المؤلفون: Hye-Jin Oh, Yoon-Seo Kim, Hyun-Jun Jeong, Sunhee Lee, Joon Seok Park, Jin-Seong Park

المصدر: Journal of Information Display, Vol 25, Iss 3, Pp 295-303 (2024)

مصطلحات موضوعية: Bilayer structure, thin-film transistor (TFT), plasma-enhanced atomic layer deposition (PEALD), compositional control, mobility-stability trade-off, Computer engineering. Computer hardware, TK7885-7895

وصف الملف: electronic resource

Relation: https://doaj.org/toc/1598-0316; https://doaj.org/toc/2158-1606

URL الوصول: https://doaj.org/article/c60b76b489494750a871d21e03977df0

المؤلفون: Chi-Chieh Wang, Cheng-Fu Wang, Meng-Chi Li, Li-Chen Su, Chien-Cheng Kuo

المصدر: Technologies, Vol 13, Iss 1, p 11 (2024)

مصطلحات موضوعية: nanolaminates, PEALD, crystallization, surface roughness, ductility, hafnium dioxide, Technology

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2227-7080/13/1/11; https://doaj.org/toc/2227-7080

URL الوصول: https://doaj.org/article/9f349d5187dc401b831e2ced7d8eeaf2

المؤلفون: Zefu Zhao, Yun-Wen Chen, Yu-Rui Chen, C. W. Liu

المصدر: IEEE Access, Vol 12, Pp 71598-71605 (2024)

مصطلحات موضوعية: Hf0.5Zr0.5O2, HZO, epitaxial growth, HR-STEM, PEALD, interfacial energy, Electrical engineering. Electronics. Nuclear engineering, TK1-9971

وصف الملف: electronic resource

Relation: https://ieeexplore.ieee.org/document/10531750/; https://doaj.org/toc/2169-3536

URL الوصول: https://doaj.org/article/1a56f35ad2104d19bbf855e3e32296e9

المؤلفون: Franz, Mathias, Jäckel, Linda, Kaßner, Lysann, Thurm, Camilla, Daniel, Marcus, Stahr, Frank, Schulz, Stefan E.

المصدر: ALD/ALE 2024, AVS 24th International Conference on Atomic Layer Deposition, Helsinki, 04-07 August 2024

مصطلحات موضوعية: ALD, Atomic Layer Deposition, PEALD, Cobalt, Low Temperature

Relation: https://doi.org/10.5281/zenodo.12634340; https://doi.org/10.5281/zenodo.12634341; oai:zenodo.org:12634341

الاتاحة: https://doi.org/10.5281/zenodo.12634341

المؤلفون: Matos, Catarina Vieira

المساهمون: Povey, Ian, Barquinha, Pedro, RUN

مصطلحات موضوعية: Flexible electronics, conductive thin films, polyimide, TiN, AZO, PEALD, Domínio/Área Científica::Engenharia e Tecnologia::Nanotecnologia

وصف الملف: application/pdf

الاتاحة: http://hdl.handle.net/10362/162288

المؤلفون: Mathias Franz, Mahnaz Safian Jouzdani, Lysann Kaßner, Marcus Daniel, Frank Stahr, Stefan E. Schulz

المصدر: Beilstein Journal of Nanotechnology, Vol 14, Iss 1, Pp 951-963 (2023)

مصطلحات موضوعية: atomic layer deposition (ald), cobalt, low-temperature ald, peald, plasma-enhanced ald, xps, Technology, Chemical technology, TP1-1185, Science, Physics, QC1-999

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2190-4286

URL الوصول: https://doaj.org/article/82e156ae26c543a2afd135994b8163b5

المؤلفون: Innocent, Jerome

المساهمون: Johnson, Andrew, Hill, Michael

مصطلحات موضوعية: 549, ALD, NiO, PEALD, CVD, Transparent

URL الوصول: https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.824065

المؤلفون: Franz, Mathias, Daniel, Marcus, Hu, Xiao, Schulz, Stefan E.

