المؤلفون: Yanmei BAI, Lijia ZHANG, Yang WANG, Lijun LIU, Ruilong XIE, Min FAN, Cuizhi LI

المصدر: Shipin gongye ke-ji, Vol 44, Iss 19, Pp 305-312 (2023)

مصطلحات موضوعية: liquid chromatography-tandem mass spectrometry, dairy product, 3-methoxytyramine, adrenaline, isotope dilution, Food processing and manufacture, TP368-456

وصف الملف: electronic resource

Relation: https://doaj.org/toc/1002-0306

URL الوصول: https://doaj.org/article/8f35c558bfb64d2190586265e3cbfaa3

المؤلفون: Ruilong Xie, Heng Wu, Muthumanickam Sankarapandian, Dechao Guo, Huiming Bu, Balasubramanian S. Haran, Jingyun Zhang, Prasad Bhosale, Su-Chen Fan, Shogo Mochizuki, Zuoguang Liu, Andrew M. Greene, Jean E. Wynne, Frougier Julien, Nicolas Loubet, Veeraraghavan S. Basker, Shanti Pancharatnam

المصدر: 2020 IEEE International Interconnect Technology Conference (IITC).

مصطلحات موضوعية: Materials science, business.industry, Transistor, RC time constant, Epitaxy, Line (electrical engineering), law.invention, chemistry.chemical_compound, chemistry, law, Parasitic element, Silicide, Optoelectronics, Wafer, business, Nanosheet

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bb66210a04273bfa45f8a15fb4f60f60
https://doi.org/10.1109/iitc47697.2020.9515644

المؤلفون: Hsinyu Tsai, Chi-Chun Liu, Kafai Lai, Chen Zhang, Daniel Corliss, Richard A. Farrell, Nelson Felix, Chun Wing Yeung, Ruilong Xie, Yann Mignot, Elliott Franke, Cheng Chi, Jingyun Zhang

المصدر: Nature Electronics. 1:562-569

مصطلحات موضوعية: Fabrication, Computer science, business.industry, Transistor, Process (computing), Nanotechnology, 02 engineering and technology, Integrated circuit, 021001 nanoscience & nanotechnology, 01 natural sciences, Electronic, Optical and Magnetic Materials, law.invention, 010309 optics, law, 0103 physical sciences, Microelectronics, Nanometre, Node (circuits), Electrical and Electronic Engineering, Photolithography, 0210 nano-technology, business, Instrumentation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0e90f2b048d34bd000337fd9b46de1ae
https://doi.org/10.1038/s41928-018-0147-4

المؤلفون: Ja-Hyung Han, Charan V. V. S. Surisetty, C. Labelle, H. P. Amanapu, Dinesh Koli, Stan D. Tsai, John H. Zhang, Kisup Chung, Haigou Huang, Ruilong Xie

المصدر: ECS Transactions. 77:169-177

مصطلحات موضوعية: Engineering, business.industry, Semiconductor device fabrication, Speech recognition, Node (networking), business, Computer network

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4320100fdbc463aa67b4412f0ef81dd6
https://doi.org/10.1149/07704.0169ecst

المؤلفون: Hosadurga Shobha, Tenko Yamashita, Chanro Park, Huiming Bu, R. Divakaruni, V. Basker, C. Adams, Dechao Guo, Jingyun Zhang, Lan Yu, Pietro Montanini, X.-H. Liu, A. Arceo De La Pena, Frougier Julien, Kai Zhao, Ruqiang Bao, Robert R. Robison, Nicolas Loubet, Balasubramanian S. Pranatharthi Haran, Muthumanickam Sankarapandian, Xin Miao, James Chingwei Li, Richard A. Conti, Tian Shen, Junli Wang, Praveen Joseph, Huimei Zhou, Koji Watanabe, Reinaldo A. Vega, Shanti Pancharatnam, Ruilong Xie, Curtis Durfee, A. Gaul, Daniel J. Dechene, Andrew M. Greene, Robin Chao, Dexin Kong, Heng Wu

المصدر: 2019 IEEE International Electron Devices Meeting (IEDM).

