المؤلفون: Moran Zaberchik, Scott Beatty, Sanghuck Jeon, Nir BenDavid, Chanha Park, Sang Ho Lee, Dongsub Choi, Dongyoung Lee, Telly Koffas, Chen Li, Ramkumar Karur-Shanmugam, Dongsoo Kim, Honggoo Lee, Jae Young Park, Hedvi Spielberg, Efi Megged, Dohwa Lee

المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.

مصطلحات موضوعية: Normalization (statistics), Reduction (complexity), Maxima and minima, Computer science, Brute-force search, Process optimization, Overlay, Statistical process control, Algorithm, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::40281cffdd759f39620381e8b04e1092
https://doi.org/10.1117/12.2583638

المؤلفون: Christian Sparka, Brent Riggs, Karsten Gutjhar, Lipkong Yap, Bill Pierson, Miguel Garcia-Medina, Woong Jae Chung, Vidya Ramanathan, Onur N. Demirer, Ramkumar Karur-Shanmugam, Lokesh Subramany, John C. Robinson

المصدر: 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

مصطلحات موضوعية: Reduction (complexity), Engineering, business.industry, Real-time computing, Process (computing), Process control, Wafer, Overlay, Residual, business, Signature (logic), Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bcd32ce811d3973d6a3b0026995ba299
https://doi.org/10.1109/asmc.2015.7164504

المؤلفون: Woong Jae Chung, Miguel Garcia-Medina, Lipkong Yap, Bill Pierson, John C. Robinson, Christian Sparka, Vidya Ramanathan, Karsten Gutjahr, Onur N. Demirer, Ramkumar Karur-Shanmugam, Brent Riggs, Lokesh Subramany

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Optics, business.industry, Computer science, Real-time computing, Wafer, Overlay, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8f344da32b9f4a9f1d13720f819fc920
https://doi.org/10.1117/12.2190852

المؤلفون: Karsten Gutjahr, Vidya Ramanathan, Ramkumar Karur-Shanmugam, Sven Jug, Lipkong Yap, Woong Jae Chung, Yulei Sun, William Pierson, Jeong Soo Kim, Chin-Chou Kevin Huang, Young Ki Kim, John Tristan, Chen Li, Lokesh Subramany, Brent Riggs, Mark Yelverton, John C. Robinson

المصدر: Metrology, Inspection, and Process Control for Microlithography XXVIII.

مصطلحات موضوعية: Leading edge, business.industry, Computer science, Node (networking), Process (computing), Overlay, law.invention, law, Multiple patterning, Wafer, Photolithography, business, Host (network), Computer hardware, Simulation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ee6fb2e318606519af14410f462abb8c
https://doi.org/10.1117/12.2046076

المؤلفون: Anna Golotsvan, Vidya Ramanathan, Chen Li, David Cho, Hui Peng Koh, Lipkong Yap, Lokesh Subramany, Michael Hsieh, Ramkumar Karur Shanmugam

المصدر: Metrology, Inspection, and Process Control for Microlithography XXVIII.

مصطلحات موضوعية: Margin (machine learning), Computer science, Distributed computing, Critical factors, Process (computing), Overlay, Layer (object-oriented design)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::741a3dd71d83ffbb7da249b38ecdc4cc
https://doi.org/10.1117/12.2046598

المؤلفون: Eran Amit, Chin-Chou Kevin Huang, Dana Klein, Michael Har-Zvi, Guy M. Cohen, Bill Pierson, Ramkumar Karur-Shanmugam, Hiroyuki Kurita, Nuriel Amir, Cindy Kato

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Computer science, business.industry, media_common.quotation_subject, Control (management), Process (computing), Overlay, Field (computer science), Reliability engineering, Semiconductor, Sampling (signal processing), Metric (mathematics), Wafer, Quality (business), business, Simulation, media_common

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fa685509da16abe852c763a42fbed467
https://doi.org/10.1117/12.2011454

المؤلفون: Lin Chua, Ramkumar Karur-Shanmugam, KyungBae Hwang, Antonio Mani, Gino Marcuccilli, Byounghoon Lee, Chin-Chou Kevin Huang, Inhwan Lee, M. Ferber, John C. Robinson, Bill Pierson, Dongsub Choi, Klaus-Dieter Roeth

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Optics, Computer science, business.industry, Extreme ultraviolet, Node (networking), Extreme ultraviolet lithography, Hardware_INTEGRATEDCIRCUITS, Overlay, business, Lithography, High volume manufacturing, Strategy development

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::15cad8d6b77ac564de7e9b3135d3b667
https://doi.org/10.1117/12.2011510

المؤلفون: Jonathan L. Cobb, Richie Peters, Jungchul Park, Wei Wu, Lloyd C. Litt, Will Conley, Bryan S. Kasprowicz, Doug Van Den Broeke, Ramkumar Karur-Shanmugam, Colita Parker

المصدر: Optical Microlithography XVIII.

مصطلحات موضوعية: Engineering, Optical proximity correction, business.industry, Reticle, Electronic engineering, Process window, Stepper, business, Critical dimension, Random logic, Aerial image, Design for manufacturability

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1e18706c9a172ae75b5603ee112cb5f5
https://doi.org/10.1117/12.600912