المؤلفون: Andrew Blakeney, Binod De, Jeff Eisele, John Hatfield, Murrae Bowden, Plamen Tzviatkov, Sanjay Malik, Scott Scales, Stephanie Dilocker, Tadayoshi Kokubo

المصدر: Journal of Photopolymer Science and Technology. 2002, 15(4):637

المؤلفون: Binod De, Greg Spaziano, Grozdan Grozev, John Biafore, Mario Reybrouc, Murrae Bowden, Plamen Tzviatkov, Sanjay Malik, Stephanie Dilocker, Tom Sarubbi, Veerle van Driessche

المصدر: Journal of Photopolymer Science and Technology. 2001, 14(3):489

المؤلفون: V. van Driessche, Kurt G. Ronse, L. Van den hove, J. Finders, A. Tritchkov, Plamen Tzviatkov

المصدر: Microelectronic Engineering. :111-115

مصطلحات موضوعية: Materials science, business.industry, Nanotechnology, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Resist, Optical proximity correction, Line (geometry), Limit (music), Optoelectronics, Electrical and Electronic Engineering, Stepper, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::250fff4f9d575342a29509899e292019
https://doi.org/10.1016/s0167-9317(98)00024-0

المؤلفون: Thomas Steinhausler, T. Sugihara, Janet M. Kometani, Andrew J. Blakeney, F. Van Roey, Sydney G. Slater, V. van Driessche, Plamen Tzviatkov, John J. Biafore, Anne-Marie Goethals, Allen G. Timko, R. Cirelli, Arturo N. Medina, F. M. Houlihan, Ingrid Pollers, Omkaram Nalamasu, Kurt G. Ronse, Allen H. Gabor

المصدر: Journal of Photopolymer Science and Technology. 11:513-523

مصطلحات موضوعية: Materials science, Polymers and Plastics, Proximity effect (electron beam lithography), business.industry, Organic Chemistry, Resolution (electron density), Process (computing), Linearity, Optics, Resist, Materials Chemistry, Dry etching, business, Lithography, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::24ad5d5bfa889bf60fc4e4de25790118
https://doi.org/10.2494/photopolymer.11.513

المؤلفون: Kirk J. Strozewski, Patrick K. Montgomery, Plamen Tzviatkov, Mario Reybrouck, Grozdan Grozev, Kevin D. Lucas, Mireille Maenhoudt, Lena Zavyalova

المصدر: Advances in Resist Technology and Processing XX.

مصطلحات موضوعية: Materials science, business.industry, Nanotechnology, law.invention, Resist, law, Multiple patterning, Reticle, Optoelectronics, X-ray lithography, Process window, Photolithography, business, Lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5df7cac18ce5d885ad9685ae7f9861e8
https://doi.org/10.1117/12.485186

المؤلفون: Veerle Van Driessche, Plamen Tzviatkov, Kevin D. Lucas, Grozdan Grozev, Frieda Van Roey

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, Resist, Analytical chemistry

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a33129c9d60699a93f011161f8a19dff
https://doi.org/10.1117/12.474204

المؤلفون: Frieda Van Roey, Veerle Van Driessche, Plamen Tzviatkov, Grozdan Grozev, Kevin D. Lucas

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Oxide, Photoresist, law.invention, chemistry.chemical_compound, Optics, chemistry, Resist, law, Phase-shift mask, Wafer, Photolithography, business, Lithography, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::dbd8f45b4b8bf9c0f963c95f68272002
https://doi.org/10.1117/12.425231

المؤلفون: Plamen Tzviatkov, Grozdan Grozev, Thomas R. Sarubbi, Veerle Van Driessche, John J. Biafore, Gregory Spaziano, Patrick Foster, Mark Neisser

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, Silicon, business.industry, chemistry.chemical_element, Substrate (electronics), Optics, Resist, chemistry, Etching (microfabrication), Optoelectronics, business, Absorption (electromagnetic radiation), Lithography, Refractive index, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ba185b81292b963174c84d3e34b98ee1
https://doi.org/10.1117/12.389090