مصطلحات موضوعية: Dielectric isolation, Materials science, 010308 nuclear & particles physics, business.industry, Effective capacitance, Transistor, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, Process variation, law, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business, Nanosheet, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::04eec01ea9d2193f3390c42bab98c01a
https://doi.org/10.1109/iedm19573.2019.8993490

المؤلفون: Vimal Kamineni, Junli Wang, Susan Su Chen Fan, Andre Labonte, Ruilong Xie, Dinesh Gupta, Raja Muthinti, Juntao Li, Dechao Guo, Ryan Kevin J, B. Peethala, Richard Conte, Christopher Prindle, Veeraraghavan S. Basker, Shanti Pancharatnam, Kangguo Cheng, Albert M. Young, Stan D. Tsai, Huiming Bu, H. P. Amanapu, Chanro Park, Balasubramanian S. Haran, Robert R. Robison, Nicolas Loubet, Y. Liang, Huimei Zhou, Kisik Choi, Richard A. Conti, Andreas Knorr, Cave Nigel, Adra Carr, Saraf Iqbal Rashid, Andrew M. Greene, Michael P. Belyansky, Hao Tang, Mark Raymond

المصدر: 2019 Symposium on VLSI Technology.

مصطلحات موضوعية: Interconnection, Materials science, business.industry, Oxide, chemistry.chemical_element, Nitride, Tungsten, chemistry.chemical_compound, chemistry, Process integration, Optoelectronics, Static random-access memory, Routing (electronic design automation), business, Scaling

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ddd686fefd2d3d87577b75e554a2b83f
https://doi.org/10.23919/vlsit.2019.8776492

المؤلفون: Kerem Akarvardar, Balasubramanian S. Haran, Dinesh Gupta, Juntao Li, Takashi Ando, Economikos Laertis, James J. Demarest, Andreas Knorr, Kai Zhao, Victor Chan, Ruqiang Bao, Cave Nigel, Huimei Zhou, Richard A. Conti, Veeraraghavan S. Basker, Andrew M. Greene, Huiming Bu, Miaomiao Wang, Robert R. Robison, Kanakasabapathy Sivananda K, Indira Seshadri, Chanro Park, Dechao Guo, Muthumanickam Sankarapandian, Ruilong Xie, Liying Jiang

المصدر: 2019 Symposium on VLSI Technology.

مصطلحات موضوعية: Parasitic capacitance, Computer science, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Hardware_PERFORMANCEANDRELIABILITY, Metal gate, Scaling, Hardware_LOGICDESIGN, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c79d17d97f0f8e79a50e6f8d02ad91d6
https://doi.org/10.23919/vlsit.2019.8776493

المؤلفون: Huili GONG, Guoxia DUAN, Lijun LIU, Ruilong XIE, Shuo TANG, Cuizhi LI, Zhiyong LU

المصدر: Asian Agricultural Research; Oct2022, Vol. 14 Issue 10, p23-25, 3p

المؤلفون: Balasubramanian S. Haran, Kisup Chung, Spyridon Skordas, Stan D. Tsai, Mark L. Lenhardt, Su Chen Fan, Sean Teehan, Alex Joseph Varghese, Ruilong Xie, Pietro Montanini

المصدر: 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

مصطلحات موضوعية: Materials science, Yield (engineering), Gas cluster ion beam, business.industry, Logic gate, Chemical-mechanical planarization, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Node (circuits), Wafer, Nitride, business, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8fbd27d6ee98fb8fd9dfb24709c5f9b4
https://doi.org/10.1109/asmc.2018.8373209

المؤلفون: Ajey P. Jacob, Ruilong Xie, Min Gyu Sung, Lars Liebmann, Rinus T. P. Lee, Bill Taylor

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f3458c714b3e53ad501efb98b2ae3c6d
https://doi.org/10.1142/9789813225404_0001

المؤلفون: Junli Wang, Matthew E. Colburn, Nelson Felix, Andreas Knorr, Tenko Yamashita, Charan V. V. S. Surisetty, Peter Zeitzoff, Dinesh Gupta, Y. Xu, Su Chen Fan, D. Park, Xin Miao, R. Divakaruni, Scott C. Johnson, Hiroaki Niimi, S. Lian, Balasubramanian S. Pranatharthi Haran, Andre Labonte, Eric R. Miller, Richard A. Conti, Shogo Mochizuki, Zhenxing Bi, M. Mottura, Bhagawan Sahu, Chengyu Niu, Donald F. Canaperi, John R. Sporre, James J. Demarest, Spyridon Skordas, Vamsi Paruchuri, Praneet Adusumilli, Seng Luan Lee, Lars W. Liebmann, Christopher Prindle, Walter Kleemeier, Oleg Gluschenkov, Peng Xu, Hemanth Jagannathan, Pietro Montanini, Rohit Galatage, Jody A. Fronheiser, Ruilong Xie, P. Oldiges, Neeraj Tripathi, Abraham Arceo, F. Lie, Robin Chao, Zuoguang Liu, D. Corliss, Stuart A. Sieg, Vimal Kamineni, Lee Choonghyun, Jeffrey C. Shearer, C. Labelle, J. Zhang, S. Kanakasabapathy, Stan D. Tsai, James Chingwei Li, Soon-Cheon Seo, H. Chen, H. P. Amanapu, Min Gyu Sung, Mark Raymond, Huiming Bu, Andrew M. Greene, Kisup Chung, Kerem Akarvardar, Sanjay Mehta, Richard G. Southwick, Chanro Park, C.-C. Yeh, John C. Arnold, K. Cheon, Myung-Hee Na, Mukesh Khare, Jungho Cha, Shariq Siddiqui, S. Whang, Lei Sun, Theodorus E. Standaert, Derren N. Dunn, Bassem Hamieh, T. Gow, Ki-chul Kim, Nicolas Loubet, Muthumanickam Sankarapandian, Terence B. Hook

