-
1Academic Journal
المصدر: Journal of Photopolymer Science and Technology. 1996, 9(3):497
-
2
المؤلفون: C. Dzionk, H. Grimm, Reinhard Springer, W. H. Bruenger, Andreas Dietzel, Florian Letzkus, R. Berger
المساهمون: Microsystems, Publica
المصدر: Microelectronic Engineering, 61-62, 295-300. Elsevier
مصطلحات موضوعية: Latent image, business.industry, Chemistry, Magnetic storage, Surface finish, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Ion, law.invention, Optics, Resist, law, Surface roughness, Optoelectronics, Irradiation, Electrical and Electronic Engineering, Magnetic force microscope, business
-
3
المؤلفون: Ernst Haugeneder, Frank-Michael Kamm, Reinhard Springer, Werner Pamler, Herbert Schäfer, Jörg Butschke, Hans Loschner, Albrecht Ehrmann, Rainer Käsmaier
المصدر: Japanese Journal of Applied Physics. 41:4146-4149
مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), business.industry, Membrane stress, General Engineering, General Physics and Astronomy, Silicon on insulator, Nanotechnology, Blank, Stencil, Stress (mechanics), Optoelectronics, Wafer, business, Layer (electronics), Next-generation lithography
-
4
المؤلفون: Florian Letzkus, Mathias Irmscher, B. Panzer, Reinhard Springer, Jörg Butschke, Hans Loschner, M. Mohaupt, S. Eder, R. Eberhardt, Thomas Struck, Christian Reuter, Josef Mathuni, Albrecht Ehrmann
المساهمون: Publica
المصدر: Microelectronic Engineering. :213-218
مصطلحات موضوعية: Materials science, business.industry, Nanotechnology, Condensed Matter Physics, Ion beam lithography, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Resist, law, Optoelectronics, Wafer, X-ray lithography, Stencil lithography, Electrical and Electronic Engineering, Photolithography, business, Lithography, Next-generation lithography
-
5
المؤلفون: Reinhard Springer, Mathias Irmscher, Christian Reuter, Jörg Butschke, Florian Letzkus, B. Höfflinger, Josef Mathuni, Albrecht Ehrmann
المصدر: Microelectronic Engineering. 53:609-612
مصطلحات موضوعية: Fabrication, Materials science, business.industry, Silicon on insulator, Condensed Matter Physics, Stencil, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Etch pit density, Trench, Forensic engineering, Optoelectronics, Wafer, Dry etching, Electrical and Electronic Engineering, business, Lithography
-
6
المؤلفون: C. Schomburg, Christian Reuter, J. Mathuni, R. Käsmaier, Albrecht Ehrmann, Florian Letzkus, Jörg Butschke, Hans Loschner, Mathias Irmscher, Reinhard Springer, B. Höfflinger
المصدر: Microelectronic Engineering. 46:473-476
مصطلحات موضوعية: Yield (engineering), Fabrication, Materials science, business.industry, Doping, technology, industry, and agriculture, Silicon on insulator, Nanotechnology, Condensed Matter Physics, Stencil, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Stress (mechanics), Membrane, parasitic diseases, Optoelectronics, Wafer, Electrical and Electronic Engineering, business
-
7
المصدر: Microelectronic Engineering. 35:509-512
مصطلحات موضوعية: Materials science, business.industry, Nanotechnology, Condensed Matter Physics, Laser, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Application-specific integrated circuit, CMOS, Resist, law, Microelectronics, Optoelectronics, Electrical and Electronic Engineering, business, Lithography, Maskless lithography, Laser beams
-
8
المؤلفون: Michael Jurisch, Mathias Irmscher, Wolfram Klingler, Reinhard Springer, Christof Klein, Florian Letzkus, Joerg Butschke, Hans Loeschner, Elmar Platzgummer
المصدر: Photomask Technology 2008.
