk, S. Schoemann, Yongli Gao, Antti Mäkinen, D. A. Mantell, Randall L. Headrick, A. A. Muenter

المصدر: Photoinduced Charge Transfer.

مصطلحات موضوعية: Materials science, Chemical physics, Excited state, Dynamics (mechanics), Molecular film, Femtosecond

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b9e71382aa4226b4b3d40e9ffe36e604
https://doi.org/10.1142/9789812793294_0017

المؤلفون: Andrew R. Melnyk, M. G. Mason, Antti J. Maekinen, A. A. Muenter, Yongli Gao, S. Schoemann

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Organic semiconductor, Electron transfer, Chemistry, Photoemission spectroscopy, Excited state, Inverse photoemission spectroscopy, Femtosecond, Angle-resolved photoemission spectroscopy, Atomic physics, Photochemistry, Acceptor

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bd17dc1ac733295e579c49c57f0af7f5
https://doi.org/10.1117/12.381475

المؤلفون: S. SCHÖMANN, E. TAGLAUER

الاتاحة: http://www.worldscientific.com/doi/abs/10.1142/S0218625X96002758

المؤلفون: Mauro Ciappa, M. Stangoni, M. von Sprekelsen, David Alvarez, Theophilos Maltezopoulos, Louis Hellemans, Martin Kittler, Marc Fouchier, Marcel A. Verheijen, Roland Wiesendanger, Pierre Eyben, S. Schoemann, Wolfgang Fichtner, Trudo Clarysse, S. Saraf, Petr Formanek, Wilfried Vandervorst, Rafi Shikler, Vito Raineri, Nicolas Barreau, Sascha Sadewasser, Filippo Giannazzo, S. A. M. Mentink, Natasja Duhayon, Thilo Glatzel, Yossi Rosenwaks, D. Goghero

المصدر: Scopus-Elsevier
Journal of vacuum science & technology. B, Microelectronics and nanometer structures 22 (2004): 385–393. doi:10.1116/1.1638775
info:cnr-pdr/source/autori:Duhayon N; Eyber P; Fouchier M; Clarysee T; Vandervorst W; Alvarez D; Schoemann S; Ciappa M; Stangoni M; Fichtner W; Formanek P; Kittler M; Raineri V; Giannazzo F; Goghero D; Rosenwaks Y; Shikler R; Saraf S; Sadewasser S; Barreau N; Glatzel T; Verheijen M; Mentink SAM; von Sprekelsen M; Maltezopoulos T; Wiesendanger R; Hellemans L/titolo:Assessing the performance of two-dimensional dopant profiling techniques/doi:10.1116%2F1.1638775/rivista:Journal of vacuum science & technology. B, Microelectronics and nanometer structures/anno:2004/pagina_da:385/pagina_a:393/intervallo_pagine:385–393/volume:22

مصطلحات موضوعية: Profiling (computer programming), Scanning spreading resistance microscopy, Materials science, Dopant, Dynamic range, Bipolar junction transistor, General Engineering, Nanotechnology, Semiconductor device, semiconductors, Electron holography, Scanning capacitance microscopy, Calibration, Electronic engineering, Sample preparation, Transmission electron microscopy

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::62293d2294ca041a002a7b4638c8907f
http://www.scopus.com/inward/record.url?eid=2-s2.0-12144286205&partnerID=MN8TOARS