المؤلفون: Mark Schürmann, Josephine Wolf, Lars Mechold, Kai Starke, Martin Bischoff, Michael Kennedy, Henrik Ehlers, Thomas Hegemann, Olaf Stenzel, Norbert Kaiser, S Schippel, Florian Carstens, Tobias Nowitzki, R Rauhut, Rüdiger Foest, Detlev Ristau, J. Harhausen, Holger Reus, Jens Schumacher, Harro Hagedorn, Alfons Zöller, Steffen Wilbrandt

المساهمون: Publica

المصدر: Applied optics. 56(4)

مصطلحات موضوعية: Materials science, business.industry, Materials Science (miscellaneous), 02 engineering and technology, Repeatability, Sputter deposition, 021001 nanoscience & nanotechnology, 01 natural sciences, Evaporation (deposition), Industrial and Manufacturing Engineering, 010309 optics, Condensed Matter::Materials Science, chemistry.chemical_compound, Optics, Absorption edge, chemistry, Physics::Plasma Physics, Physical vapor deposition, 0103 physical sciences, Tantalum pentoxide, Deposition (phase transition), Business and International Management, 0210 nano-technology, business, Refractive index

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b6bc3845f59b35984bc1b3859f8571b7
https://pubmed.ncbi.nlm.nih.gov/28158073

المؤلفون: Hagen Bartzsch, T. Bachmann, Waldemar Schönberger, S. Schippel

المساهمون: Publica

مصطلحات موضوعية: Anatase, Titania, Materials science, 02 engineering and technology, 01 natural sciences, Optics, Sputtering, 0103 physical sciences, Materials Chemistry, Thin film, 010302 applied physics, business.industry, Surfaces and Interfaces, General Chemistry, Sputter deposition, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Surfaces, Coatings and Films, Amorphous solid, Start layer, Rutile, HIPIMS, Optoelectronics, High-power impulse magnetron sputtering, 0210 nano-technology, business, Refractive index

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::adc1a5c8c151e335799c60d8de3a3345
https://publica.fraunhofer.de/handle/publica/243790

المؤلفون: T. Mans, D. Hoffmann, M. Strotkamp, J. Wueppen, P. Russbueldt, Sven Fritzler, S. Schippel

المصدر: Springer Series in Optical Sciences ISBN: 9783319176581

مصطلحات موضوعية: Brightness, Materials science, business.industry, Astrophysics::High Energy Astrophysical Phenomena, X-ray, Plasma, Electron, Photoelectric effect, Laser, law.invention, Optics, Physics::Plasma Physics, law, Modulation, Cathode ray, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8eb2ef32386729b9777b64fa25192cac
https://doi.org/10.1007/978-3-319-17659-8_15

المؤلفون: Peter I. Gaiduk, S. Schippel, A. Zentgraf, Konrad Gärtner

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 114:46-55

مصطلحات موضوعية: Ostwald ripening, Nuclear and High Energy Physics, Materials science, Annealing (metallurgy), Co implantation, Analytical chemistry, Co diffusion, Ion, Crystallography, symbols.namesake, symbols, Critical dose, Crystallite, Instrumentation, Dissolution

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4999c73a95a4dee705ddcb28ecf27ea0
https://doi.org/10.1016/0168-583x(96)00050-x

المؤلفون: R. Schulz, T. Bachmann, S. Schippel, E. Glaser, U. Richter

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 106:350-354

مصطلحات موضوعية: Nuclear and High Energy Physics, Materials science, Ion beam, Condensed matter physics, chemistry.chemical_element, Germanium, Activation energy, Epitaxy, Ion, Amorphous solid, law.invention, Crystallography, chemistry, law, Surface layer, Crystallization, Instrumentation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2e1f42d0ec08bb4ff07e7e38bcb3e625
https://doi.org/10.1016/0168-583x(96)80029-2

المؤلفون: R. Schulz, T. Bachmann, U. Richter, S. Schippel, E. Glaser

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 106:281-288

مصطلحات موضوعية: Nuclear and High Energy Physics, Materials science, Ion beam, Layer by layer, Analytical chemistry, law.invention, Ion, Amorphous solid, Crystallography, Ion implantation, law, Irradiation, Crystallite, Crystallization, Instrumentation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::92bd984c3f2357f23b996eb9ee47113d
https://doi.org/10.1016/0168-583x(95)00719-9

المؤلفون: Peter I. Gaiduk, A. Witzmann, S. Schippel, A. Zentgraf, F. F. Komarov

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 94:231-236

مصطلحات موضوعية: Nuclear and High Energy Physics, Materials science, Silicon, Ion beam mixing, Annealing (metallurgy), Analytical chemistry, chemistry.chemical_element, Thermal treatment, Grain size, chemistry.chemical_compound, chemistry, Silicide, Crystallite, Instrumentation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fed3b874e5063a07e35786f2e401a76c
https://doi.org/10.1016/0168-583x(94)95359-7

المؤلفون: T. Bachmann, W. Witthuhn, S. Schippel, Werner Wesch, U. Richter, Elke Wendler

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 89:168-173

مصطلحات موضوعية: Nuclear and High Energy Physics, Range (particle radiation), Materials science, Atomic physics, Mass spectrometry, Instrumentation, Ion fluence, Layer (electronics), Deposition (law), Ion

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d6ab17113f3e654fee364f8fee00fde0
https://doi.org/10.1016/0168-583x(94)95166-7

