المؤلفون: A. NABAE, A. SHIMOOKA, H. NAGATA, K. SHIBA, K. TAKEOKA, K. TOYODA, N. NAKAMURA, R. MITSUHASHI, S. OHTAKI, S. SATORI, T. SATOH, T. UEMATSU

المصدر: The Journal of Space Technology and Science. 2005, 21(1):1-39

المؤلفون: A. Fujiwara, D. Maeda, E. Nagata, K. Hayakawa, N. Ikeda, N. Kawai, N. Kawasaki, R. Mitsuhashi, T. Kanbe, T. Kuroda, X. Lee, Y. Kubozono, Y. Suzuki, Y. Yamanari, 三橋 了爾, 久保園 芳博, 山成 悠介, 川崎 菜穂子, 早川 弘毅, 李 雪松, 永田 知子, 池田 直, 河相 暢幸, 真栄田 大介, 神戸 高志, 藤原 明比古, 鈴木 雄太, 黒田 朋子

المصدر: Meeting Abstracts of the Physical Society of Japan. 2009, :848

المؤلفون: A. Fujiwara, H. Okamoto, N. Ikeda, N. Kawasaki, R. Mitsuhashi, T. Kambe, Y. Kubozono, Y. Maniwa, Y. Suzuki, Y. Yamanari, 三橋 了爾, 久保園 芳博, 山成 悠介, 岡本 秀毅, 川崎 菜穂子, 池田 直, 真庭 豊, 神戸 高志, 藤原 明比古, 鈴木 雄太

المصدر: Meeting Abstracts of the Physical Society of Japan. 2009, :847

المؤلفون: A. Fujiwara, N. Kawasaki, R. Mitsuhashi, Y. Kaji, Y. Kubozono, 三橋 了爾, 久保園 芳博, 加地 由美子, 川崎 菜穂子, 藤原 明比古

المصدر: Meeting Abstracts of the Physical Society of Japan. 2009, :847

المؤلفون: A. Fujiwara, N. Kawasaki, R. Mitsuhashi, X. Lee, Y. Kubozono, 三橋 了爾, 久保園 芳博, 川崎 菜穂子, 李 雪松, 藤原 明比古

المصدر: Meeting Abstracts of the Physical Society of Japan. 2009, :847

المؤلفون: R. Mitsuhashi, Y. Kubozono, Y. Ohta, 三橋 了爾, 久保園 芳博, 太田 洋平

المصدر: Meeting Abstracts of the Physical Society of Japan. 2008, :855

المؤلفون: R. Mitsuhashi, 金 勇, Y. Jin, K. Iida, T. Shinagawa, Y. Takai

Relation: http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100916871; oai:t2r2.star.titech.ac.jp:50699064

الاتاحة: http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100916871

المؤلفون: R. Mitsuhashi, A. Satoh, 金 勇, Y. Jin, K. Iida, T. Shinagawa, Y. Takai

Relation: http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100916880; oai:t2r2.star.titech.ac.jp:50699077

الاتاحة: http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100916880

المؤلفون: R. Mitsuhashi, 金 勇, Y. Jin, K. Iida, T. Shinagawa, Y. Takai

Relation: http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100916864; oai:t2r2.star.titech.ac.jp:50699053

الاتاحة: http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100916864

المؤلفون: R. Mitsuhashi, K.M. Yin, Philippe Absil, Serge Biesemans, C. Adelmann, P. Lehnen, Malgorzata Jurczak, Thomas Kauerauf, Shou-Zen Chang, Hui Yu, T. Y. Hoffmann, S. Van Elshocht, Jorge A. Kittl, Christa Vrancken, Masaaki Niwa, B.J. O′Sullivan, Marc Demand, B. Onsia, Stephan Brus, R. Singanamalla, Rita Vos, Anabela Veloso, G. Whittemore, Anne Lauwers

المصدر: Solid-State Electronics. 52:1303-1311

مصطلحات موضوعية: Materials science, business.industry, Gate dielectric, Electrical engineering, Time-dependent gate oxide breakdown, Dielectric, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, CMOS, Materials Chemistry, Optoelectronics, Electrical and Electronic Engineering, business, NMOS logic, High-κ dielectric, Leakage (electronics), Extrinsic semiconductor

