المؤلفون: Osborne, Stephen P., Mueller, Mark, Lem, Homer, Reyland, David, Baik, KiHo

المساهمون: Kimmel, Kurt R., Staud, Wolfgang

المصدر: SPIE Proceedings ; 23rd Annual BACUS Symposium on Photomask Technology ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.518479

المؤلفون: Newport, Chris L., Parker, Jeffrey, Smith, K. M., Benveniste, Albert, Kim, Nam-Wook, Reyland, David, Farrow, Reginald C., Novembre, Anthony E., Kasica, Richard J., Knurek, Chester S., Peabody, Jr., Milton L., Rutberg, Len

المساهمون: Vladimirsky, Yuli

المصدر: SPIE Proceedings ; Emerging Lithographic Technologies III ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.351088