المؤلفون: F. Mantegazzini, P. Falferi, B. Margesin, R. Mezzena, A. Vinante, E. Enrico, L. Oberto

المساهمون: EUCAS, Mantegazzini, F., Falferi, P., Margesin, B., Mezzena, R., Vinante, A., Enrico, E., Oberto, L.

مصطلحات موضوعية: A wide bandwidth and low-noise amplification chain in the microwave regime is essential for the optimal read-out of quantum systems based on superconducting detectors, such as MKIDs, TESs and MMCs, or qubits. Kinetic Inductance Traveling Wave Parametric Amplifiers (KI-TWPAs) operated in a three-wave mixing fashion have demonstrated high dynamic range and low-noise performances, close to the quantum limit. KI-TWPAs can be fabricated out of a single NbTiN layer as weakly dispersive artificial transmission lines with control on the phase-matched bandwidth via dispersion engineering. We present the optimisation of the deposition of NbTiN films via rf sputter deposition with a Nb80%Ti20% target, in order to reach control on the film characteristics, obtaining high kinetic inductance while maintaining high transition temperature. The parameter landscape related to the different sputtering conditions, such as pressure, power and nitrogen flow has been explored and the thickness of the film has been exploited as fine-tuning parameter to adjust the properties of the final NbTiN films used for the fabrication of KI-TWPAs.

Relation: ispartofbook:EUCAS2023; 16th European Conference on Applied Superconductivity; https://hdl.handle.net/11696/78179

الاتاحة: https://hdl.handle.net/11696/78179

المؤلفون: Chongsei Yoon, Buil Jeon, Giwan Yoon

المصدر: Energies; Volume 12; Issue 14; Pages: 2797

مصطلحات موضوعية: piezoelectric device, zinc oxide, chromium, RF sputter deposition, vacuum annealing, aluminum foil substrate

وصف الملف: application/pdf

Relation: D1: Advanced Energy Materials; https://dx.doi.org/10.3390/en12142797

الاتاحة: https://doi.org/10.3390/en12142797

المؤلفون: Gerke, Sebastian, Becker, Hans-Werner, Rogalla, Detlef, Singer, Florian, Brinkmann, Nils H., Fritz, Susanne, Hammud, Adnan, Keller, Philipp, Skorka, Daniel, Sommer, Daniel, Weiß, Christof, Flege, Stefan, Hahn, Giso, Job, Reinhart, Terheiden, Barbara

المصدر: Thin Solid Films. 2016, 598, pp. 161-169. ISSN 0040-6090. eISSN 1879-2731. Available under: doi:10.1016/j.tsf.2015.11.063

مصطلحات موضوعية: AFM, Amorphous silicon, Hydrogen depth profiling, NRRA, Post-hydrogenation, Raman, RF sputter-deposition, ddc:530

وصف الملف: application/pdf

Relation: http://nbn-resolving.de/urn:nbn:de:bsz:352-0-321533; http://dx.doi.org/10.1016/j.tsf.2015.11.063; 467863474

الاتاحة: http://nbn-resolving.de/urn:nbn:de:bsz:352-0-321533
https://doi.org/10.1016/j.tsf.2015.11.063

المؤلفون: Akira Kouchi, Akira Miyake, Akira Tsuchiyama, Hideki Terasaki, Hiroshi Hidaka, Naoki Watanabe, Shogo Tachibana, Tadashi Kondo, Tetsuya Hama, Yuki Kimura, Yutaka Adachi, 三宅 亮, 土`山 明, 安達 裕, 寺崎 英紀, 日高 宏, 木村 勇気, 橘 省吾, 渡部 直樹, 羽馬 哲也, 近藤 忠, 香内 晃

المصدر: Abstracts for Annual Meeting of Japan Association of Mineralogical Sciences. 2015, :74

المؤلفون: Fumikazu Kanamaru, Masao Takahashi, Mitsushi Fujiki, Shinichi Kikkawa

المصدر: Journal of the Japan Society of Powder and Powder Metallurgy. 1997, 44(7):674

المؤلفون: Akihisa Inoue, Masami Hosokawa, Noriyuki Kataoka, Tsuyoshi Masumoto

المصدر: Materials Transactions, JIM. 1990, 31(5):429

المؤلفون: CATTARUZZA, Elti, BATTAGLIN, Giancarlo, CRISTOFORI, Davide, FINOTTO, Tiziano, RIELLO, Pietro, Glisenti, A.