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::49d1f2a230635b4bac01fcccc2b9631b
https://doi.org/10.1016/j.sse.2008.04.011

المؤلفون: Sofie Mertens, M. Niwa, S. Biesemans, Aude Rothschild, Jorge A. Kittl, Christoph Kerner, Hui Yu, T. Y. Hoffmann, Anabela Veloso, S.Z. Chang, G. Whittemore, R. Mitsuhashi, Philippe Absil, Wilfried Vandervorst, M. Ameen, I. Satoru, Christa Vrancken, Caroline Demeurisse, M. A. Pawlak, Marc Demand, Anne Lauwers

المصدر: IEEE Electron Device Letters. 29:34-37

مصطلحات موضوعية: Ytterbium, Materials science, Dopant, business.industry, Annealing (metallurgy), Electrical engineering, chemistry.chemical_element, Dielectric, Electronic, Optical and Magnetic Materials, PMOS logic, CMOS, chemistry, Optoelectronics, Electrical and Electronic Engineering, business, NMOS logic, High-κ dielectric

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::361738186a5c7dbd1e14c405b1085c31
https://doi.org/10.1109/led.2007.910772

المؤلفون: Rita Verbeeck, L. Date, Aude Rothschild, J.-L. Everaert, Christa Vrancken, Anabela Veloso, Masaaki Niwa, Ingrid Debusschere, O. Richard, M. de Potter, Philippe Absil, Malgorzata Jurczak, Christoph Kerner, Thierry Conard, Serge Biesemans, Anne Lauwers, X. Shi, R. Mitsuhashi

المصدر: Microelectronics Reliability. 47:521-524

مصطلحات موضوعية: Engineering, business.industry, Design of experiments, Transistor, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, PMOS logic, law.invention, Plasma nitridation, Reference process, CMOS, law, Electronic engineering, Optoelectronics, Response surface methodology, Electrical and Electronic Engineering, Safety, Risk, Reliability and Quality, business, NMOS logic

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2a147b28fc145bf8494394fe6b1d8944
https://doi.org/10.1016/j.microrel.2007.01.042

المؤلفون: Masaaki Niwa, Shigenori Hayashi, Serge Biesemans, Masafumi Kubota, R. Mitsuhashi, S. Kubicek, S. De Gendt, Thomas Y. Hoffmann, Yoshinao Harada, Aude Rothchild, Jorge Kittle, Marc Heyns, Anne Lauwers, Kazuhiko Yamamoto

المصدر: ECS Transactions. 1:269-285

مصطلحات موضوعية: Thesaurus (information retrieval), Search engine, Computer science, Gate dielectric, Engineering physics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::34a4e065c58211ce831e0c3c00bdad9c
https://doi.org/10.1149/1.2209276

المؤلفون: Kazuyoshi Torii, Hiroshi Kitajima, H. Ohji, T. Kawahara, R. Mitsuhashi

المصدر: IEEE Transactions on Electron Devices. 53:323-328

مصطلحات موضوعية: Electron mobility, Materials science, business.industry, Gate dielectric, Electrical engineering, Equivalent oxide thickness, Substrate (electronics), Electronic, Optical and Magnetic Materials, Threshold voltage, chemistry.chemical_compound, Silicon nitride, chemistry, Optoelectronics, Field-effect transistor, Electrical and Electronic Engineering, business, High-κ dielectric

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::95d05b8c778a35aef29f3cb438b58bdc
https://doi.org/10.1109/ted.2005.863139

المؤلفون: M. Jurczak, A. Veloso, Masaaki Niwa, S. Kubicek, S. De Gendt, A. Rothschild, S. Van Elshocht, Kazuhiko Yamamoto, S. Biesemans, Shinji Hayashi, R. Mitsuhashi

المصدر: Microelectronic Engineering. 80:7-10

مصطلحات موضوعية: Materials science, Reaction behavior, business.industry, Annealing (metallurgy), Transistor, Dielectric, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, chemistry.chemical_compound, Silicon nitride, chemistry, law, Gate oxide, Physical vapor deposition, Optoelectronics, Field-effect transistor, Electrical and Electronic Engineering, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::baefcca5d015feb02ca9d76e04167aeb
https://doi.org/10.1016/j.mee.2005.04.036

