المؤلفون: Shuo Huang, Prem Panneerchelvam, Chad M. Huard, Shyam Sridhar, Peter L. G. Ventzek, Mark D. Smith

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XII.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a0038d69a95033d14dcc65ce8857afe3
https://doi.org/10.1117/12.2664977

المؤلفون: Prem Panneerchelvam, Chad Huard, Ankur Agarwal, Alessandro Vaglio Pret, Antonio Mani, Roel Gronheid, Marc Demand, Kaushik Kumar

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e5e0def3674b5c5bcb7a2b7a0642f45c
https://doi.org/10.1117/12.2614095

المؤلفون: Prem Panneerchelvam, Ankur Agarwal, Chad M. Huard, Alessandro Vaglio Pret, Antonio Mani, Roel Gronheid, Marc Demand, Kaushik Kumar, Sara Paolillo, Frederic Lazzarino

المصدر: Journal of Vacuum Science & Technology B. 40:062601

مصطلحات موضوعية: Process Chemistry and Technology, Materials Chemistry, Electrical and Electronic Engineering, Instrumentation, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3de34cf34076288e2ffb986dcf6a3ade
https://doi.org/10.1116/6.0002059