مصطلحات موضوعية: Microelectromechanical systems, Engineering, Optical proximity correction, Resist, business.industry, Deflection (engineering), Digital pattern generator, Electrical engineering, Optoelectronics, business, Chip, Beam (structure), Electrical connection
-
9
المؤلفون: Reinhard Springer, Frank-Michael Kamm, Guenther Ruhl, Josef Mathuni, Dirk Knobloch, Jenspeter Rau, Florian Letzkus
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Plasma etching, Passivation, business.industry, Extreme ultraviolet lithography, law.invention, chemistry.chemical_compound, Optics, Resist, Etch pit density, Tantalum nitride, chemistry, law, Etching (microfabrication), Photolithography, business
-
10
المؤلفون: Albrecht Ehrmann, Florian Letzkus, Joerg Butschke, W. H. Bruenger, H. Grimm, R. Berger, Stefan Hirscher, Andreas Wolter, Hans Eichhorn, Reinhard Springer, Rainer Kaesmaier, de P.W.H. Jager, Andreas Dietzel, Olaf Fortagne, D. Adam, M. Boehm, Bruce D. Terris, Herbert Vonach, Herbert Buschbeck, John C. Wolfe, Gerhard Stengl, Hans Loeschner, A. Chalupka, G. Gross, Gertraud Lammer, Paul Ruchhoeft, Elmar Platzgummer
المساهمون: Microsystems, Publica
المصدر: Journal of Microlithography, Microfabrication and Microsystems, 2(34), 34-48. SPIE
مصطلحات موضوعية: Materials science, business.industry, Mechanical Engineering, Condensed Matter Physics, Ion beam lithography, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, law.invention, Optics, law, Optoelectronics, X-ray lithography, Stencil lithography, Electrical and Electronic Engineering, Photolithography, business, Lithography, Next-generation lithography, Maskless lithography, Electron-beam lithography
-
11Mask patterning using chemically amplified resists and the novel STEAG HamaTech Blank Coater ASR5000
المؤلفون: Jakob Szekeresch, Peter Dress, Christian Krauss, Reinhard Springer, Mathias Irmscher, Dietmar Mueller, Dirk Beyer, Christian Reuter, Bernd Leibold, Thomas Hoffmann, Peter Voehringer, Peter Hudek, Corinna Koepernik
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Post exposure, business.industry, Capillary action, engineering.material, Blank, Optics, Coating, Resist, engineering, Reticle, Optoelectronics, Process optimization, business, Electron-beam lithography
-
12
المؤلفون: T Lammer, Albrecht Ehrmann, Reinhard Springer, Rainer Kaesmaier, A. Chalupka, Joerg Butschke, Ernst Haugeneder, Florian Letzkus, Frank-Michael Kamm, Hans Loeschner, Mathias Irmscher, Thomas Struck, Andreas Wolter
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Optics, business.industry, Etching (microfabrication), Distortion, Wafer, Photomask, business, Ion beam lithography, Projection (set theory), Stencil, Lithography
-
13
المؤلفون: Patrick W.H. de Jager, Stefan Hirscher, Rainer Kaesmaier, Hans Loeschner, Reinhard Springer, Gerhard Stengl, Karl Kragler, Andreas Wolter, Albrecht Ehrmann
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering drawing, Engineering, business.industry, Wafer, Full field, Stepper, Lithography process, business, Projection (set theory), Throughput (business), Lithography, Next-generation lithography
-
14
المؤلفون: Dirk Beyer, Florian Letzkus, Chris Constantine, Corinna Koepernik, Christian Krauss, Reinhard Springer, Mathias Irmscher, Joerg Butschke, Dietmar Mueller, Thomas Hoffmann, Bernd Leibold, Peter Voehringer
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Silicon, Scanning electron microscope, business.industry, chemistry.chemical_element, Surface finish, engineering.material, Line edge roughness, Dark field microscopy, Optics, chemistry, Coating, Resist, engineering, Electron beam processing, business
-
15
المؤلفون: W. H. Bruenger, Zvonimir Z. Bandic, Florian Letzkus, Hans Loeschner, H. Grimm, Andreas Dietzel, C. Dzionk, Bruce D. Terris, Reinhard Springer, Gerhard Stengl, R. Berger, Elmar Platzgummer
المساهمون: Microsystems, Publica
المصدر: IEEE Transactions on Magnetics, 38(5), 1952-1954. Institute of Electrical and Electronics Engineers
مصطلحات موضوعية: Materials science, business.industry, Ion beam lithography, Electronic, Optical and Magnetic Materials, law.invention, Magnetic anisotropy, Optics, Projector, law, Electrical and Electronic Engineering, Magnetic force microscope, Thin film, business, Projection (set theory), Lithography, Next-generation lithography
-
16
المؤلفون: Frank-Michael Kamm, Albrecht Ehrmann, Thomas Struck, Karl Kragler, Joerg Butschke, Florian Letzkus, Reinhard Springer, Ernst Haugeneder
المصدر: SPIE Proceedings.
-
17
المؤلفون: Christian Reuter, Reinhard Springer, Karl Kragler, Bernd Hoefflinger, Mathias Irmscher, Joerg Butschke, Joerg Ochsenhirt, Klaus Elian, Florian Letzkus
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Silicon, chemistry, Resist, Etching (microfabrication), Process integration, chemistry.chemical_element, Stencil lithography, Nanotechnology, sense organs, Photomask, Stencil, Lithography
-
18
المؤلفون: Joerg Butschke, Reinhard Springer, Hans Loeschner, Florian Letzkus, Ernst Haugeneder, Mathias Irmscher, Thomas Struck, Albrecht Ehrmann
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Silicon, business.industry, chemistry.chemical_element, Silicon on insulator, Stencil, Blank, Optics, chemistry, Etching (microfabrication), Wafer, Photomask, business, Lithography
-
19
المؤلفون: Joerg Butschke, Mathias Irmscher, Reinhard Springer, Ernst Haugeneder, Albrecht Ehrmann, Thomas Struck, Florian Letzkus, Hans Loeschner, Annika Elsner, Roman Liebe
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Micrometre, Optics, Materials science, Resist, business.industry, Etching (microfabrication), Silicon on insulator, Wafer, Photomask, business, Stencil, Lithography
-
20
المؤلفون: Mathias Irmscher, Joerg Ochsenhirt, Christian Reuter, Joerg Butschke, Florian Letzkus, Reinhard Springer, Bernd Hoefflinger, Klaus Elian
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Resist, business.industry, Etching (microfabrication), Bilayer, Optoelectronics, Nanotechnology, Photomask, business, Ion beam lithography, Isotropic etching, Stencil, Aspect ratio (image)