المؤلفون: A. Rothschild, M. Jurczak, Masaaki Niwa, Shinji Hayashi, S. Wickramanayaka, Wim Deweerd, S. De Gendt, S. Kubicek, S. Biesemans, R. Mitsuhashi, A. Veloso, Kazuhiko Yamamoto

المصدر: Microelectronic Engineering. 80:198-201

مصطلحات موضوعية: Permittivity, Materials science, business.industry, Dielectric, Thermal treatment, Condensed Matter Physics, Capacitance, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Amorphous solid, Electrode, Optoelectronics, Electrical and Electronic Engineering, business, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c192197dcb2ca3c5f40c9c9ecfa61f40
https://doi.org/10.1016/j.mee.2005.04.068

المؤلفون: Shinji Hayashi, Masaaki Niwa, Koji Eriguchi, Yoshinao Harada, Masabumi Kubota, Kazuhiko Yamamoto, R. Mitsuhashi

المصدر: Applied Surface Science. 216:228-233

مصطلحات موضوعية: Thermal oxidation, Silicon, Chemistry, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Surfaces and Interfaces, General Chemistry, Plasma, Condensed Matter Physics, Capacitance, Surfaces, Coatings and Films, Metal, Sputtering, visual_art, visual_art.visual_art_medium, Inductively coupled plasma, Current density

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d1cced7b765fadec4739440ada5b656c
https://doi.org/10.1016/s0169-4332(03)00427-6

المؤلفون: Masahiko Inoue, Takaharu Nagatomi, Yoshizo Takai, Y. Mizuhara, R. Mitsuhashi

المصدر: Surface and Interface Analysis. 33:437-440

مصطلحات موضوعية: Auger electron spectroscopy, Ion beam, Chemistry, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, General Chemistry, Substrate (electronics), Condensed Matter Physics, Surfaces, Coatings and Films, Ion, Aluminium, Materials Chemistry, Irradiation, Thin film, Spectroscopy

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9ebcde13d8af79af5b4cbb745efdf5ab
https://doi.org/10.1002/sia.1232

المؤلفون: Tom Schram, R. Mitsuhashi, K. Oikawa, Masaaki Niwa, Christoph Adelmann, T. Nakabayashi, Anabela Veloso, Vasile Paraschiv, S. Biesemans, S. Ito, Hongyu Yu, Stefan Kubicek, A. Ikeda, Barry O'Sullivan

المصدر: IEEE Electron Device Letters. 29:1203-1205

مصطلحات موضوعية: Materials science, business.industry, Transistor, Electrical engineering, Equivalent oxide thickness, Electronic, Optical and Magnetic Materials, law.invention, Threshold voltage, PMOS logic, law, Logic gate, Optoelectronics, Field-effect transistor, Electrical and Electronic Engineering, business, Metal gate, High-κ dielectric

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c5c37605386c71548e3d42b118aa62da
https://doi.org/10.1109/led.2008.2005214

المؤلفون: S. De Gendt, V.S. Chang, Stefan Kubicek, Tom Schram, K.M. Yin, L.-A. Ragnarsson, Serge Biesemans, R. Mitsuhashi, C. Adelmann, Hui Yu, K. De Meyer, P. Lehnen, Philippe Absil, S. Van Elshocht, R. Singanamalla, H.-J. Cho, S.Z. Chang

المصدر: IEEE Electron Device Letters. 28:656-658

مصطلحات موضوعية: Electron mobility, Materials science, business.industry, Electrical engineering, Oxide, Equivalent oxide thickness, Electronic, Optical and Magnetic Materials, Threshold voltage, chemistry.chemical_compound, chemistry, MOSFET, Optoelectronics, Field-effect transistor, Electrical and Electronic Engineering, business, Leakage (electronics), Extrinsic semiconductor

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ca2b7f4c7c86ff42c24e32ab044a6f31
https://doi.org/10.1109/led.2007.900308