المؤلفون: S. Schippel, A. Witzmann, F. F. Komarov, Peter I. Gaiduk

المصدر: Materials Science Forum. :1577-1582

مصطلحات موضوعية: chemistry.chemical_compound, Materials science, Ion implantation, chemistry, Mechanics of Materials, business.industry, Mechanical Engineering, Silicide, Optoelectronics, General Materials Science, Condensed Matter Physics, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e6f380ddbc38f403bbfc6abfdb0ef882
https://doi.org/10.4028/www.scientific.net/msf.143-147.1577

المؤلفون: A. Witzmann, P. Müller, S. Schippel

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 82:579-583

مصطلحات موضوعية: Nuclear and High Energy Physics, Cadmium, Silicon, Scattering, Potassium, Radiochemistry, Analytical chemistry, chemistry.chemical_element, Nitrogen, Ion implantation, chemistry, Deconvolution, Instrumentation, Quantitative analysis (chemistry)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fa72eccf84b2953e376b80aae675bb79
https://doi.org/10.1016/0168-583x(93)96013-3

المؤلفون: S. Schippel, F. Stolze, Margit Zacharias, B. Garke

المصدر: ResearcherID

مصطلحات موضوعية: Microprobe, Range (particle radiation), Chemistry, Analytical chemistry, chemistry.chemical_element, General Chemistry, Condensed Matter Physics, Oxygen, Amorphous solid, Elastic recoil detection, Cavity magnetron, Materials Chemistry, Spectroscopy, Absorption (electromagnetic radiation)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c49546c156ebb208717684e21e3287fb
https://doi.org/10.1016/0038-1098(93)90418-m

المؤلفون: P. I. Gajduk, S. Schippel, A. Zentgraf, A. Witzmann

المصدر: Journal of Applied Physics. 73:7250-7260

مصطلحات موضوعية: Ostwald ripening, Materials science, Silicon, Precipitation (chemistry), Annealing (metallurgy), Nucleation, Analytical chemistry, General Physics and Astronomy, Mineralogy, chemistry.chemical_element, symbols.namesake, chemistry.chemical_compound, Ion implantation, chemistry, Silicide, symbols, Cobalt

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8f5335c4b2a8844b921a0ccf2864e57f
https://doi.org/10.1063/1.354013

المؤلفون: Jörg K. N. Lindner, S. Schippel, A. Witzmann

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :949-954

مصطلحات موضوعية: Nuclear and High Energy Physics, Thin layers, Materials science, Silicon, Annealing (metallurgy), chemistry.chemical_element, Activation energy, chemistry.chemical_compound, Crystallography, Ion implantation, chemistry, Silicide, Thermal stability, Composite material, Instrumentation, Dissolution

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e1a4305d13343c02afd18ae6dcc257cf
https://doi.org/10.1016/0168-583x(93)90715-i

المؤلفون: S. Schippel, A. Zentgraf, A. Witzmann

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 68:430-434

مصطلحات موضوعية: Nuclear and High Energy Physics, Crystallography, Materials science, Low dose, Nucleation, Instrumentation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::63e6bb509eebd3ab0a46380b6da08b21
https://doi.org/10.1016/0168-583x(92)96119-j

المؤلفون: S. Schippel, A. Witzmann, L. Almonacid

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 65:84-87

مصطلحات موضوعية: Nuclear and High Energy Physics, Materials science, Silicon, business.industry, Inorganic chemistry, chemistry.chemical_element, Ion current, Nitride, Nitrogen, Metal, chemistry.chemical_compound, Silicon nitride, chemistry, visual_art, Silicide, visual_art.visual_art_medium, Optoelectronics, Redistribution (chemistry), business, Instrumentation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a825f19b352dd7377690811d81685358
https://doi.org/10.1016/0168-583x(92)95017-l

المؤلفون: A. Zentgraf, S. Schippel, A. Witzmann

المصدر: Materials Science and Engineering: B. 12:139-143

مصطلحات موضوعية: High energy, Crystallography, Materials science, chemistry, Mechanics of Materials, Annealing (metallurgy), Mechanical Engineering, Low dose, chemistry.chemical_element, General Materials Science, Surface layer, Condensed Matter Physics, Cobalt

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8436ff35c65ae45e802d3730039ff944
https://doi.org/10.1016/0921-5107(92)90274-d

المؤلفون: S. Schippel, W. Riggers, H. Blaschke, D. Ristau

المصدر: Laser-Induced Damage in Optical Materials: 2008.

مصطلحات موضوعية: Materials science, Band gap, Analytical chemistry, Substrate (electronics), engineering.material, Laser, law.invention, chemistry.chemical_compound, Optical coating, Coating, chemistry, Electrical resistivity and conductivity, law, engineering, Composite material, Layer (electronics), Fluoride

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cfd4b0390119c4baefc54455cef86393
https://doi.org/10.1117/12.804463

المؤلفون: T. Bachmann, R. Schulz, E. Glaser, U. Richter, S. Schippel

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a6b1bdddc4590fd6ba0cef5917012e31
https://doi.org/10.1016/b978-0-444-82334-2.50069-1

المؤلفون: E. Glaser, T. Bachmann, R. Schulz, S. Schippel, U. Richter

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e49ab47e67ad8dc9a80c735a6e285974
https://doi.org/10.1016/b978-0-444-82334-2.50056-3

المؤلفون: S. Schippel, A. Witzmann

المصدر: MRS Proceedings. 316

مصطلحات موضوعية: Materials science, Transmission electron microscopy, Impurity, Annealing (metallurgy), Nucleation, Radiation damage, Analytical chemistry, Rutherford backscattering spectrometry, Crystallographic defect, Ion

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d22ab3ca8ecc7b91a5bbcb6ddd621a74
https://doi.org/10.1557/proc-316-789