المصدر: EUROCVD / Baltic ALD, Leuven, Belgium, 29 May - 02 June 2023

مصطلحات موضوعية: Atomic Layer Deposition (ALD), Cobalt, Low Temperature, PEALD, XPS

Relation: https://doi.org/10.5281/zenodo.7985164; https://doi.org/10.5281/zenodo.7985165; oai:zenodo.org:7985165

الاتاحة: https://doi.org/10.5281/zenodo.7985165

المؤلفون: TaeHyun Hong, Yoon‐Seo Kim, Su‐Hwan Choi, Jun Hyung Lim, Jin‐Seong Park

المصدر: Advanced Electronic Materials, Vol 9, Iss 4, Pp n/a-n/a (2023)

مصطلحات موضوعية: chemical composition fraction, crystallinity, indium gallium zinc oxide (IGZO), plasma‐enhanced atomic layer deposition (PEALD), thin‐film transistors (TFT), Electric apparatus and materials. Electric circuits. Electric networks, TK452-454.4, Physics, QC1-999

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2199-160X

URL الوصول: https://doaj.org/article/f2eba353224f4348bbacc4969ed637a4

المؤلفون: Namgyu Woo, Seong‐In Cho, Sang‐Hee Ko Park

المصدر: Advanced Materials Interfaces, Vol 10, Iss 12, Pp n/a-n/a (2023)

مصطلحات موضوعية: aluminum, InAlZnO, oxide semiconductors, plasma enhanced atomic layer deposition (PEALD), stability, Physics, QC1-999, Technology

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2196-7350

URL الوصول: https://doaj.org/article/896499435f38410cbc7ec42f96a6849e

المؤلفون: Hye-Jin Oh, Yoon-Seo Kim, Hyun-Jun Jeong, Sunhee Lee, Joon Seok Park, Jin-Seong Park

مصطلحات موضوعية: Medicine, Biotechnology, Space Science, Biological Sciences not elsewhere classified, Chemical Sciences not elsewhere classified, Bilayer structure, thin-film transistor (TFT), plasma-enhanced atomic layer deposition (PEALD), compositional control, mobility-stability trade-off

Relation: https://figshare.com/articles/online_resource/Compositional_tailoring_of_indium-free_GZO_layers_via_plasma-enhanced_atomic_layer_deposition_for_highly_stable_IGZO_GZO_TFT/24843628

الاتاحة: https://doi.org/10.6084/m9.figshare.24843628.v1
https://figshare.com/articles/online_resource/Compositional_tailoring_of_indium-free_GZO_layers_via_plasma-enhanced_atomic_layer_deposition_for_highly_stable_IGZO_GZO_TFT/24843628

المؤلفون: Cunha, Florival Moura, Silva, Manuel F., Gomes, Nuno M., Correia, J. H.

مصطلحات موضوعية: Optically pumped atomic magnetometers (OPMs), Atomic layer deposition (ALD), Ultra-thin films, Al2O3, Plasma-enhanced atomic layer deposition (PEALD), Trimethylaluminum (TMA), Al O 2 3, Science & Technology

وصف الملف: application/pdf

Relation: info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDB%2F04436%2F2020/PT; info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDP%2F04436%2F2020/PT; NORTE-01-0145-FEDER-022090; info:eu-repo/grantAgreement/FCT/3599-PPCDT/PTDC%2FFIS-OTI%2F1259%2F2020/PT; https://www.mdpi.com/2079-6412/13/3/638; Cunha, F.M.; Silva, M.F.; Gomes, N.M.; Correia, J.H. Al2O3 Ultra-Thin Films Deposited by PEALD for Rubidium Optically Pumped Atomic Magnetometers with On-Chip Photodiode. Coatings 2023, 13, 638. https://doi.org/10.3390/coatings13030638; https://hdl.handle.net/1822/86765; 638

الاتاحة: https://hdl.handle.net/1822/86765
https://doi.org/10.3390/coatings13030638

المؤلفون: Jae-Hoon Yoo, Won-Ji Park, So-Won Kim, Ga-Ram Lee, Jong-Hwan Kim, Joung-Ho Lee, Sae-Hoon Uhm, Hee-Chul Lee

المصدر: Nanomaterials; Volume 13; Issue 11; Pages: 1785

مصطلحات موضوعية: HfO 2, plasma-enhanced atomic layer deposition (PEALD), remote plasma, memory window, trapped charge density, plasma damage

وصف الملف: application/pdf

Relation: Synthesis, Interfaces and Nanostructures; https://dx.doi.org/10.3390/nano13111785

الاتاحة: https://doi.org/10.3390/nano13111785

المؤلفون: Ji-Na Song, Min-Jung Oh, Chang-Bun Yoon

المصدر: Materials; Volume 16; Issue 5; Pages: 1959

مصطلحات موضوعية: HfO 2, ZrO 2, HZO, seed layer, PEALD, ferroelectric

وصف الملف: application/pdf

Relation: Thin Films and Interfaces; https://dx.doi.org/10.3390/ma16051959

الاتاحة: https://doi.org/10.3390/ma16051959

المؤلفون: Los Arcos, Teresa de, Awakowicz, Peter, Böke, Marc, Boysen, Nils, Brinkmann, Ralf Peter, Dahlmann, Rainer, Devi, Anjana, Eremin, Denis, Franke, Jonas, Gergs, Tobias, Jenderny, Jonathan, Kemaneci, Efe, Kühne, Thomas D., Kusmierz, Simon, Mussenbrock, Thomas, Rubner, Jens, Trieschmann, Jan, Wessling, Matthias, Xie, Xiaofan, Zanders, David, Zysk, Frederik, Grundmeier, Guido

