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1Conference
المؤلفون: Zaima, Kazunori, Tsuda, Hirotaka, Manabe, Yuta, Omura, Mitsuhiro
المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar
المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XIII
الاتاحة: http://dx.doi.org/10.1117/12.3009747
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2Academic Journal
المؤلفون: Oehrlein, Gottlieb, Brandstadter, Stephan, Bruce, Robert, Chang, Jane, Demott, Jessica, Donnelly, Vincent, Dussart, Rémi, Fischer, Andreas, Gottscho, Richard, Hamaguchi, Satoshi, Honda, Masanobu, Hori, Masaru, Ishikawa, Kenji, Jaloviar, Steven, Kanarik, Keren, Karahashi, Kazuhiro, Ko, Akiteru, Kothari, Hiten, Kuboi, Nobuyuki, Kushner, Mark, Lill, Thorsten, Luan, Pingshan, Mesbah, Ali, Miller, Eric, Nath, Shoubhanik, Ohya, Yoshinobu, Omura, Mitsuhiro, Park, Chanhoon, Poulose, John, Rauf, Shahid, Sekine, Makoto, Smith, Taylor, Stafford, Nathan, Standaert, Theo, Ventzek, Peter
المساهمون: Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS)
المصدر: ISSN: 2166-2746.
مصطلحات موضوعية: [PHYS]Physics [physics], [SPI]Engineering Sciences [physics]
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6Academic Journal
المصدر: Japanese Journal of Applied Physics ; volume 54, issue 6S2, page 06GB03 ; ISSN 0021-4922 1347-4065
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