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1
المؤلفون: Alain Moussa, Janusz Bogdanowicz, Benjamin Groven, Pierre Morin, Matteo Beggiato, Mohamed Saib, Gaetano Santoro, Yaniv Abramovitz, Kevin Houtchens, Shmuel Ben Nissim, Noga Meir, Joey Hung, Adam M. Urbanowicz, Roy Koret, Igor Turovets, Gian Francesco Lorusso, Anne-Laure Charley
المصدر: Metrology, Inspection, and Process Control XXXVII.
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2
المؤلفون: Daniel Schmidt, Manasa Medikonda, Michael Rizzolo, Claire Silvestre, Julien Frougier, Andrew Greene, Mary Breton, Aron Cepler, Jacob Ofek, Itzik Kaplan, Roy Koret, Igor Turovets
المصدر: Journal of Micro/Nanopatterning, Materials, and Metrology. 22
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3
المؤلفون: Manasa Medikonda, Daniel Schmidt, Michael Rizzolo, Mary A. Breton, Ashim Dutta, Heng Wu, Eric R. Evarts, Aron Cepler, Roy Koret, Igor Turovets, Daniel Edelstein
المصدر: Metrology, Inspection, and Process Control XXXVI.
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4
المؤلفون: Daniel Schmidt, Manasa Medikonda, Michael Rizzolo, Claire Silvestre, Julien Frougier, Andrew Greene, Mary A. Breton, Aron Cepler, Jacob Ofek, Itzik Kaplan, Roy Koret, Igor Turovets
المصدر: Metrology, Inspection, and Process Control XXXVI.
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5
المؤلفون: Daniel Schmidt, Aron Cepler, Curtis Durfee, Shanti Pancharatnam, Julien Frougier, Mary Breton, Andrew Greene, Mark Klare, Roy Koret, Igor Turovets
مصطلحات موضوعية: FOS: Physical sciences, Physics - Applied Physics, Applied Physics (physics.app-ph), Electrical and Electronic Engineering, Condensed Matter Physics, Industrial and Manufacturing Engineering, Electronic, Optical and Magnetic Materials
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6
المؤلفون: Igor Turovets, Jennifer Fullam, Mary Breton, Roy Koret, Karen Petrillo, Daniel Schmidt, Aron Cepler
المصدر: 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Reference data (financial markets), 02 engineering and technology, Surface finish, 021001 nanoscience & nanotechnology, Machine learning, computer.software_genre, 01 natural sciences, Line width, Metrology, Characterization (materials science), 010309 optics, Resist, 0103 physical sciences, Line (geometry), Artificial intelligence, 0210 nano-technology, business, computer
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7
المؤلفون: Roy Koret, Gilad Belkin, Manasa Medikonda, Shay Wolfling, Curtis Durfee, Frougier Julien, Andrew M. Greene, Roy Shtainman, Daniel Schmidt, Igor Turovets, Dror Shafir, Aron Cepler, Shanti Pancharatnam
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
مصطلحات موضوعية: Interferometry, Materials science, Channel (digital image), business.industry, Absolute phase, Etching (microfabrication), Indentation, Optoelectronics, Sensitivity (control systems), business, Metrology, Nanosheet
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8
المؤلفون: Daniel Schmidt, Igor Turovets, Veeraraghavan S. Basker, Andrew M. Greene, Frougier Julien, Mary Breton, Aron Cepler, Marjorie Cheng, Dexin Kong, Nicolas Loubet, Mark Klare, Roy Koret, Jingyun Zhang, Abraham Arceo de la Pena, Ishtiaq Ahsan
المصدر: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Materials science, business.industry, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Light scattering, Metrology, Silicon-germanium, 010309 optics, chemistry.chemical_compound, Interferometry, chemistry, Indentation, 0103 physical sciences, Optoelectronics, Process control, Development (differential geometry), 0210 nano-technology, business, Nanosheet
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9
المؤلفون: Vanessa Zhang, Igor Turovets, Kavita Shah, Roy Koret, Silvia Armini, Rob Ameloot, Joey Hung, Laxmi Warad, Srinivasan Rangarajan, Mikhail Krishtab
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.
مصطلحات موضوعية: Atomic layer deposition, Materials science, Amorphous carbon, Chemical engineering, X-ray photoelectron spectroscopy, Nucleation, Surface modification, Layer (electronics), Deposition (law), Titanium oxide
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10
المؤلفون: Shay Wolfling, Joey Hung, Philippe Leray, Frederic Lazzarino, Anne-Laure Charley, Avron Ger, Alain Moussa, Roy Koret, Gayle Murdoch, Sara Paolillo
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.
مصطلحات موضوعية: Back end of line, Materials science, business.industry, Extreme ultraviolet lithography, Copper interconnect, Process control, Optoelectronics, Process optimization, Surface finish, business, Critical dimension, Metrology
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11
المؤلفون: Jennifer Church, Marjorie Cheng, Luciana Meli, John R. Sporre, Mary Breton, Igor Turovets, Chi-Chun Liu, Cody Murray, Nelson Felix, Dexin Kong, Eric R. Miller, Ishtiaq Ahsan, Roy Koret, Aron Cepler, Daniel Schmidt
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Reference data (financial markets), Machine learning, computer.software_genre, Resist, Cathode ray, Artificial intelligence, Focus (optics), business, Throughput (business), computer, Critical dimension, Lithography
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12
المؤلفون: Igor Turovets, Anne-Laure Charley, Philippe Leray, Sandip Halder, Sayantan Das, Avron Ger, Joey Hung, Roy Koret, Mohamed Saib, Matthew Sendelbach, Guillaume Schelcher
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.