مصطلحات موضوعية: diffusion barrier coating, gas membranes, modeling, PEALD, PECVD, polymer substrates, porosity

وصف الملف: application/pdf

Relation: Plasma Processes and Polymers; Gepulste Hochleistungsplasmen zur Synthese nanostrukturierter Funktionsschichten; 138690629; https://publica.fraunhofer.de/handle/publica/457742; https://doi.org/10.24406/publica-2281

الاتاحة: https://publica.fraunhofer.de/handle/publica/457742
https://doi.org/10.1002/ppap.202300186
https://doi.org/10.24406/publica-2281

المؤلفون: Arcos, Teresa De Los, Awakowicz, Peter, Benedikt, Jan, Biskup, Beatrix, Böke, Marc, Boysen, Nils, Buschhaus, Rahel, Dahlmann, Rainer, Devi, Anjana, Gergs, Tobias, Jenderny, Jonathan, Keudell, Achim von, Kühne, Thomas D., Kusmierz, Simon, Müller, Hendrik, Mussenbrock, Thomas, Trieschmann, Jan, Zanders, David, Zysk, Frederik, Grundmeier, Guido

مصطلحات موضوعية: model substrates, PEALD, PECVD, plasma activation, polymer substrate, thin film growth

وصف الملف: application/pdf

Relation: Plasma Processes and Polymers; Gepulste Hochleistungsplasmen zur Synthese nanostrukturierter Funktionsschichten; 138690629; https://publica.fraunhofer.de/handle/publica/456593; https://doi.org/10.24406/h-456593

الاتاحة: https://publica.fraunhofer.de/handle/publica/456593
https://doi.org/10.1002/ppap.202300150
https://doi.org/10.24406/h-456593

المؤلفون: Franz, Mathias, Jouzdani, M.S., Kaßner, Lysann, Daniel, M., Stahr, F., Schulz, Stefan

مصطلحات موضوعية: atomic layer deposition (ALD), cobalt, low-temperature ALD, PEALD, plasma-enhanced ALD, XPS

Relation: Beilstein Journal of Nanotechnology; #PLACEHOLDER_PARENT_METADATA_VALUE#; https://publica.fraunhofer.de/handle/publica/462422

الاتاحة: https://publica.fraunhofer.de/handle/publica/462422
https://doi.org/10.3762/BJNANO.14.78

المؤلفون: Da Hee Hong, Jae Hoon Yoo, Won Ji Park, So Won Kim, Jong Hwan Kim, Sae Hoon Uhm, Hee Chul Lee

المصدر: Nanomaterials, Vol 13, Iss 5, p 900 (2023)

مصطلحات موضوعية: HZO, PEALD, remote plasma, ferroelectric, antiferroelectric, fatigue endurance, Chemistry, QD1-999

Relation: https://www.mdpi.com/2079-4991/13/5/900; https://doaj.org/toc/2079-4991; https://doaj.org/article/40036e3118194fceaa0bd6a65930c07c

الاتاحة: https://doi.org/10.3390/nano13050900
https://doaj.org/article/40036e3118194fceaa0bd6a65930c07c

المؤلفون: Jieun Kim, Jung Wook Lim, Jaehee Lee

المصدر: Advanced Electronic Materials, Vol 8, Iss 4, Pp n/a-n/a (2022)

مصطلحات موضوعية: double‐gate insulators, optoelectronics, PEALD–hafnium oxide, photosynaptic devices, Electric apparatus and materials. Electric circuits. Electric networks, TK452-454.4, Physics, QC1-999

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2199-160X

URL الوصول: https://doaj.org/article/5050330ca2d04c9cbb138e40da7a25bf

المؤلفون: Pao-Hsun Huang, Zhi-Xuan Zhang, Chia-Hsun Hsu, Wan-Yu Wu, Sin-Liang Ou, Chien-Jung Huang, Dong-Sing Wuu, Shui-Yang Lien, Wen-Zhang Zhu

المصدر: Nanomaterials; Volume 12; Issue 16; Pages: 2859

مصطلحات موضوعية: tin oxide (SnO x ), plasma-enhanced atomic layer deposition (PEALD), substrate temperature

وصف الملف: application/pdf

Relation: https://dx.doi.org/10.3390/nano12162859

الاتاحة: https://doi.org/10.3390/nano12162859