المصدر: 2016 IEEE International Electron Devices Meeting (IEDM).

مصطلحات موضوعية: 010302 applied physics, Very-large-scale integration, Materials science, Silicon, business.industry, Extreme ultraviolet lithography, chemistry.chemical_element, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, chemistry, law, Logic gate, 0103 physical sciences, Multiple patterning, Optoelectronics, Photolithography, 0210 nano-technology, business, Lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::75a8807331b86a9948840b3fa0fbe3d5
https://doi.org/10.1109/iedm.2016.7838334

المؤلفون: Praneet Adusumilli, B. Zhang, Chanro Park, B. Liu, Jin Cai, Balasubramanian S. Pranatharthi Haran, J. J. An, D. Ferrer, E. Engbrecht, Ahmet S. Ozcan, Hiroaki Niimi, R. Divakaruni, Y. Yan, R. Bolam, Huiming Bu, F. Chafik, Bruce B. Doris, S. Stiffler, Dechao Guo, B. Morgenfeld, Henry K. Utomo, Nicolas Loubet, N. Zhan, D. Hilscher, Jeffrey C. Shearer, W. Henson, C. Tran, C-H. Lin, James Chingwei Li, M. Oh, Hemanth Jagannathan, Jody A. Fronheiser, D. Kang, Ruilong Xie, T. Nesheiwat, Zuoguang Liu, Ravikumar Ramachandran, S. Allen, Walter Kleemeier, Oleg Gluschenkov, J. Rice, R. Lallement, Christian Lavoie, Jiseok Kim, Nicolas Breil, Siyuranga O. Koswatta, Emre Alptekin, C. Goldberg, Noah Zamdmer, Shogo Mochizuki, Veeraraghavan S. Basker, Gen Tsutsui, Keith Kwong Hon Wong, S. Fan, N. Makela, S. Jain, James J. Demarest, Christopher D. Sheraw, C.-C. Yeh, Mark Raymond, Anil Kumar, Yoo-Mi Lee, Vamsi Paruchuri, V. Sardesai, Vimal Kamineni, Woo-Hyeong Lee, Y. Ke, M. Yu, Andre Labonte, Tenko Yamashita, C. Niu, S. Narasimha

المصدر: 2016 IEEE Symposium on VLSI Technology.

مصطلحات موضوعية: 010302 applied physics, Materials science, Dopant, business.industry, 02 engineering and technology, 021001 nanoscience & nanotechnology, Epitaxy, 01 natural sciences, chemistry.chemical_compound, chemistry, 0103 physical sciences, Silicide, Electronic engineering, Optoelectronics, Node (circuits), 0210 nano-technology, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3c5321b42b4d0c60756213eea4c7b007
https://doi.org/10.1109/vlsit.2016.7573382

المؤلفون: Ruilong Xie, Mingbin Yu, Chunxiang Zhu, Thanh Hoa Phung

المصدر: IEEE Transactions on Electron Devices. 57:1399-1407

مصطلحات موضوعية: Materials science, Passivation, Silicon, business.industry, chemistry.chemical_element, Germanium, Semiconductor device, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Silicon nitride, chemistry, MOSFET, Electronic engineering, Microelectronics, Optoelectronics, Electrical and Electronic Engineering, business, High-κ dielectric

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fb47dbc625114b8f7e8f8e8e6f5c0537
https://doi.org/10.1109/ted.2010.2046992

المؤلفون: Ruilong Xie, Chunxiang Zhu

المصدر: ECS Transactions. 19:537-561

مصطلحات موضوعية: Electron mobility, Materials science, Passivation, business.industry, Gate dielectric, Hardware_PERFORMANCEANDRELIABILITY, Substrate (electronics), Stack (abstract data type), MOSFET, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Field-effect transistor, business, High-κ dielectric