المساهمون: Cattaruzza, Elti, Battaglin, Giancarlo, Cristofori, Davide, Finotto, Tiziano, Riello, Pietro, Glisenti, A.

مصطلحات موضوعية: Rf-sputter deposition, Ruthenium nitride, Thermal stability, Thin film, Chemistry (all), Condensed Matter Physic, Materials Chemistry2506 Metals and Alloy, Surfaces, Coatings and Film, Surfaces and Interfaces, Settore FIS/01 - Fisica Sperimentale

وصف الملف: STAMPA

Relation: info:eu-repo/semantics/altIdentifier/wos/WOS:000376834700014; volume:295; firstpage:93; lastpage:98; numberofpages:6; journal:SURFACE & COATINGS TECHNOLOGY; http://hdl.handle.net/10278/3672612; info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-84952837220; http://www.journals.elsevier.com/surface-and-coatings-technology/

الاتاحة: http://hdl.handle.net/10278/3672612
https://doi.org/10.1016/j.surfcoat.2015.10.019
http://www.journals.elsevier.com/surface-and-coatings-technology/

المؤلفون: Giancarlo Battaglin, Antonella Glisenti, Tiziano Finotto, Pietro Riello, Davide Cristofori, Elti Cattaruzza

مصطلحات موضوعية: Materials Chemistry2506 Metals and Alloys, Materials science, Thin films, Oxide, chemistry.chemical_element, 02 engineering and technology, Nitride, 010402 general chemistry, 01 natural sciences, Ruthenium oxide, Coatings and Films, chemistry.chemical_compound, Materials Chemistry, Thermal stability, Thin film, Rf-sputter deposition, Ruthenium nitride, Chemistry (all), Settore FIS/01 - Fisica Sperimentale, General Chemistry, Surfaces and Interfaces, Sputter deposition, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Nitrogen, 0104 chemical sciences, Surfaces, Coatings and Films, Ruthenium, Surfaces, Chemical engineering, chemistry, 0210 nano-technology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::13064d3b525a0d82215fd8607b2ca2e4
http://hdl.handle.net/10278/3672612

المؤلفون: Xu J, Liu L, 李正阳, Munroe P, Xie ZH, Xu, J (reprint author), Nanjing Univ Aeronaut & Astronaut, Dept Mat Sci & Engn, 29 Yudao St, Nanjing 210016, Jiangsu, Peoples R China.

مصطلحات موضوعية: Nanocrystalline Film, Sputter Deposition, Electrochemical Impedance, Corrosion, Transition-metal Silicides, 固体力学, 一类, diode sputtering, degradation (chemical), transition metal silicides, dc sputter deposition, diode sputter deposition, magnetron sputter deposition, radiofrequency sputter deposition, reactive sputter deposition, rf sputter deposition, triode sputter deposition, sputtering, cathodic sputtering, dc sputtering, magnetron sputtering, radiofrequency sputtering, reactive sputtering, rf sputtering, triode sputtering, 化学降解, chemical degradation, degradation, chemical breakdown, chemical

Relation: Acta Materialia; Xu J,Liu L,Li ZY,et al. Niobium addition enhancing the corrosion resistance of nanocrystalline Ti5Si3 coating in H2SO4 solution[J]. Acta Materialia,2014,63:245-260.; http://dspace.imech.ac.cn/handle/311007/48251; http://dx.doi.org/10.1016/j.actamat.2013.10.040

الاتاحة: http://dspace.imech.ac.cn/handle/311007/48251
https://doi.org/10.1016/j.actamat.2013.10.040

المؤلفون: Giso Hahn, Barbara Terheiden, Reinhart Job, Sebastian Gerke

المصدر: Energy Procedia. :105-109

مصطلحات موضوعية: Amorphous silicon, Materials science, Passivation, business.industry, AFM profiling, Nanotechnology, Substrate (electronics), Sputter deposition, Amorphous solid, RF sputter deposition, chemistry.chemical_compound, chemistry, Energy(all), a-Si, surface roughness, Optoelectronics, Wafer, ddc:530, Crystalline silicon, hydrogen free deposotion, business, Layer (electronics), surface passivation, surface preparation

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5f0db58fe0b8c7a62a5c1e0eac8c0c0c