المؤلفون: Cheng, M.H., Ni, Wei-Xin, Luo, G.L., Huang, S.C., Chang, J.J., Lee, C.Y.

المصدر: Thin Solid Films. 517(1):57-61

مصطلحات موضوعية: Self-assembly Ge nanostructures, Selectively epitaxy, Oxide-patterned substrate, Planar unpatterned substrate, Chemical vapor deposition, Strain degree, Electron beam lithography, TECHNOLOGY, TEKNIKVETENSKAP

وصف الملف: print

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-59151