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::31f0d1e688b65795aa7673cf8ee2b6b2
https://doi.org/10.1149/1.3122115

المؤلفون: Ruilong Xie, Nan Wu, C. Shen, Chunxiang Zhu

المصدر: ECS Transactions. 16:175-180

مصطلحات موضوعية: Materials science, Energy distribution, chemistry, business.industry, Interface (computing), Gate dielectric, Electronic engineering, chemistry.chemical_element, Optoelectronics, Germanium, Time-dependent gate oxide breakdown, business, Hot-carrier injection

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::354d1969b48fee938de335fd395d598a
https://doi.org/10.1149/1.2986766

المؤلفون: Lap Chan, Zhiqiang Sun, Ruilong Xie, Mingbin Yu, Muruganandam Thamarai, Doreen M. Lai, Chunxiang Zhu

المصدر: ECS Transactions. 16:707-716

مصطلحات موضوعية: Materials science, business.industry, Process (computing), Optoelectronics, Plasma treatment, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::39d444a49caba7f23ae2d33f2be289e9
https://doi.org/10.1149/1.2986827

المؤلفون: Ruilong Xie, Chunxiang Zhu

المصدر: IEEE Electron Device Letters. 28:976-979

مصطلحات موضوعية: Materials science, Passivation, Annealing (metallurgy), Inorganic chemistry, Gate dielectric, Analytical chemistry, chemistry.chemical_element, Equivalent oxide thickness, Germanium, Dielectric, Ammonium sulfide, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, Electrical and Electronic Engineering, High-κ dielectric

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::79ce643e270ffd88711eeef57b64ee75
https://doi.org/10.1109/led.2007.907415

المؤلفون: Ruilong Xie, Weiming Chen, Mingbin Yu, Oh Sue Ann, Sudhiranjan Tripathy, Chunxiang Zhu

المصدر: 2008 9th International Conference on Solid-State and Integrated-Circuit Technology ; page 792-795

الاتاحة: http://dx.doi.org/10.1109/icsict.2008.4734651
http://xplorestaging.ieee.org/ielx5/4700819/4734459/04734651.pdf?arnumber=4734651

المؤلفون: Stan Tsai, Hari Amanapu, Ruilong Xie, John Zhang, Kisup Chung, Cathy Labelle, Haigou Huang, Ja-Hyung Han, Dinesh R Koli, Charan Surisetty

المصدر: ECS Meeting Abstracts. :1250-1250

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ca3ddb1cd128c27db7029886a6386a73
https://doi.org/10.1149/ma2017-01/25/1250

المؤلفون: Philip J. Oldiges, Hemanth Jagannathan, Kangguo Cheng, Christopher Prindle, C.-C. Yeh, R. Divakaruni, S. Kanakasabaphthy, Derrick Liu, Sean D. Burns, P. Montanini, T. Gow, Huiming Bu, Abhijeet Paul, Terry A. Spooner, Richard G. Southwick, Jin Cho, M. Celik, Mukesh Khare, Donald F. Canaperi, Young-Kwan Park, H. Mallela, Ravikumar Ramachandran, Bomsoo Kim, Dinesh Gupta, Balasubramanian S. Pranatharthi Haran, R. Kambhampati, M. Weybright, W. Yang, Vamsi Paruchuri, Tae-Chan Kim, R. Sampson, K. Kim, D. Chanemougame, John Iacoponi, Jay W. Strane, Ruilong Xie, D.I. Bae, Injo Ok, Matthew E. Colburn, T. Hook, Kang-ill Seo, Lars W. Liebmann, V. Sardesai, Hoon Kim, Neeraj Tripathi, H. Shang, M. Mottura, Reinaldo A. Vega, B. Hamieh, D. McHerron, Theodorus E. Standaert, Ju-Hwan Jung, S. Nam, E. Alptekin, Soon-Cheon Seo, Dechao Guo, J. G. Hong, Gen Tsutsui, Andreas Scholze, J. Jenq, Xiao Sun, Walter Kleemeier, James H. Stathis, Geum-Jong Bae

المصدر: 2014 12th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT).

مصطلحات موضوعية: Materials science, CMOS, Dopant, business.industry, Electronic engineering, Optoelectronics, Silicon on insulator, Static random-access memory, business, Lithography, Random dopant fluctuation, Communication channel, Power (physics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2fdd9e37b1ad7ef1b69d8d55e103e9fa
https://doi.org/10.1109/icsict.2014.7021207