مصطلحات موضوعية: Engineering drawing, law, Computer science, Electrical performance, Customer service, Process control, Photolithography, Digital library, GeneralLiterature_REFERENCE(e.g.,dictionaries,encyclopedias,glossaries), Lithography, Capacitance, law.invention, Metrology
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13Scatterometry and AFM measurement combination for area selective deposition process characterization
المؤلفون: Roy Koret, Mohamed Saib, Michael Strauss, Shaoren Deng, Andrea Illiberi, Philippe Leray, Gabriel Woodworth, Jan Willem Maes, Avron Ger, Alain Moussa, Joey Hung, Igor Turovets, Anne-Laure Charley
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Nucleation, Nanoparticle, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, Characterization (materials science), 0103 physical sciences, Optoelectronics, Deposition (phase transition), Wafer, Sensitivity (control systems), 0210 nano-technology, business, Layer (electronics)
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14
المؤلفون: Avron Ger, Sandip Halder, Guillaume Schelcher, Mohamed Saib, Igor Turovets, Philippe Leray, Anne-Laure Charley, Joey Hung, Matthew Sendelbach, Roy Koret, Sayantan Das
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.
مصطلحات موضوعية: Computer science, Semiconductor device fabrication, business.industry, Process (computing), Overlay, Machine learning, computer.software_genre, Capacitance, Line (electrical engineering), Metrology, Multiple patterning, Process window, Artificial intelligence, business, computer
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15
المؤلفون: Nivea Figueiro, Matthew Sendelbach, Thibault Labbaye, Stephane Rey, Yoann Blancquaert, Barak Bringoltz, Shay Wolfling, Guido Rademaker, Lucie Mourier, Ronny Haupt, Daniel Kandel, Francisco Sanchez, Stefan Landis, Michael Shifrin, Jonathan Pradelles, Laurent Pain, Avron Ger, Roy Koret
المصدر: 34th European Mask and Lithography Conference.
مصطلحات موضوعية: Semiconductor device fabrication, business.industry, Computer science, Machine learning, computer.software_genre, Metrology, Image stitching, Sensitivity (control systems), Artificial intelligence, Error detection and correction, business, Lithography, computer, Critical dimension, Maskless lithography
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16
المؤلفون: Philippe Leray, Nivea Figueiro, Shay Wolfling, Roy Koret, Matthew Sendelbach, Avron Ger, Naoto Horiguchi, Anne-Laure Charley, Hans Mertens
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.
مصطلحات موضوعية: Materials science, Silicon, chemistry, Etching (microfabrication), Design of experiments, Nanowire, chemistry.chemical_element, Wafer, Dry etching, Engineering physics, Metrology, Fin (extended surface)
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17
المؤلفون: Tenko Yamashita, Shay Wolfling, Sivananda K. Kanakasabapathy, Gangadhara Raja Muthinti, Wei Ti Lee, Abraham Arceo de la Pena, Michael A. Guillorn, Juntao Li, Daniel Kandel, John G. Gaudiello, Susan Emans, K. Matney, Avron Ger, Matthew Wormington, Roy Koret, Aron Cepler, Matthew Sendelbach, Nicolas Loubet, Peter Gin, Robin Chao
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Nanotechnology, 02 engineering and technology, Semiconductor device, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, Characterization (materials science), 010309 optics, Semiconductor, X-ray photoelectron spectroscopy, 0103 physical sciences, Process integration, Optoelectronics, 0210 nano-technology, Material properties, business, Critical dimension
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18
المؤلفون: Naren Yellai, Alok Vaid, Roy Koret, Haibo Liu, Paul Isbester, Byeong Cheol Kang, Padraig Timoney, Susan Ng-Emans, Matt Sendelbach, Oram Gedalia, Marjorie Cheng
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Process variation, Interconnection, Back end of line, Optics, Materials science, business.industry, Measurement uncertainty, Wafer, business, Rigorous coupled-wave analysis, Front end of line, Metrology
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19
المؤلفون: Francisco Sanchez, Nivea Figueiro, Laurent Pain, Roy Koret, Matthew Sendelbach, Shay Wolfling, Yoann Blancquaert, Thibault Labbaye, Stephane Heraud, Ralf Michel, Stephane Rey
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXI
مصطلحات موضوعية: Materials science, business.industry, Scanning electron microscope, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Spectral line, 010309 optics, Optics, Resist, 0103 physical sciences, Line (geometry), Wafer, 0210 nano-technology, business, Critical dimension, Electron-beam lithography, Maskless lithography
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20
المؤلفون: Shay Wolfling, Cornel Bozdog, Roy Koret, Jamie Tsai, Eyal Grubner, Matthew Sendelbach, Alok Vaid, Carmen Osorio
المصدر: Metrology, Inspection, and Process Control for Microlithography XXVIII.
مصطلحات موضوعية: Basis (linear algebra), law, Scanning electron microscope, Computer science, Electronic engineering, Nanotechnology, Node (circuits), Layer (object-oriented design), Electron microscope, law.invention, Metrology