نتائج البحث - "Ryo Nakagaki"

1

Academic Journal

Monitoring of Photoresist Pattern Thickness Using Top-down SEM Image / トップダウンSEM像を用いたレジストパタン膜厚管理

المؤلفون: Atsushi MIYAMOTO, Chie SHISHIDO, Hidetoshi MOROKUMA, Ryo NAKAGAKI, Wataru NAGATOMO, Yuji TAKAGI, 中垣亮, 宍戸千絵, 宮本敦, 諸熊秀俊, 長友渉, 高木裕治

المصدر: 精密工学会誌 / Journal of the Japan Society for Precision Engineering. 2007, 73(7):808

2

Academic Journal

Efficient Parameter Optimization by Applying Estimation Error Reduction to Design of Experiments for Image Processing

المؤلفون: Kenji Nakahira, Ryo Nakagaki, Yohei Minekawa, Yuji Takagi

المصدر: IEEJ Transactions on Electronics, Information and Systems. 2013, 133(1):111

3

Academic Journal

Study on Fabrication Process Parameter Estimation by Visual Measurement / 画像計測による製造プロセスパラメータ推定法の検討

المؤلفون: Chie Shishido, Maki Tanaka, Ryo Nakagaki, Yuji Takagi, 中垣亮, 宍戸千絵, 田中麻紀, 高木裕治

المصدر: 電気学会論文誌Ｃ（電子・情報・システム部門誌） / IEEJ Transactions on Electronics, Information and Systems. 2007, 127(4):630

4

Academic Journal

A VQ-Based Blind Image Restoration Algorithm

المؤلفون: Ryo Nakagaki, Aggelos K. Katsaggelos

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://ivpl.ece.northwestern.edu/Publications/Journals/2003/94.pdf.

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.10.3067; http://ivpl.ece.northwestern.edu/Publications/Journals/2003/94.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.10.3067
http://ivpl.ece.northwestern.edu/Publications/Journals/2003/94.pdf

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5

Fuzzy selective voting classifier with defect extraction based on comparison within an image

المؤلفون: Yuji Takagi, Ryo Nakagaki, Toshifumi Honda, Obara Kenji

المصدر: MIPPR 2007: Pattern Recognition and Computer Vision.

مصطلحات موضوعية: Production line, Engineering, Brightness, Color image, business.industry, Production control, Computer vision, Image processing, Artificial intelligence, business, Visual control, Classifier (UML), Fuzzy logic

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9ac985c5a003c49010165c2991c647ea
https://doi.org/10.1117/12.750528

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6

Dose and focus estimation using top-down SEM images

المؤلفون: Chie Shishido, Osamu Komuro, Yuji Takagi, Hidetoshi Morokuma, Ryo Nakagaki, Maki Tanaka, Hiroyoshi Mori

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Process (computing), Pattern recognition, Top-down and bottom-up design, Photoresist, law.invention, Optics, law, Line (geometry), Process control, Artificial intelligence, Photolithography, business, Focus (optics), Focus variation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0bc549fb76bd57c7a035873884acdb5d
https://doi.org/10.1117/12.483673

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7

Automatic recognition of circuit patterns on semiconductor wafers from multiple scanning electron microscope images

المؤلفون: Ryo Nakagaki, Yuji Takagi, Koji Nakamae

المصدر: Measurement Science and Technology. 21:085501

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3407d53824b9dc9fd4dc973f65e6e85d
https://doi.org/10.1088/0957-0233/21/8/085501

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8

Automatic recognition of defect areas on a semiconductor wafer using multiple scanning electron microscope images

المؤلفون: Toshifumi Honda, Koji Nakamae, Ryo Nakagaki

المصدر: Measurement Science and Technology. 20:075503

مصطلحات موضوعية: Materials science, Fabrication, Scanning electron microscope, Semiconductor device fabrication, business.industry, Applied Mathematics, ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION, Process (computing), Semiconductor device, Secondary electrons, Optics, Surface roughness, Wafer, business, Instrumentation, Engineering (miscellaneous)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bb43707a9bcfc736c4f58629f2b09338
https://doi.org/10.1088/0957-0233/20/7/075503

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