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المساهمون: Plasma & Materials Processing, Atomic scale processing, Processing of low-dimensional nanomaterials
المصدر: Journal of the Electrochemical Society, 158(4), G88-G91. Electrochemical Society, Inc.
Journal of the Electrochemical Society, 158, G88-G91مصطلحات موضوعية: endocrine system, congenital, hereditary, and neonatal diseases and abnormalities, endocrine system diseases, Renewable Energy, Sustainability and the Environment, Chemistry, Analytical chemistry, nutritional and metabolic diseases, Plasma, Substrate (electronics), Condensed Matter Physics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Ion, Atomic layer deposition, Materials Chemistry, Electrochemistry, Remote plasma, Deposition (phase transition), Inductively coupled plasma, Thin film
وصف الملف: application/pdf
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المساهمون: Plasma & Materials Processing
المصدر: Journal of Applied Physics, 108(10):103304, 103304-1/9. American Institute of Physics
Journal of Applied Physics, 108 (10), 2010مصطلحات موضوعية: Amorphous silicon, Materials science, Silicon, Band gap, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, voids (solid), Ion, chemistry.chemical_compound, densification, amorphous semiconductors, carrier mobility, plasma deposition, business.industry, silicon, voids (solid), Ion plating, silicon, Biasing, Semimetal, semiconductor growth, energy gap, Semiconductor, chemistry, hydrogen, semiconductor thin films, elemental semiconductors, business
وصف الملف: application/pdf
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3
المساهمون: Plasma & Materials Processing, Atomic scale processing
المصدر: Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA, 61-67
STARTPAGE=61;ENDPAGE=67;TITLE=Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USAمصطلحات موضوعية: Materials science, Inorganic chemistry, Oxide, Substrate (electronics), Plasma, Ion, Metal, Atomic layer deposition, chemistry.chemical_compound, chemistry, Desorption, visual_art, Remote plasma, visual_art.visual_art_medium
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المؤلفون: Sbs Stephan Heil, P Pavel Kudlacek, Wmm Erwin Kessels, Rah Richard Engeln, E Erik Langereis, van de Mcm Richard Sanden
المساهمون: Plasma & Materials Processing, Atomic scale processing, Plasma-based gas conversion
المصدر: Applied Physics Letters, 89(13):131505, 131505-1/3. American Institute of Physics
مصطلحات موضوعية: Chemical kinetics, Reaction mechanism, Atomic layer deposition, chemistry.chemical_compound, Physics and Astronomy (miscellaneous), Chemistry, Chemisorption, Analytical chemistry, Oxide, Plasma diagnostics, Chemical vapor deposition, Quartz crystal microbalance
وصف الملف: application/pdf
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5
المساهمون: Plasma & Materials Processing
المصدر: Journal of Applied Physics, 106(7):073303, 073303-1/8. American Institute of Physics
مصطلحات موضوعية: Chemistry, General Physics and Astronomy, Waveform, Pulse duration, Biasing, Electric potential, Plasma, Atomic physics, Capacitance, Pulse (physics), Voltage
وصف الملف: application/pdf